journal article·2026-05-01Open access

The formation mechanism and movement behavior of discrete spots and stripes on a water anode with argon flow regulation

Rongcong Jia, Jinglong Dou, Hao Wang, Kun Gao

AIP Advances· Volume 16· Issue 5

Abstract

A stable glow discharge in ambient air is sustained between the tungsten rod and the water anode via the introduction of argon flow. With the discharge current and gap width fixed while the argon flow rate is varied, patterns are generated on the water anode, which—as observed via fast photography—are dynamic and consist of spots, stripes, labyrinths, or irregular meshes. It can be concluded that the formation of the coexisting spots-and-stripes pattern, the labyrinth pattern, and the irregular mesh pattern is affected by negative ions. To the authors’ knowledge, these patterns have been first observed on the water anode. The newly formed spots—which keep away from the existing spots and stripes in the center of the coexisting spots-and-stripes pattern—increase in number over time and can develop into short or long stripes. The tentacles of stripes in the dynamic labyrinth pattern extend in the direction in which the Coulomb force from the surrounding stripes encounters the least resistance. Some stripes in the center of the dynamic irregular mesh pattern can continuously thicken and expand into cells due to the uneven distribution of negative ions.
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Research context

OpenAlex topics: Electrohydrodynamics and Fluid Dynamics · Chemical and Physical Studies · Nanopore and Nanochannel Transport Studies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

College of Automation and Electrical Engineering, Shandong University of Aeronautics 1 , Binzhou 256603,

College of Aeronautical Engineering, Shandong University of Aeronautics 2 , Binzhou 256603,

Funding

Shandong University of Aeronautics Doctoral Startup

References (36)

Show source-provided references
1. Phys. Plasmas · 2019 · 26 · 03350710.1063/1.5080184 ↗
2. Plasma Sci. Technol. · 2019 · 21 · 04300110.1088/2058-6272/aafbc6 ↗
3. Plasma Processes Polym. · 2019 · 16 · e180012810.1002/ppap.201800128 ↗
4. Sci. Adv. · 2019 · 5 · eaat577810.1126/sciadv.aat5778 ↗
5. Plasma Sources Sci. Technol. · 2016 · 25 · 05300210.1088/0963-0252/25/5/053002 ↗
6. RSC Adv. · 2017 · 7 · 182210.1039/c6ra24762h ↗
7. RSC Adv. · 2017 · 7 · 3124410.1039/c7ra04663d ↗
8. J. Phys. D: Appl. Phys. · 2016 · 49 · 39300210.1088/0022-3727/49/39/393002 ↗
9. J. Phys. D: Appl. Phys. · 2008 · 41 · 21520110.1088/0022-3727/41/21/215201 ↗
10. Plasma Sources Sci. Technol. · 2020 · 29 · 03400410.1088/1361-6595/ab7089 ↗
11. Plasma Sources Sci. Technol. · 2008 · 17 · 04501410.1088/0963-0252/17/4/045014 ↗
12. Plasma Sources Sci. Technol. · 2014 · 23 · 05401010.1088/0963-0252/23/5/054010 ↗
13. Phys. Plasmas · 2019 · 26 · 11350110.1063/1.5116063 ↗
14. Plasma Processes Polym. · 2020 · 17 · 190022310.1002/ppap.201900223 ↗
15. J. Appl. Phys. · 2009 · 105 · 08331210.1063/1.3117223 ↗
16. IEEE Trans. Plasma Sci. · 2008 · 36 · 12610.1109/TPS.2007.913888 ↗
17. Plasma Sources Sci. Technol. · 2008 · 17 · 04500110.1088/0963-0252/17/4/045001 ↗
18. Phys. Plasmas · 2018 · 25 · 07350210.1063/1.5030099 ↗
19. Appl. Phys. Express · 2009 · 2 · 03600110.1143/apex.2.036001 ↗
20. Plasma Sources Sci. Technol. · 2015 · 24 · 01501010.1088/0963-0252/24/1/015010 ↗
21. IEEE Trans. Plasma Sci. · 2011 · 39 · 265210.1109/tps.2011.2158324 ↗
22. Phys. Plasmas · 2017 · 24 · 11350410.1063/1.5010209 ↗
23. Plasma Sources Sci. Technol. · 2020 · 29 · 12501810.1088/1361-6595/abcc4f ↗
24. J. Phys. D: Appl. Phys. · 2014 · 47 · 07950210.1088/0022-3727/47/7/079502 ↗
25. IEEE Trans. Plasma Sci. · 2019 · 47 · 321410.1109/TPS.2019.2918065 ↗
26. Plasma Sources Sci.Technol. · 2019 · 28 · 05500610.1088/1361-6595/aaffff ↗
27. Appl. Phys. Lett. · 2009 · 94 · 11150110.1063/1.3099339 ↗
28. J. Appl. Phys. · 2013 · 113 · 23330210.1063/1.4811339 ↗
29. Plasma Sources Sci. Technol. · 2015 · 24 · 05502110.1088/0963-0252/24/5/055021 ↗
30. J. Phys. D: Appl. Phys. · 2009 · 42 · 14200310.1088/0022-3727/42/14/142003 ↗
31. Plasma Sources Sci. Technol. · 2020 · 29 · 06501510.1088/1361-6595/ab6362 ↗
32. Plasma Sources Sci. Technol. · 2022 · 31 · 08501010.1088/1361-6595/ac83ed ↗
33. J. Phys. D: Appl. Phys. · 2016 · 49 · 42520410.1088/0022-3727/49/42/425204 ↗
34. J. Phys. D: Appl. Phys. · 2016 · 49 · 29520510.1088/0022-3727/49/29/295205 ↗
35. Plasma Sources Sci. Technol. · 2019 · 28 · 10501410.1088/1361-6595/ab45e4 ↗
36. IEEE Trans. Plasma Sci. · 2011 · 9 · 211210.1109/TPS.2011.2158557 ↗