Schottky contacts to In2O3
Source abstract
Abstract
n-type binary compound semiconductors such as InN, InAs, or In2O3 are especial because the branch-point energy or charge neutrality level lies within the conduction band. Their tendency to form a surface electron accumulation layer prevents the formation of rectifying Schottky contacts. Utilizing a reactive sputtering process in an oxygen-containing atmosphere, we demonstrate Schottky barrier diodes on indium oxide thin films with rectifying properties being sufficient for space charge layer spectroscopy. Conventional non-reactive sputtering resulted in ohmic contacts. We compare the rectification of Pt, Pd, and Au Schottky contacts on In2O3 and discuss temperature-dependent current-voltage characteristics of Pt/In2O3 in detail. The results substantiate the picture of oxygen vacancies being the source of electrons accumulating at the surface, however, the position of the charge neutrality level and/or the prediction of Schottky barrier heights from it are questioned.
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Research context
OpenAlex topics: Semiconductor materials and interfaces · Semiconductor materials and devices · GaN-based semiconductor devices and materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Universität Leipzig 1 , Fakultät für Physik und Geowissenschaften, Institut für Experimentelle Physik II, Linnéstrasse 5, 04103 Leipzig, Germany
Paul Drude Institut für Festkörperelektronik 2 , Hausvogteiplatz 5-7, 10117 Berlin, Germany
University of California 3 Materials Department, , Santa Barbara, California 93106, USA
References (26)
Show source-provided references
1. Appl. Phys. Lett. · 2010 · 97 · 07210310.1063/1.3480416 ↗
2. Phys. Rev. B · 2013 · 88 · 08530510.1103/PhysRevB.88.085305 ↗
3. Appl. Phys. Lett. · 2012 · 101 · 10210710.1063/1.4751854 ↗
4. Phys. Stat. Sol. A · 2014 · 211 · 4810.1002/pssa.201330224 ↗
5. Phys. Rev. Lett. · 2008 · 101 · 11680810.1103/PhysRevLett.101.116808 ↗
6. Phys. Rev. B · 2012 · 85 · 03530510.1103/PhysRevB.85.035305 ↗
7. Appl. Phys. Lett. · 2011 · 98 · 26191010.1063/1.3604811 ↗
8. Phys. Rev. Lett. · 2012 · 108 · 01680210.1103/PhysRevLett.108.016802 ↗
9. J. Appl. Phys. · 2005 · 97 · 10351710.1063/1.1898436 ↗
10. Appl. Phys. Lett. · 2005 · 87 · 01210210.1063/1.1984089 ↗
11. Appl. Phys. Exp. · 2009 · 2 · 10650210.1143/APEX.2.106502 ↗
12. J. Appl. Phys. · 2010 · 107 · 03370710.1063/1.3298467 ↗
13. Appl. Phys. Lett. · 2011 · 98 · 17210110.1063/1.3583446 ↗
14. J. Vac. Sci. Technol. B · 2009 · 27 · 176910.1116/1.3086718 ↗
15. Thin Solid Films · 2009 · 518 · 111910.1016/j.tsf.2009.02.149 ↗
16. J. Appl. Phys. · 2013 · 113 · 04451110.1063/1.4789000 ↗
17. Phys. Scr. · 1991 · T39 · 25810.1088/0031-8949/1991/T39/039 ↗
18. J. Appl. Phys. · 1991 · 69 · 152210.1063/1.347243 ↗
19. See supplementary material at http://dx.doi.org/10.1063/1.4870536 for details on current transport by thermionic emission and temperature-dependent IV measurements.
20. J. Appl. Phys. · 2011 · 109 · 11372410.1063/1.3592978 ↗
21. Prog. Sol. State Chem. · 2011 · 39 · 7010.1016/j.progsolidstchem.2011.04.002 ↗
22. Thin Solid Films · 1979 · 59 · 25510.1016/0040-6090(79)90298-0 ↗
23. Phys. Rev. B · 2010 · 82 · 16531010.1103/PhysRevB.82.165310 ↗
24. Solid-State Electron. · 1980 · 23 · 115910.1016/0038-1101(80)90028-3 ↗
25. MRS Proc. · 2006 · 957 · 095710.1557/PROC-0957-K03-02 ↗
26. Appl. Phys. A · 2007 · 88 · 13510.1007/s00339-007-3966-0 ↗