Ablation morphology and defect analysis of Ti thin film irradiated by femto- and picosecond laser for fine ablation of Micro-LED display thin film transistor repair
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OpenAlex topics: Laser Material Processing Techniques · Advanced Surface Polishing Techniques · Surface Roughness and Optical Measurements
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References (44)
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1. D. Du, X. Liu, G. Korn, J. Squier, G. Mourou, Appl. Phys. Lett. 64, 3071 (1994)10.1063/1.111350 ↗
2. K. Weingarten, Laser Tech. J. 6, 51 (2009)10.1002/latj.200990041 ↗
3. J. Choi, S.H. Cho, Int. J. Precis Eng. Manuf. 24, 1975 (2023)10.1007/s12541-023-00868-7 ↗
4. S. Itapu, V. Borra, D.G. Georgiev, IEEE Trans. Nanotechnol. 19, 455 (2020)10.1109/TNANO.2020.2998955 ↗
5. B.N. Chichkov, C. Momma, S. Nolte, F.V. Alvensleben, A. Tünnermann, Appl. Phys. A 63, 109 (1996)10.1007/BF01567637 ↗
6. I. Mirza, N.M. Bulgakova, J. Tomáštík, V. Michálek, O. Haderka, L. Fekete, T. Mocek, Sci. Rep. 6, 39133 (2016)10.1038/srep39133 ↗
7. N.N. Nedialkov, S.E. Imamova, P.A. Atanasov, J. Phys. D Appl. Phys. 37, 638 (2004)10.1088/0022-3727/37/4/016 ↗
8. D. Ashkenasi, G. Müller, A. Rosenfeld, R. Stoian, I.V. Hertel, N.M. Bulgakova, E.E.B. Campbell, Appl. Phys. A 77, 223 (2003)10.1007/s00339-003-2143-3 ↗
9. S. Nolte, C. Momma, H. Jacobs, A. Tünnermann, J. Opt. Soc. Am. B 14, 2716 (1997)10.1364/JOSAB.14.002716 ↗
10. K. Sugioka, Y. Cheng, Appl. Phys. Rev. 1, 041303 (2014)10.1063/1.4904320 ↗
11. K. Sugioka, Y. Cheng, Lab. Chip. 12, 3576 (2012)10.1039/c2lc40366h ↗
12. K. Sugioka, Y. Cheng, Light Sci. Appl. 3, e149 (2014)10.1038/lsa.2014.30 ↗
13. Y.G. Shin, J. Choi, S.H. Cho, Appl. Phys. A 129, 534 (2023)10.1007/s00339-023-06799-4 ↗
14. Y.G. Shin, S.Y. Ji, J. Choi, S.H. Cho, Appl. Phys. A 128, 828 (2022)10.1007/s00339-022-05945-8 ↗
15. H.Y. Kim, W.S. Choi, S.Y. Ji, Y.G. Shin, J.W. Jeon, S. Ahn, S.H. Cho, Appl. Phys. A 124, 123 (2018)10.1007/s00339-018-1553-1 ↗
16. J. Choi, K. Cho, S.H. Cho, Appl. Phys. A 130, 140 (2024)10.1007/s00339-024-07287-z ↗
17. Y. Huang, E.L. Hsiang, M.Y. Deng, S.T. Wu, Light Sci. Appl. 9, 105 (2020)10.1038/s41377-020-0341-9 ↗
18. T. Wu, C.W. Sher, Y. Lin, C.F. Lee, S. Liang, Y. Lu, S.W.H. Chen, W. Guo, H.C. Kuo, Z. Chen, Appl. Sci. 8, 1557 (2018)10.3390/app8091557 ↗
19. Y. Huang, G. Tan, F. Gou, M.C. Li, S.L. Lee, S.T. Wu, J. Soc. Inf. Disp. 27, 387 (2019)10.1002/jsid.760 ↗
20. J.H. Choi, S.J. Lee, K.O. Kwon, J.Y. Choi, T. Jung, M. Han, S.J. Han, Appl. Phys. Express. 13, 026501 (2020)10.7567/1882-0786/ab64ff ↗
