journal article·2024-02Open access

A study on the dark and illuminated operation of Al/Si3N4/p-Si Schottky photodiodes: optoelectronic insights

Ozge Surucu, Dilber Esra Yıldız, Murat Yıldırım

Applied Physics A· Volume 130· Issue 2

Abstract

Abstract This work extensively investigates the operation of an Al/ Si3N4/p-Si Schottky-type photodiode under dark and varying illumination intensities. The photodiode is fabricated by employing the metal–organic chemical vapor deposition (MOCVD) method. A thorough electrical characterization is performed at room temperature, encompassing measurements of current–voltage (I–V), current–time (I–t), capacitance–time (C–t), and conductance time (G–t). The photodiode’s rectification factor and reverse bias area increased under illumination. The relationship between light power density, barrier height, and diode ideality factor is found. The study also found a strong correlation between light intensity and applied voltage on series resistance (Rs) and shunt resistance (Rsh). Rs values are calculated using Cheung’s functions, revealing the diode’s resistance behavior. The study also examines the photodiode’s photoconductivity and photoconductance, finding a non-linear relationship between photocurrent and illumination intensity, suggesting bimolecular recombination. Calculated photosensitivity (K), responsivity (R), and detectivity (D*) values show the device’s light response effectiveness, but efficiency decreases at higher illumination intensities. Transient experiments indicate stable and reproducible photocurrent characteristics, revealing photogenerated charge temporal evolution. This study provides a complete understanding of the Al/Si3N4/p-Si Schottky photodiode’s behavior under different illumination intensities. The findings advance optoelectronic device knowledge and enable their use in advanced technologies.
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Research context

OpenAlex topics: Semiconductor materials and interfaces · Silicon Nanostructures and Photoluminescence · Semiconductor materials and devices

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References (36)

