journal article·2023-08-01Open access

Gate-tunable resistance drops related to local superconducting gaps in thin TaS2 layers on SrTiO3 substrates

M. Kosugi, R. Obata, K. Suzuki, K. Kuroyama, S. Du, B. Skinner, T. Kikkawa, T. Yokouchi, Y. Shiomi, S. Maruyama, K. Hirakawa, E. Saitoh, J. Haruyama

APL Materials· Volume 11· Issue 8

Abstract

Strontium titanate [SrTiO3 (STO)], a perovskite oxide with an extremely high gate-tunable dielectric constant (ε) due to quantum paraelectric phases, is attracting considerable attention for yielding various physical phenomena when two-dimensional (2D) layers are integrated. Superconductivity is such a typical phenomenon. However, the influence of the STO substrates on enhancing transition temperatures (Tc) for (atomically) thin 2D flakes attached to them has been rarely investigated. Here, we report gate-tunable and gradual four-terminal resistance drops with critical onset T (TCR) and scanning tunneling spectroscopy (STS) spectra in devices comprising thin TaS2 flakes attached on monolayer hexagonal boron nitride (hBN) spacer/STO substrates. Observation of STS spectra confirms the presence of local superconducting gaps Δ (∼1.5 meV) with transition T (TΔC) three-times higher than previous reports of Tc under absent pressure and strong position dependence of Δ. Depending on Δ on back gate voltages (Vbg) and magnetic fields, there is a strong correlation between TCR and the onset Tc of superconductivity, implying an enhancement of approximately five times compared with the previous highest-onset Tc values without pressure as the applied Vbg increases. The high onset Tc and Δ are discussed based on screening of the long-range Coulomb interaction (CI) due to the high-ε of SrTiO3, while the short-ranged CI remains strong in the 2D limit, causing the superconductivity. Using a monolayer hBN/SrTiO3 substrate with Vbg opens doors to Tc enhancement in thin superconducting layers integrated on it and wide application due to the solid-state high-ε substrates.
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Research context

OpenAlex topics: Electronic and Structural Properties of Oxides · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Faculty of Science and Engineering, Aoyama Gakuin University 1 , 5-10-1 Fuchinobe, Sagamihara, Kanagawa 252-5258, Japan

Institute for Industrial Sciences, The University of Tokyo 2 , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan

Department of Physics, The Ohio State University 3 , Columbus, Ohio 43202, USA

Department of Applied Physics, The University of Tokyo 4 , 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

Department of Basic Science, The University of Tokyo 5 , 3-6-1 Komaba, Meguro-ku, Tokyo 153-8902, Japan

Department of Mechanical Engineering, The University of Tokyo 6 , 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

Institute for AI and Beyond, The University of Tokyo 7 , 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan

WPI Advanced Institute for Materials Research, Tohoku University 8 , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Advanced Science Research Center, Japan Atomic Energy Agency 9 , 2-4 Shirakata, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan

Funding

Japan Society for the Promotion of Science · Core Research for Evolutional Science and Technology

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