journal article·2001-08

Development in Understanding and Controlling the Staebler-Wronski Effect in a-Si:H

Hellmut Fritzsche

Publisher page

Abstract

▪ Abstract Hydrogenated amorphous silicon (a-Si:H) exhibits a metastable light-induced degradation of its optoelectronic properties that is called the Staebler-Wronski effect, after its discoverers. This degradation effect is associated with the relatively high diffusion coefficient of hydrogen and the changes in local bonding coordination promoted by hydrogen. Reviewed are the fundamental aspects of the interplay between hydrogen and electronic energy states that form the basis of competing microscopic models for explaining the degradation effect. These models are tested against the latest experimental observations, and material and preparation parameters that reduce the Staebler-Wronski effect are discussed.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Thin-Film Transistor Technologies · Semiconductor materials and devices · Glass properties and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Energy Conversion Devices, Inc., Troy, Michigan 48084;

References (100+)

Show source-provided references
1. Street RA · 1999
2. 10.1017/CBO978051152524710.1017/CBO9780511525247 ↗
3. 10.1063/1.8967410.1063/1.89674 ↗
4. 10.1103/PhysRevB.35.131610.1103/PhysRevB.35.1316 ↗
5. 10.1016/S0080-8784(08)62867-710.1016/S0080-8784(08)62867-7 ↗
6. 10.1080/1364281870822131910.1080/13642818708221319 ↗
7. 10.1103/PhysRevB.37.420910.1103/PhysRevB.37.4209 ↗
8. 10.1103/PhysRevB.40.623610.1103/PhysRevB.40.6236 ↗
9. Stutzmann M. 1992. Metastability in amorphous and microcrystalline semiconductors. InAmorphous and Microcrystalline Semiconductor Devices: Materials and Device Physics, ed. J Kanicki, pp. 129–87. Norwood, MA: Artech House
10. 10.1103/PhysRevB.24.336010.1103/PhysRevB.24.3360 ↗
11. Taylor PC. 1984. Magnetic resonance measurements in a-Si:H. InSemiconductors and Semimetals, ed. JI Pankove, 21C:99–154. New York: Academic10.1016/S0080-8784(08)63067-7 ↗
12. 10.1016/S0022-3093(99)00814-510.1016/S0022-3093(99)00814-5 ↗
13. 10.1103/PhysRevB.36.325910.1103/PhysRevB.36.3259 ↗
14. 10.1103/PhysRevLett.66.149310.1103/PhysRevLett.66.1493 ↗
15. 10.1103/PhysRevB.23.664810.1103/PhysRevB.23.6648 ↗
16. 10.1103/PhysRevB.40.523510.1103/PhysRevB.40.5235 ↗
17. 10.1016/S0080-8784(08)62707-610.1016/S0080-8784(08)62707-6 ↗
18. 10.1103/PhysRevB.57.1285910.1103/PhysRevB.57.12859 ↗
19. Van de Walle CG. 1999. Hydrogenated interactions with polycrystalline and amorphous silicon–theory. InSemiconductors and Semimetals, 61:241–81. New York: Academic10.1016/S0080-8784(08)62708-8 ↗
20. 10.1016/0921-4526(91)90108-Q10.1016/0921-4526(91)90108-Q ↗
21. 10.1103/PhysRevB.57.225310.1103/PhysRevB.57.2253 ↗
22. 10.1016/0022-3093(95)00638-910.1016/0022-3093(95)00638-9 ↗
23. 10.1080/0141861870820446610.1080/01418618708204466 ↗
24. 10.1016/S0022-3093(98)00333-010.1016/S0022-3093(98)00333-0 ↗
25. 10.1016/S0022-3093(05)80526-510.1016/S0022-3093(05)80526-5 ↗
26. 10.1103/PhysRevLett.65.257510.1103/PhysRevLett.65.2575 ↗
27. 10.1016/0921-4526(91)90138-510.1016/0921-4526(91)90138-5 ↗
28. 10.1103/PhysRevB.43.163110.1103/PhysRevB.43.1631 ↗
29. 10.1103/PhysRevB.48.1711410.1103/PhysRevB.48.17114 ↗
30. 10.1103/PhysRevB.41.105910.1103/PhysRevB.41.1059 ↗
31. 10.1143/JJAP.19.L35710.1143/JJAP.19.L357 ↗
32. 10.1063/1.9240210.1063/1.92402 ↗
33. 10.1016/0022-3093(83)90604-X10.1016/0022-3093(83)90604-X ↗
34. 10.1063/1.9993710.1063/1.99937 ↗
35. 10.1016/0022-3093(93)90519-410.1016/0022-3093(93)90519-4 ↗