21. Y. Kuo, Electrochem. Soc. Interface. 22, 55 (2013)10.1149/2.F06131if ↗
22. J.S. Park, W.J. Maeng, H.S. Kim, J.S. Park, Thin Solid Films. 520, 1679 (2012)10.1016/j.tsf.2011.07.018 ↗
23. J.M. Liu, Opt. Lett. 7, 196 (1982)10.1364/OL.7.000196 ↗
24. J.M. Liu, R. Yen, H. Kurz, N. Bloembergen, Appl. Phys. Lett. 39, 755 (1981)10.1063/1.92843 ↗
25. M. Ams, D.J. Little, M.J. Withford, Femtosecond-Laser-Induced Refractive Index Modifications for Photonic Device Processing (Woodhead Publishing Limited, 2012)10.1533/9780857096227.3.305 ↗
26. P.P. Pronko, P.A. Van Rompay, C. Horvath, X. Liu, T. Juhasz, G. Mourou, Conf. Lasers Electro-Optics Eur. - Tech. Dig. 58, 2387 (1998)
27. E. Yablonovitch, N. Bloembergen, Phys. Rev. Lett. 29, 907 (1972)10.1103/PhysRevLett.29.907 ↗
28. B.C. Stuart, M.D. Feit, A.M. Rubenchik, B.W. Shore, M.D. Perry, Phys. Rev. Lett. 74, 2248 (1995)10.1103/PhysRevLett.74.2248 ↗
29. Z. Han, C. Zhou, E. Dai, J. Xie, Opt. Commun. 281, 4723 (2008)10.1016/j.optcom.2008.05.036 ↗
30. S.S. Wellershoff, J. Hohlfeld, J. Güdde, E. Matthias, Appl. Phys. A 69, S99 (1999)
31. Z. Lin, L.V. Zhigilei, Appl. Surf. Sci. 253, 6295 (2007)10.1016/j.apsusc.2007.01.032 ↗
32. Y. Li, P. Ji, Comput. Mater. Sci. 202, 110959 (2022)10.1016/j.commatsci.2021.110959 ↗
33. F. Korte, S. Nolte, B.N. Chichkov, T. Bauer, G. Kamlage, T. Wagner, C. Fallnich, H. Welling, Appl. Phys. A 69, S7 (1999)10.1007/s003390051346 ↗
34. X. Wang, X. Ye, H. Yao, P. Wei, F. Yin, J. Cong, Y. Tong, L. Zhang, W. Zhu, J. Laser Appl. 33, 012047 (2021)10.2351/7.0000264 ↗
35. D. Liu, C. Chen, B. Man, X. Meng, Y. Sun, F. Li, EPJ Appl. Phys. 72, 31301 (2015)10.1051/epjap/2015150454 ↗
36. P.B. Johnson, R.W. Christy, Phys. Rev. B 9, 5056 (1974)10.1103/PhysRevB.9.5056 ↗
37. M. Watanabe, M. Adachi, H. Fukuyama, J. Mol. Liq. 324, 115138 (2021)10.1016/j.molliq.2020.115138 ↗
38. E. Williams, E.B. Brousseau, J. Micro Nano-Manufacturing. 4, 011004 (2016)10.1115/1.4031892 ↗
39. J. Cheng, C.S. Liu, S. Shang, D. Liu, W. Perrie, G. Dearden, K. Watkins, Opt. Laser Technol. 46, 88 (2013)10.1016/j.optlastec.2012.06.037 ↗
40. D. Perez, L.J. Lewis, Phys. Rev. B 67, 184102 (2003)10.1103/PhysRevB.67.184102 ↗
41. N. Maharjan, W. Zhou, Y. Zhou, Y. Guan, Appl. Phys. A 124, 519 (2018)10.1007/s00339-018-1928-3 ↗
42. K. Sugioka, Y. Cheng, Pan Stanf. Publishing Pte Ltd. p 123–p124 (2013)
43. N.M. Bulgakova, A.B. Evtushenko, Y.G. Shukhov, S.I. Kudryashov, A.V. Bulgakov, Appl. Surf. Sci. 257, 10876 (2011)10.1016/j.apsusc.2011.07.126 ↗
44. N.M. Bulgakova, A.N. Panchenko, V.P. Zhukov, S.I. Kudryashov, A. Pereira, W. Marine, T. Mocek, A.V. Bulgakov, Micromachines. 5, 1344 (2014)10.3390/mi5041344 ↗