Ferroelectricity and negative piezoelectric coefficient in orthorhombic phase pure ZrO2 thin films
Source abstract
Abstract
A new approach for epitaxial stabilisation of ferroelectric orthorhombic (o-) ZrO2 films with negative piezoelectric coefficient in ∼ 8nm thick films grown by ion-beam sputtering is demonstrated. Films on (011)-Nb:SrTiO3 gave the oriented o-phase, as confirmed by transmission electron microscopy and electron backscatter diffraction mapping, grazing incidence x-ray diffraction and Raman spectroscopy. Scanning probe microscopy techniques and macroscopic polarization-electric field hysteresis loops show ferroelectric behavior, with saturation polarization of ∼14.3 µC/cm2, remnant polarization of ∼9.3 µC/cm2 and coercive field ∼1.2 MV/cm. In contrast to the o-films grown on (011)-Nb:SrTiO3, films grown on (001)-Nb:SrTiO3 showed mixed monoclinic (m-) and o-phases causing an inferior remnant polarization of ∼4.8 µC/cm2, over 50% lower than the one observed for the film grown on (011)-Nb:SrTiO3. Density functional theory (DFT) calculations of the SrTiO3/ZrO2 interfaces support the experimental findings of a stable polar o-phase for growth on (011) Nb:SrTiO3, and they also explain the negative piezoelectric coefficient.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ferroelectric and Negative Capacitance Devices · Ferroelectric and Piezoelectric Materials · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (64)
Show source-provided references
1. Ferroelectricity in hafnium oxide thin films
2. The fundamentals and applications of ferroelectric HfO210.1038/s41578-022-00431-2 ↗
3. Ferroelectricity in Gd-doped HfO2 thin films10.1149/2.002301jss ↗
4. Incipient ferroelectricity in Al-doped HfO2 thin films10.1002/adfm.201103119 ↗
5. Strontium doped hafnium oxide thin films: wide process window for ferroelectric memories
6. The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film10.1038/srep32931 ↗
7. Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories
8. Ferroelectricity in HfO2 thin films as a function of Zr doping
9. Ferroelectricity in simple binary ZrO2 and HfO210.1021/nl302049k ↗
10. Dramatic impact of pressure and annealing temperature on the properties of sputtered ferroelectric HZO layers10.1063/1.5110894 ↗
11. Ferroelectric and piezoelectric properties of Hf1-xZrxO2 and pure ZrO2 films10.1063/1.4983031 ↗
12. Energy storage performance of ferroelectric ZrO2 film capacitors: effect of HfO2:Al2O3 dielectric insert layer10.1039/D0TA04984K ↗
13. Unveiling the double-well energy landscape in a ferroelectric layer10.1038/s41586-018-0854-z ↗
14. Defect engineering to achieve wake-up free HfO2-based ferroelectrics10.1002/adem.202000791 ↗
15. Effect of film thickness on the ferroelectric and dielectric properties of low-temperature (400 °C) Hf0.5Zr0.5O2 films10.1063/1.5026715 ↗
16. Highly stable performance of flexible Hf0.6Zr0.4O2 ferroelectric thin films under multi-service conditions10.1039/C9TC05157K ↗
17. Magnetic tunnel junctions based on ferroelectric Hf0.5Zr0.5O2 tunnel barriers10.1103/PhysRevApplied.12.031001 ↗
18. Back-End, CMOS-compatible ferroelectric field-effect transistor for synaptic weights10.1021/acsami.0c00877 ↗
19. Doped Hf0.5Zr0.5O2 for high efficiency integrated supercapacitors
20. High dielectric constant ZrO2 films by atomic layer deposition technique on Germanium substrates10.1088/0268-1242/21/4/009 ↗
21. Ferroelectric field-effect transistors based on HfO2: a review10.1088/1361-6528/ac189f ↗
22. Huge Reduction of the wake-up effect in ferroelectric HZO thin films10.1021/acsaelm.9b00367 ↗
23. Large remnant polarization in a wake-up free Hf0.5Zr0.5O2 ferroelectric film through bulk and interface engineering10.1021/acsaelm.0c00671 ↗
24. A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants10.1039/C7TC01200D ↗
25. Mitigating wakeup effect and improving endurance of ferroelectric HfO2-ZrO2 thin films by careful La-doping10.1063/1.5050700 ↗