36. 10.1016/0022-3093(93)90517-210.1016/0022-3093(93)90517-2 ↗
37. Zhang Q, Takashima H, Zhou JH, Kumeda M, Shimizu T. 1994. Recovery process for light-soaked a-Si:H. InAmorphous Silicon Technology–1994, ed. EA Schiff, M Hack, A Madan, M Powell, A Matsuda, 336:269–74. Pittsburgh: Mater. Res. Soc.10.1557/PROC-336-269 ↗
38. 10.1016/0022-3093(95)00732-610.1016/0022-3093(95)00732-6 ↗
39. 10.1080/1364281940823688510.1080/13642819408236885 ↗
40. 10.1016/S0022-3093(05)80106-110.1016/S0022-3093(05)80106-1 ↗
41. 10.1007/978-3-662-04141-3_610.1007/978-3-662-04141-3_6 ↗
42. 10.1016/0022-3093(89)90673-X10.1016/0022-3093(89)90673-X ↗
43. Schneider U, Schröder B. 1988. Metastable defects in hydrogenated amorphous silicon (a-Si:H) produced by electron irradiation. InAmorphous Silicon and Related Materials, ed. H Fritzsche. pp. 687–717. Singapore: World Scientific10.1142/9789814434157_0024 ↗
44. 10.1103/PhysRevB.32.2310.1103/PhysRevB.32.23 ↗
45. 10.1063/1.9401110.1063/1.94011 ↗
46. 10.1063/1.35622310.1063/1.356223 ↗
47. 10.1103/PhysRevLett.59.103710.1103/PhysRevLett.59.1037 ↗
48. 10.1063/1.10719310.1063/1.107193 ↗
49. 10.1103/PhysRevB.45.1213410.1103/PhysRevB.45.12134 ↗
50. 10.1063/1.10948010.1063/1.109480 ↗
51. 10.1063/1.10292810.1063/1.102928 ↗
52. 10.1016/0022-3093(93)90625-810.1016/0022-3093(93)90625-8 ↗
53. 10.1016/0022-3093(95)00716-410.1016/0022-3093(95)00716-4 ↗
54. Hata N, Ikeda T, Matsuda A. 1996. Nonlinear dependence of μeτeon subgap absorption in pulse and CW light-soaked a-Si:H. InAmorphous Silicon Technology–1996. ed. H Hack, EA Schiff, S Wagner, R Schropp, A Matsuda, 420:575–80Pittsburgh: Mater. Res. Soc.10.1557/PROC-420-575 ↗
55. 10.1016/S0022-3093(99)00871-610.1016/S0022-3093(99)00871-6 ↗
56. 10.1103/PhysRevLett.57.297910.1103/PhysRevLett.57.2979 ↗
57. Yamasaki S, Umeda T, Isoya J, Matsuda A, Tanaka K. 1996. Pulsed ESR study of light-induced metastable defects in17O and13C incorporated a-Si:H. InAmorphous Silicon Technology–1996, ed. H Hack, EA Schiff, S Wagner, R Schropp, A Matsuda, 420:587–92Pittsburgh: Mater. Res. Soc.10.1557/PROC-420-439 ↗
58. 10.1063/1.11614010.1063/1.116140 ↗
59. 10.1080/0141863940824010810.1080/01418639408240108 ↗
60. 10.1103/PhysRevB.47.701310.1103/PhysRevB.47.7013 ↗
61. 10.1016/0038-1098(95)00220-010.1016/0038-1098(95)00220-0 ↗
62. 10.1557/PROC-609-A10.110.1557/PROC-609-A10.1 ↗
63. Nonomura S, Gotoh T, Nishio M, Sakamoto T, Kondo M, et al. 1999. Photoinduced expansion in hydrogenated amorphous silicon. InAmorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices–1999, ed. HM Branz, RW Collins, H Okamoto, S Guha, R Schropp, 557:337–45. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-557-337 ↗
64. 10.1016/S0022-3093(99)00778-410.1016/S0022-3093(99)00778-4 ↗
65. 10.1016/S0022-3093(99)00798-X10.1016/S0022-3093(99)00798-X ↗
66. Shimizu K, Tabuchi T, Hattori K, Kida H, Okamoto H. 1998. Photoinduced structural changes in hydrogenated amorphous silicon. InAmorphous and Microcrystalline Silicon Technology–1998, ed. R Schropp, HM Branz, M Hack, I Shimizu, S Wagner, 507:735–46. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-507-735 ↗
67. 10.1016/S0022-3093(99)00842-X10.1016/S0022-3093(99)00842-X ↗
68. 10.1103/PhysRevLett.74.55810.1103/PhysRevLett.74.558 ↗
69. Kong GL, Zhang DL, Yue GZ, Wang YQ, Liao XB. 1998. Light-excited structural instability of a-Si:H. InAmorphous and Microcrystalline Silicon Technology–1998, ed. R Schropp, HM Branz, M Hack, I Shimizu, S Wagner, 507:697–707. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-507-697 ↗
