Engineering sulfur vacancies in WS2/Au interface toward ohmic contact
Source abstract
Abstract
Achieving ohmic contact at the interface between two-dimensional semiconductors and metallic electrodes is important for developing high-performance optoelectric devices. In this work, the first-principles calculations are engaged to investigate how sulfur vacancies modify the electronic structures of the WS2/Au interface. The Schottky barrier height is found to decrease with increasing density of surface sulfur vacancies. The presence of interfacial sulfur vacancies further reduces the barrier height, due to the enhanced interlayer charge transfer. The interfacial sulfur defects also change the stacking order into a hollow-over-hollow configuration, which features an ohmic contact due to the interfacial bond formation. This work has revealed the dependence of the electronic structure of WS2/Au contact on the sulfur vacancy density, sulfur vacancy position and stacking order. The results gain insight into understanding the electronic structures and transport properties at the WS2/Au interface.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Chalcogenide Semiconductor Thin Films
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (55)
Show source-provided references
1. K. Novoselov, A. Mishchenko, A. Carvalho, A.C. Neto, Science 353, aac9439 (2016)10.1126/science.aac9439 ↗
2. J. Cheng, C. Wang, X. Zou, L. Liao, Adv. Opt. Mater. 7, 1800441 (2019)10.1002/adom.201800441 ↗
3. A.S. Aji, P. Solís-Fernández, H.G. Ji, K. Fukuda, H. Ago, Adv. Funct. Mater. 27, 1703448 (2017)10.1002/adfm.201703448 ↗
4. S. Xu, Z. Wu, H. Lu, Y. Han, G. Long, X. Chen, T. Han, W. Ye, Y. Wu, J. Lin, 2D Mater. 3, 021007 (2016)10.1088/2053-1583/3/2/021007 ↗
5. L. Yang, K. Majumdar, H. Liu, Y. Du, H. Wu, M. Hatzistergos, P.Y. Hung, R. Tieckelmann, W. Tsai, C. Hobbs, P.D. Ye, Nano Lett. 14, 6275–6280 (2014)10.1021/nl502603d ↗
6. D. Braga, I. Gutiérrez Lezama, H. Berger, A.F. Morpurgo, Nano Lett. 12, 5218–5223 (2012)10.1021/nl302389d ↗
7. C. Cong, J. Shang, Y. Wang, T. Yu, Adv. Opt. Mater. 6, 1700767 (2018)10.1002/adom.201700767 ↗
8. H.M.W. Khalil, M.F. Khan, J. Eom, H. Noh, A.C.S. Appl, Mater. Interfaces 7, 23589–23596 (2015)10.1021/acsami.5b06825 ↗
9. D. Ovchinnikov, A. Allain, Y.-S. Huang, D. Dumcenco, A. Kis, ACS Nano 8, 8174–8181 (2014)10.1021/nn502362b ↗
10. N. Perea-López, A.L. Elías, A. Berkdemir, A. Castro-Beltran, H.R. Gutiérrez, S. Feng, R. Lv, T. Hayashi, F. López-Urías, S. Ghosh, B. Muchharla, S. Talapatra, H. Terrones, M. Terrones, Adv. Funct. Mater. 23, 5511–5517 (2013)10.1002/adfm.201300760 ↗
11. S.H. Lee, D. Lee, W.S. Hwang, E. Hwang, D. Jena, W.J. Yoo, Appl. Phys. Lett. 104, 193113 (2014)10.1063/1.4878335 ↗
12. W. Yang, J. Shang, J. Wang, X. Shen, B. Cao, N. Peimyoo, C. Zou, Y. Chen, Y. Wang, C. Cong, W. Huang, T. Yu, Nano Lett. 16, 1560–1567 (2016)10.1021/acs.nanolett.5b04066 ↗