Show source-provided references
1. A.K. Panchal, C.S. Solanki, Fabrication of silicon quantum dots in SiNx multilayer using hot-wire CVD. J. Cryst. GrowthCryst. Growth 311, 2659–2663 (2009). https://doi.org/10.1016/j.jcrysgro.2009.03.01310.1016/j.jcrysgro.2009.03.013 ↗
2. F. Gourbilleau, C. Dufour, B. Rezgui, G. Brémond, Silicon nanostructures for solar cell applications. Mater. Sci. Eng. B Sci. Eng. B 159–160, 70–73 (2009). https://doi.org/10.1016/j.mseb.2008.10.05210.1016/j.mseb.2008.10.052 ↗
3. G. Conibeer, M. Green, R. Corkish, Y. Cho, E.-C. Cho, C.-W. Jiang, T. Fangsuwannarak, E. Pink, Y. Huang, T. Puzzer, T. Trupke, B. Richards, A. Shalav, K. Lin, Silicon nanostructures for third generation photovoltaic solar cells. Thin Solid Films 511–512, 654–662 (2006). https://doi.org/10.1016/j.tsf.2005.12.11910.1016/j.tsf.2005.12.119 ↗
4. F. Sohrabi, A. Nikniazi, H. Movl, Optimization of Third Generation Nanostructured Silicon- Based Solar Cells, in: Solar Cells - Research and Application Perspectives, InTech, (2013). https://doi.org/10.5772/51616.10.5772/51616 ↗
5. P. Lorenzo, T. Rasit, S. Nanocrystals, Wiley (2010). https://doi.org/10.1002/978352762995410.1002/9783527629954 ↗
6. I. Guler, Optical and structural characterization of silicon nitride thin films deposited by PECVD. Mater. Sci. Eng. B 246, 21–26 (2019). https://doi.org/10.1016/j.mseb.2019.05.02410.1016/j.mseb.2019.05.024 ↗
7. H.L. Hao, L.K. Wu, W.Z. Shen, Controlling the red luminescence from silicon quantum dots in hydrogenated amorphous silicon nitride films. Appl. Phys. Lett. (2008). https://doi.org/10.1063/1.290229610.1063/1.2902296 ↗
8. M. Wang, D. Li, Z. Yuan, D. Yang, D. Que, Photoluminescence of Si-rich silicon nitride: Defect-related states and silicon nanoclusters. Appl. Phys. Lett. (2007). https://doi.org/10.1063/1.271701410.1063/1.2717014 ↗
9. Y.Q. Wang, Y.G. Wang, L. Cao, Z.X. Cao, High-efficiency visible photoluminescence from amorphous silicon nanoparticles embedded in silicon nitride. Appl. Phys. Lett. 83, 3474–3476 (2003). https://doi.org/10.1063/1.162146210.1063/1.1621462 ↗
10. Q. Cai, H. You, H. Guo, J. Wang, B. Liu, Z. Xie, D. Chen, H. Lu, Y. Zheng, R. Zhang, Progress on AlGaN-based solar-blind ultraviolet photodetectors and focal plane arrays. Light Sci Appl. 10, 94 (2021). https://doi.org/10.1038/s41377-021-00527-410.1038/s41377-021-00527-4 ↗
11. I.O. Althobaiti, M. Aouassa, S.A. Algarni, A.M. Al Mutairi, A.H. Ahmed, Highly photosensitive AuPd/SiO2/n-Si MIS structure for near-infrared photo detection and energy harvesting. J. Mater. Sci. Mater. Electron.Electron. 34, 821 (2023). https://doi.org/10.1007/s10854-023-10233-z10.1007/s10854-023-10233-z ↗
12. H. Pal, S. Singh, C. Guo, W. Guo, O. Badami, T. Pramanik, B. Sarkar, Lateral P-N junction photodiodes using lateral polarity structure GaN films: a theoretical perspective. J. Electron. Mater.Mater. 52, 2148–2157 (2023). https://doi.org/10.1007/s11664-022-10166-z10.1007/s11664-022-10166-z ↗
13. V.G. Kesler, A.A. Guzev, A.P. Kovchavtsev, A.V. Tsarenko, Z.V. Panova, MIS photodiode with an InAs-based tunnel-transparent oxide layer. Optoelectron. Instrum. Data Process. 50, 87–95 (2014). https://doi.org/10.3103/S875669901401011710.3103/S8756699014010117 ↗
14. M. Raj, C. Joseph, M. Subramanian, V. Perumalsamy, V. Elayappan, Superior photoresponse MIS Schottky barrier diodes with nanoporous:Sn–WO 3 films for ultraviolet photodetector application. New J. Chem. 44, 7708–7718 (2020). https://doi.org/10.1039/D0NJ00101E10.1039/D0NJ00101E ↗
15. D.E. Yıldız, A. Karabulut, İ Orak, A. Turut, Effect of atomic-layer-deposited HfO2 thin-film interfacial layer on the electrical properties of Au/Ti/n-GaAs Schottky diode. J. Mater. Sci. Mater. Electron.Electron. 32, 10209–10223 (2021). https://doi.org/10.1007/s10854-021-05676-110.1007/s10854-021-05676-1 ↗
16. F. Huang, Z. Wang, C. Chu, Q. Liu, Y. Li, Z. Xin, Y. Zhang, Q. Sun, Z.-H. Zhang, MIS-based GaN Schottky barrier diodes: interfacial conditions on the reverse and forward properties. IEEE Trans. Electron Devices 69, 5522–5529 (2022). https://doi.org/10.1109/TED.2022.320183110.1109/TED.2022.3201831 ↗
17. T. Zhang, Y. Zhang, J. Zhang, X. Li, Y. Lv, Y. Hao, Current transport mechanism of high-performance novel GaN MIS diode. IEEE Electron Device Lett. 42, 304–307 (2021). https://doi.org/10.1109/LED.2021.305169010.1109/LED.2021.3051690 ↗
18. A. Karabulut, D.E. Yıldız, D.A. Köse, M. Yıldırım, Photosensing performances of heterojunctions-based photodiodes with novel complex interlayers. Mater. Sci. Semicond. Process.Semicond. Process. 146, 106647 (2022). https://doi.org/10.1016/j.mssp.2022.10664710.1016/j.mssp.2022.106647 ↗
19. D.K. Schroder, Semiconductor material and device characterization. 3rd ed., Wiley-IEEE Press (2015)