26. S. Estandía, N. Dix, J. Gazquez, I. Fina, J. Lyu, M.F. Chisholm, J. Fontcuberta, F. Sánchez, Engineering ferroelectric Hf0.5Zr0.5O2 thin films by epitaxial stress. ACS Appl. Electron. Mater. 1, (201) 1449–1457.10.1021/acsaelm.9b00256 ↗
27. Progress and perspective on different strategies to achieve wake-up-free ferroelectric hafnia and zirconia-based thin films
28. Improved polarization and endurance in ferroelectric Hf0.5Zr0.5O2 films on SrTiO3(110)10.1039/D1NR06983G ↗
29. Ferroelectric Hf0.5Zr0.5O2 thin films deposited epitaxially on (110)-oriented SrTiO310.1063/5.0075391 ↗
30. Intrinsic ferroelectricity in Y-doped HfO2 thin films10.1038/s41563-022-01282-6 ↗
31. Schottky-to-Ohmic switching in ferroelectric memristors based on semiconducting Hf0.93Y0.07O2 thin films10.1063/5.0095762 ↗
32. Influence of Si-doping on 45 nm thick ferroelectric ZrO2 films (ACS Appl
33. Emergent ferroelectricity in subnanometer binary oxide films on silicon10.1126/science.abm8642 ↗
34. Paraelectric/antiferroelectric/ferroelectric phase transformation in as-deposited ZrO2 thin films by the TiN capping engineering10.1016/j.matdes.2020.109020 ↗
35. Sub-7-nm textured ZrO2 with giant ferroelectricity10.1016/j.actamat.2020.116536 ↗
36. Antiferroelectricity in thin-film ZrO2 from first principles10.1103/PhysRevB.90.140103 ↗
37. Wake-up free ferroelectric rhombohedral phase in epitaxially strained ZrO2 thin films10.1021/acsami.1c15875 ↗
38. Drennan · 1991
39. Solution-processed thin film transistors incorporating YSZ gate dielectrics processed at 400 °C10.1063/5.0079195 ↗
40. Ab initio molecular dynamics for liquid metals10.1103/PhysRevB.47.558 ↗
41. Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set10.1016/0927-0256(96)00008-0 ↗
42. From ultrasoft pseudopotentials to the projector augmented-wave method10.1103/PhysRevB.59.1758 ↗
43. Restoring the density-gradient expansion for exchange in solids and surfaces10.1103/PhysRevLett.100.136406 ↗
44. Macroscopic polarization in crystalline dielectrics: the geometric phase approach10.1103/RevModPhys.66.899 ↗
45. Linear optical properties in the projector-augmented wave methodology
46. Metric tensor formulation of strain in density-functional perturbation theory10.1103/PhysRevB.71.035117 ↗
47. First-principles calculation of the piezoelectric tensor d⇊ of III–V nitrides10.1063/1.1482796 ↗
48. VESTA 3 for three-dimensional visualization of crystal, volumetric and morphology data10.1107/S0021889811038970 ↗
49. Local bias induced ferroelectricity in manganites with competing charge and orbital order states10.1039/C4CP00075G ↗
50. Ferroelectric polarization and resistive switching characteristics of ion beam assisted sputter deposited BaTiO3 thin films10.1016/j.jpcs.2016.01.012 ↗
51. Piezoelectricity in hafnia10.1038/s41467-021-27480-5 ↗
52. Ferroelectric properties and polarization fatigue of La:HfO2 thin-film capacitors10.1002/pssr.202000481 ↗
53. Fletcher · 1975 · 529
54. Heteroepitaxy of large-misfit systems: role of coincidence lattice10.1002/1521-4079(200007)35:6/7<793::AID-CRAT793>3.0.CO;2-3 ↗
55. Domain-matching epitaxy of ferroelectric Hf0.5Zr0.5O2(111) on La2/3Sr1/3MnO3(001)10.1021/acs.cgd.0c00095 ↗
56. Positive effect of parasitic monoclinic phase of Hf0.5Zr0.5O2 on ferroelectric endurance10.1002/aelm.202100420 ↗
57. Ultrahigh energy storage in superparaelectric relaxor ferroelectrics10.1126/science.abi7687 ↗
58. Epitaxial ferroelectric HfO2 films: growth, properties, and devices10.1021/acsaelm.1c00110 ↗
59. Synaptic behaviour in ferroelectric epitaxial rhombohedral Hf0.5Zr0.5O2 thin films10.1088/2634-4386/ac970c ↗
60. https://www.psds.ac.uk/.
61. The origin of ferroelectricity in Hf1-xZrxO2: a computational investigation and a surface energy model10.1063/1.4916707 ↗
62. Enhanced ferroelectricity in ultrathin films grown directly on silicon10.1038/s41586-020-2208-x ↗
63. Guidelines for the stabilization of a polar rhombohedral phase in epitaxial Hf0.5Zr0.5O2 thin films10.1080/00150193.2020.1791658 ↗
64. R. Ganser, S. Bongarz, A.v. Mach, L.A. Antunes, A. Kersch, Piezo- and pyroelectricity in Zirconia: a study with machine learned force fields. https://arxiv.org/abs/2206.00540?context=cond-mat.