13. Y. Sheng, T. Chen, Y. Lu, R.-J. Chang, S. Sinha, J.H. Warner, ACS Nano 13, 4530–4537 (2019)10.1021/acsnano.9b00211 ↗
14. S. Walia, S. Balendhran, Y. Wang, R. Ab Kadir, A. Sabirin Zoolfakar, P. Atkin, J. Zhen Ou, S. Sriram, K. Kalantar-zadeh, M. Bhaskaran, Appl. Phys. Lett. 103, 232105 (2013)10.1063/1.4840317 ↗
15. Q. Liu, X.-Q. Cui, Z.-Q. Fan, Phys. Lett. A 384, 126732 (2020)10.1016/j.physleta.2020.126732 ↗
16. A. Allain, J. Kang, K. Banerjee, A. Kis, Nature Mater. 14, 1195 (2015)10.1038/nmat4452 ↗
17. S. Lee, A. Tang, S. Aloni, H.S. Philip Wong, Nano Lett. 16, 276–281 (2016)10.1021/acs.nanolett.5b03727 ↗
18. J.-R. Chen, P.M. Odenthal, A.G. Swartz, G.C. Floyd, H. Wen, K.Y. Luo, R.K. Kawakami, Nano Lett. 13, 3106–3110 (2013)10.1021/nl4010157 ↗
19. J. Su, L. Feng, S. Liu, Z. Liu, Phys. Chem. Chem. Phys. 19, 20582–20592 (2017)10.1039/C7CP03669H ↗
20. B. Liu, L.-J. Wu, Y.-Q. Zhao, L.-Z. Wang, M.-Q. Cai, Phys. Chem. Chem. Phys. 17, 27088–27093 (2015)10.1039/C5CP04037J ↗
21. A. Khan, H.U. Din, M. Idrees, F. Khan, T.A. Alrebdi, C.V. Nguyen, M. Shafiq, B. Amin, Phys. Lett. A 383, 125867 (2019)10.1016/j.physleta.2019.125867 ↗
22. Y. Fan, Y. Zhou, X. Wang, H. Tan, Y. Rong, J.H. Warner, Adv. Opt. Mater. 4, 1573–1581 (2016)10.1002/adom.201600221 ↗
23. B. Tang, Z.G. Yu, L. Huang, J. Chai, S.L. Wong, J. Deng, W. Yang, H. Gong, S. Wang, K.-W. Ang, Y.-W. Zhang, D. Chi, ACS Nano 12, 2506–2513 (2018)10.1021/acsnano.7b08261 ↗
24. J. Su, L. Feng, Y. Zhang, Z. Liu, Appl. Phys. Lett. 110, 161604 (2017)10.1063/1.4981775 ↗
25. J. Su, L. Feng, Y. Zhang, Z. Liu, Nanotechnol. 28, 105204 (2017)10.1088/1361-6528/aa5aab ↗
26. L. Tao, S. Zhao, P. Miao, J. Yu, X. Wang, Y. Wang, Z. Liu, B. Li, Y. Wang, Y. Sui, Phys. Status Solidi Rapid Res. Lett. 12, 1700371 (2018)10.1002/pssr.201700371 ↗
27. V. Carozo, Y. Wang, K. Fujisawa, B.R. Carvalho, A. McCreary, S. Feng, Z. Lin, C. Zhou, N. Perea-López, A.L. Elías, B. Kabius, V.H. Crespi, M. Terrones, Sci. Adv. 3, e1602813 (2017)10.1126/sciadv.1602813 ↗
28. L.-P. Feng, J. Su, Z.-T. Liu, RSC Adv. 5, 20538–20544 (2015)10.1039/C4RA15218B ↗
29. W.S. Yun, J.D. Lee, Phys. Chem. Chem. Phys. 18, 31027–31032 (2016)10.1039/C6CP05384J ↗
30. Z. Jin, Z. Cai, X. Chen, D. Wei, Nano Res. 11, 4923–4930 (2018)10.1007/s12274-018-2087-8 ↗
31. M. Tosun, L. Chan, M. Amani, T. Roy, G.H. Ahn, P. Taheri, C. Carraro, J.W. Ager, R. Maboudian, A. Javey, ACS Nano 10, 6853–6860 (2016)10.1021/acsnano.6b02521 ↗
32. J. Hou, C. Ke, J. Chen, B. Sun, Y. Xia, X. Li, T. Chen, Y. Wu, Z. Wu, J. Kang, A.C.S. Appl, Mater. Interfaces 12, 19635–19642 (2020)10.1021/acsami.0c00001 ↗
33. J.P. Perdew, K. Burke, M. Ernzerhof, Phys. Rev. Lett. 77, 3865–3868 (1996)10.1103/PhysRevLett.77.3865 ↗
34. J. Furthmüller, J. Hafner, G. Kresse, Phys. Rev. B 53, 7334–7351 (1996)10.1103/PhysRevB.53.7334 ↗
35. K. Momma, F. Izumi, J. Appl. Crystallogr. 44, 1272–1276 (2011)10.1107/S0021889811038970 ↗