70. Liu X, Pohl RO, Crandall RS. 1999. Structural origin of bulk molecular hydrogen in hydrogenated amorphous silicon. InAmorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices–1999, ed. HM Branz, RW Collins, H Okamoto, S Guha, R Schropp, 557:323–28. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-557-323 ↗
71. Liu X, Pohl RO, Crandall RS. 1999. Light-induced increase in two-level tunneling states in hydrogenated amorphous silicon. InAmorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices–1999, ed. HM Branz, RW Collins, H Okamoto, S Guha, R Schropp, 557:389–94. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-557-389 ↗
72. 10.1016/S0022-3093(00)00050-810.1016/S0022-3093(00)00050-8 ↗
73. 10.1016/0927-0248(94)90108-210.1016/0927-0248(94)90108-2 ↗
74. 10.1063/1.11992810.1063/1.119928 ↗
75. 10.1103/PhysRevB.61.167710.1103/PhysRevB.61.1677 ↗
76. Yang J, Guha S. 1999. Amorphous silicon alloy materials and solar cells near the threshold of microcrystallinity. InAmorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices–1999, ed. HM Branz, RW Collins, H Okamoto, S Guha, R Schropp, 557:239–50. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-557-239 ↗
77. 10.1063/1.12499210.1063/1.124992 ↗
78. Yang J, Lord K, Guha S, Ovshinsky SR. 2000. Amorphous silicon alloy solar cells near the threshold of amorphous to microcrytalline transition. InAmorphous and Heterogeneous Silicon Thin Films–2000, ed. HM Branz, RW Collins, S Guha, H Okamoto, M Stutzmann, 609: In press. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-609-A15.4 ↗
79. 10.1063/1.12369310.1063/1.123693 ↗
80. 10.1063/1.34889710.1063/1.348897 ↗
81. 10.1016/0022-3093(93)90498-M10.1016/0022-3093(93)90498-M ↗
82. Mahan AH, Reedy RCJr , Iwaniczko E, Wang Q, Nelson BP, et al. 1998. H out-diffusion and device performance in n-i-p solar cells utilizing high temperature hot wire a-Si:H I-layers. InAmorphous and Microcrystalline Silicon Technology–1998, ed. R Schropp, HM Branz, M Hack, I Shimizu, S Wagner, 507:119–26. Warrendale, PA: Mater. Res. Soc.10.1557/PROC-507-119 ↗
83. 10.1080/0141863910822444510.1080/01418639108224445 ↗
84. 10.1063/1.11841810.1063/1.118418 ↗
85. 10.1063/1.11766410.1063/1.117664 ↗
86. Biswas R · J. Non-Cryst. Solids · 2000 · 266 · 178
87. 10.1063/1.10079010.1063/1.100790 ↗
88. 10.1063/1.9942210.1063/1.99422 ↗
89. Santos PV, Jackson WB, Street RA. 1991. An alternative model for the kinetics of light-induced defect in a-Si:H. InAmorphous Silicon Technology–1991, ed. A Madan, Y Hamakawa, MJ Thompson, PC Taylor, PG LeComber, 219:15–20. Pittsburgh, PA: Mater. Res. Soc.10.1557/PROC-219-15 ↗
90. 10.1063/1.35153910.1063/1.351539 ↗
91. 10.1143/JJAP.27.16310.1143/JJAP.27.163 ↗
92. 10.1063/1.10514410.1063/1.105144 ↗
93. 10.1016/S0022-3093(98)00065-910.1016/S0022-3093(98)00065-9 ↗
94. 10.1016/0379-6787(83)90082-010.1016/0379-6787(83)90082-0 ↗
95. 10.1016/0038-1098(92)90328-710.1016/0038-1098(92)90328-7 ↗
96. Brandt MS, Asano A, Stutzmann M. 1993. Are there charged dangling bonds in device quality amorphous silicon? InAmorphous Silicon Technology–1993, ed. EA Schiff, MJ Thompson, A Madan, K Tanaka, PG LeComber, 297:201–6. Pittsburgh: Mater. Res. Soc.10.1557/PROC-297-201 ↗
97. 10.1103/PhysRevB.59.549810.1103/PhysRevB.59.5498 ↗
98. 10.1016/S0022-3093(99)00739-510.1016/S0022-3093(99)00739-5 ↗
99. Fritzsche H. 1997. Search for explaining the Staebler-Wronski effect. InAmorphous and Microcrystalline Silicon Technology–1997, ed. S Wagner, H Hack, EA Schiff, R Schropp, I Shimizu, 467:19–30. Pittsburgh, PA: Mater. Res. Soc.10.1557/PROC-467-19 ↗
100. 10.1103/PhysRevB.50.1159210.1103/PhysRevB.50.11592 ↗