20. B.L. Sharma, Metal-Semiconductor Schottky Barrier Junctions and Their Applications (Springer Science & Business Media, 2013)
21. D.E. Yıldız, A. Kocyigit, M. Yıldırım, Comparison of Al/TiO2/p-Si and Al/ZnO/p-Si photodetectors. Opt Mater (Amst). 145, 114371 (2023). https://doi.org/10.1016/j.optmat.2023.11437110.1016/j.optmat.2023.114371 ↗
22. A. Kocyigit, M. Yıldırım, D.A. Kose, D.E. Yıldız, Synthesize and characterization of Co-complex as interlayer for Schottky type photodiode. Polym. Bull. 79, 11389–11408 (2022). https://doi.org/10.1007/s00289-021-04021-010.1007/s00289-021-04021-0 ↗
23. H.H. Gullu, D.E. Yıldız, D.A. Kose, M. Yıldırım, Si-based photosensitive diode with novel Zn-doped nicotinate/nicotinamide mixed complex interlayer. Mater. Sci. Semicond. Process.Semicond. Process. 147, 106750 (2022). https://doi.org/10.1016/j.mssp.2022.10675010.1016/j.mssp.2022.106750 ↗
24. A. GencerImer, A. Dere, A.G. Al-Sehemi, O. Dayan, Z. Serbetci, A.A. Al-Ghamdi, F. Yakuphanoglu, Photosensing properties of ruthenium(II) complex-based photodiode. Appl. Phys. A 125, 204 (2019). https://doi.org/10.1007/s00339-019-2504-110.1007/s00339-019-2504-1 ↗
25. P. Chattopadhyay, The effect of shunt resistance on the electrical characteristics of Schottky barrier diodes. J. Phys. D Appl. Phys. 29, 823–829 (1996). https://doi.org/10.1088/0022-3727/29/3/04710.1088/0022-3727/29/3/047 ↗
26. E. Coşkun, H.H. Güllü, İ Candan, Ö. Bayraklı, M. Parlak, Ç. Erçelebi, Device behavior of an In/p-Ag(Ga, In)Te2/n-Si/Ag heterojunction diode. Mater. Sci. Semicond. Process.Semicond. Process. 34, 138–145 (2015). https://doi.org/10.1016/j.mssp.2015.02.04310.1016/j.mssp.2015.02.043 ↗
27. S.K. Cheung, N.W. Cheung, Extraction of Schottky diode parameters from forward current-voltage characteristics. Appl. Phys. Lett. 49, 85–87 (1986). https://doi.org/10.1063/1.9735910.1063/1.97359 ↗
28. F. Yakuphanoglu, Transparent metal oxide films based sensors for solar tracking applications. Compos. B Eng. 92, 151–159 (2016). https://doi.org/10.1016/j.compositesb.2016.02.03910.1016/j.compositesb.2016.02.039 ↗
29. H. Alzahrani, K. Sulaiman, F.F. Muhammadsharif, S.M. Abdullah, A.Y. Mahmoud, R.R. Bahabry, S.F. Ab Sani, Effect of illumination intensity on a self-powered UV photodiode based on solution-processed NPD:Alq3 composite system. J. Mater. Sci. Mater. Electron.Electron. 32, 14801–14812 (2021). https://doi.org/10.1007/s10854-021-06034-x10.1007/s10854-021-06034-x ↗
30. P. Yu, X. Yu, W. Lu, H. Lin, L. Sun, K. Du, F. Liu, W. Fu, Q. Zeng, Z. Shen, C. Jin, Q.J. Wang, Z. Liu, Fast Photoresponse from 1T Tin Diselenide Atomic Layers. Adv. Funct. Mater.Funct. Mater. 26, 137–145 (2016). https://doi.org/10.1002/adfm.20150378910.1002/adfm.201503789 ↗
31. R. Zhuo, S. Zuo, W. Quan, D. Yan, B. Geng, J. Wang, X. Men, Large-size and high performance visible-light photodetectors based on two-dimensional hybrid materials SnS/RGO. RSC Adv. Adv. 8, 761–766 (2018). https://doi.org/10.1039/C7RA11269F10.1039/C7RA11269F ↗
32. V. Balasubramani, J. Chandrasekaran, V. Manikandan, T.K. Le, R. Marnadu, P. Vivek, Upgraded photosensitivity under the influence of Yb doped on V2O5 thin films as an interfacial layer in MIS type Schottky barrier diode as photodiode application. J. Solid State Chem. 301, 122289 (2021). https://doi.org/10.1016/j.jssc.2021.12228910.1016/j.jssc.2021.122289 ↗
33. V. Balasubramani, J. Chandrasekaran, T.D. Nguyen, S. Maruthamuthu, R. Marnadu, P. Vivek, S. Sugarthi, Colossal photosensitive boost in Schottky diode behaviour with Ce-V2O5 interfaced layer of MIS structure. Sens Actuators A Phys. 315, 112333 (2020). https://doi.org/10.1016/j.sna.2020.11233310.1016/j.sna.2020.112333 ↗
34. V. Balasubramani, J. Chandrasekaran, V. Manikandan, T.K. Le, R. Marnadu, P. Vivek, Improved photodetector performance of high-k dielectric material (La) doped V2O5 thin films as an interfacial layer in Schottky barrier diodes. Surf. Interfaces 25, 101297 (2021). https://doi.org/10.1016/j.surfin.2021.10129710.1016/j.surfin.2021.101297 ↗
35. R. Marnadu, J. Chandrasekaran, S. Maruthamuthu, V. Balasubramani, P. Vivek, R. Suresh, Ultra-high photoresponse with superiorly sensitive metal-insulator-semiconductor (MIS) structured diodes for UV photodetector application. Appl. Surf. Sci. 480, 308–322 (2019). https://doi.org/10.1016/j.apsusc.2019.02.21410.1016/j.apsusc.2019.02.214 ↗
36. O. Dayan, A. GencerImer, M. Tercan, A. Dere, A.G. Al-Sehemi, A.A. Al-Ghamdi, F. Yakuphanoglu, Dye sensitized solar cell-based optoelectronic device using novel [Ru(L1)(L2)(NCS)2] complex. J. Mol. Struct. 1238, 130464 (2021). https://doi.org/10.1016/j.molstruc.2021.13046410.1016/j.molstruc.2021.130464 ↗