36. N. Crivillers, A. Liscio, F.D. Stasio, C. Van Dyck, S. Osella, D. Cornil, S.M. Mian, G.M. Lazzerini, O. Fenwick, E. Orgiu, Phys. Chem. Chem. Phys. 13, 14302–14310 (2011)10.1039/c1cp20851a ↗
37. N.A. Lanzillo, A.J. Simbeck, S.K. Nayak, J. Phys. Cond. Matter 27, 175501 (2015)10.1088/0953-8984/27/17/175501 ↗
38. P. Eickholt, C. Sanders, M. Dendzik, L. Bignardi, D. Lizzit, S. Lizzit, A. Bruix, P. Hofmann, M. Donath, Phys. Rev. Lett. 121, 136402 (2018)10.1103/PhysRevLett.121.136402 ↗
39. H. Beyer, G. Rohde, A. Grubišić Čabo, A. Stange, T. Jacobsen, L. Bignardi, D. Lizzit, P. Lacovig, C.E. Sanders, S. Lizzit, K. Rossnagel, P. Hofmann, M. Bauer, Phys. Rev. Lett. 123, 236802 (2019)10.1103/PhysRevLett.123.236802 ↗
40. L. Bignardi, D. Lizzit, H. Bana, E. Travaglia, P. Lacovig, C.E. Sanders, M. Dendzik, M. Michiardi, M. Bianchi, M. Ewert, L. Buß, J. Falta, J.I. Flege, A. Baraldi, R. Larciprete, P. Hofmann, S. Lizzit, Phys. Rev. Mater. 3, 014003 (2019)10.1103/PhysRevMaterials.3.014003 ↗
41. I. Popov, G. Seifert, D. Tománek, Phys. Rev. Lett. 108, 156802 (2012)10.1103/PhysRevLett.108.156802 ↗
42. J. Liao, B. Sa, J. Zhou, R. Ahuja, Z. Sun, J. Phys. Chem. C 118, 17594–17599 (2014)10.1021/jp5038014 ↗
43. H. Guo, Z. Zhang, B. Huang, X. Wang, H. Niu, Y. Guo, B. Li, R. Zheng, H. Wu, Nanoscale 12, 20025–20032 (2020)10.1039/D0NR04725B ↗
44. H. Guo, Z. Zhang, Y. Guo, Z. Gao, R. Zheng, H. Wu, Appl. Surf. Sci. 505, 144650 (2020)10.1016/j.apsusc.2019.144650 ↗
45. S. Yim, D.M. Sim, W.I. Park, M.-J. Choi, J. Choi, J. Jeon, K.H. Kim, Y.S. Jung, Adv. Funct. Mater. 26, 5631–5640 (2016)10.1002/adfm.201600654 ↗
46. S.-S. Chee, C. Oh, M. Son, G.-C. Son, H. Jang, T.J. Yoo, S. Lee, W. Lee, J.Y. Hwang, H. Choi, B.H. Lee, M.-H. Ham, Nanoscale 9, 9333–9339 (2017)10.1039/C7NR01883E ↗
47. J. Yang, F. Bussolotti, H. Kawai, K.E.J. Goh, Phys. Status Solidi Rapid Res. Lett. 14, 2000248 (2020)10.1002/pssr.202000248 ↗
48. X. Zhang, S. Wang, C.-K. Lee, C.-M. Cheng, J.-C. Lan, X. Li, J. Qiao, X. Tao, Phys. Chem. Chem. Phys. 22, 21776–21783 (2020)10.1039/C9CP07004D ↗
49. W. Chen, E.J.G. Santos, W. Zhu, E. Kaxiras, Z. Zhang, Nano Lett. 13, 509–514 (2013)10.1021/nl303909f ↗
50. J. Li, W. Su, F. Chen, L. Fu, S. Ding, K. Song, X. Huang, L. Zhang, J. Phys. Chem. C 123, 3900–3907 (2019)10.1021/acs.jpcc.8b11647 ↗
51. M.R. Rosenberger, H.-J. Chuang, K.M. McCreary, C.H. Li, B.T. Jonker, ACS Nano 12, 1793–1800 (2018)10.1021/acsnano.7b08566 ↗
52. C. Zeng, Y. Chen, C. Liu, K. Nobusada, N.L. Rosi, R. Jin, Sci. Adv. 1, e1500425 (2015)10.1126/sciadv.1500425 ↗
53. Z.J. Han, A.T. Murdock, D.H. Seo, A. Bendavid, 2D Mater. 5, 032002 (2018)10.1088/2053-1583/aabb81 ↗
54. S. McDonnell, R. Addou, C. Buie, R.M. Wallace, C.L. Hinkle, ACS Nano 8, 2880–2888 (2014)10.1021/nn500044q ↗
55. A. Singh, A.K. Singh, Phys. Rev. B 99, 121201 (2019)10.1103/PhysRevB.99.121201 ↗