journal article·2025-07-01Open access

Study of thermal stresses in InAs/GaSb type-II superlattice focal plane arrays via multi-scale finite element modeling

Yong Xue, Qing Xu, Min Huang, Zhen Wang, Zhaoming Liang, Nan Wang, Zhizhong Bai, Jianxin Chen

AIP Advances· Volume 15· Issue 7

Abstract

The thermal stress, significantly impacting the performance of infrared detectors, is typically caused by the thermal mismatch between adjacent materials. This presents a complex physical picture for InAs/GaSb type-II superlattice focal plane arrays, as it requires an analysis across multiple scales, from millimeter-scale device structures to micron-scale mesa-structured pixels. In this paper, an innovative multi-scale finite element model for InAs/GaSb type-II superlattice infrared focal plane array detectors has been developed, revealing the equivalent stress and its distribution along the mesa sidewall for the first time. Based on the specific boundary displacement method, an InAs/GaSb type-II superlattice infrared detector with 320 × 256 micro-mesa arrays is built, and the impact of various structural parameters, including pixel sizes, channel widths, indium bump diameters, and mechanical properties of underfill, on the pixel stresses is investigated. Simulation results indicate that, for the same pixel, the equivalent stress of the sidewall is higher and more sensitive to structural parameters compared to that of the planar surface. Our research offers a novel approach for the accurate and efficient simulation of thermal stresses in infrared detectors with mesa structures and provides valuable guidance for analyzing failure mechanisms and optimizing low-stress designs in InAs/GaSb type-II superlattice focal plane infrared detectors.
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Research context

OpenAlex topics: Advanced Semiconductor Detectors and Materials · Semiconductor Quantum Structures and Devices · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory of Infrared Imaging Materials and Detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences 1 , Shanghai 200083,

2 School of Microelectronics, Shanghai University, Shanghai 201800, China

Funding

The Strategic Priority Research Program of the Chinese Academy of Science · National Natural Science Foundation of China · National Key Research and Development Program of China · Special Innovation Program of Shanghai Institute of Technical Physics · National Key Laboratory of Infrared Detection Technologies

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