Texture control and its impact on the properties of SrBi 2 Ta 2 O 9 thin films prepared by pulsed laser deposition

SrBi2Ta2O9 (SBT) ferroelectric thin films with different preferred orientations were deposited by pulsed laser deposition (PLD). Several methods have been developed to control the preferred orientation of SBT thin films. For SBT films deposited directly on Pt/TiO2/SiO2/Si substrates and in situ crystallized at the deposition temperature, the substrate temperature has a significant impact on the orientation and the remnant polarization (Pr) of the films; a higher substrate temperature benefits the formation of (115) texture and larger grain size. The films deposited on Pt/TiO2/SiO2/Si substrates at 830 °C are (115)-oriented and exhibit 2Pr of 6 μC/cm2. (115)- and (200)-predominant films can be formed by using a La0.85Sr0.15CoO3 (LSCO) buffer layer or by annealing amorphous SBT films deposited on Pt/TiO2/SiO2/Si substrates at 450 °C using rapid thermal annealing (RTA). These films exhibit good electric properties; 2Pr of the films are up to 12 μC/cm2 and 17 μC/cm2, respectively. The much larger 2Pr of the films deposited on the LSCO buffer layer and of the films obtained by RTA than 2Pr of the films deposited on Pt/TiO2/SiO2/Si substrates at 830 °C is attributed to a stronger (200) texture.