Characterization of a a-Si:H thin-film transistors and the effect of thermal annealing
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Research context
OpenAlex topics: Thin-Film Transistor Technologies · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices
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References (7)
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1. S. Kishida et al.: Jpn. J. Appl. Phys.22, 511 (1983)10.1143/JJAP.22.511 ↗
2. G.W. Neubeck, A.K. Malhotra: Solid-State Electr.19, 721 (1984)
3. M. Shur, M. Hack: J. Appl. Phys.55, 10 (1984)10.1063/1.332893 ↗
4. K. Katoh, M. Yasui, H. Watanabe: IECE Tech. Rpt. ED-84-82 (1984)
5. Ruud E.I. Schropp et al.: IEEE Trans. ED-32, 1757 (1985)10.1109/T-ED.1985.22192 ↗
6. T. Sugano et al. (eds.):MOS Field Effect Transistor (Nikkan Kogyo Shinbunsha, Tokyo 1969) p. 288
7. J.A. Reimer, R.W. Vaughan: Solid State Commun.37, 161 (1980)10.1016/0038-1098(81)90734-1 ↗