Enhanced exchange bias in MnN/CoFe bilayers after high-temperature annealing
Source abstract
Abstract
We report an exchange bias of more than 2700 Oe at room temperature in MnN/CoFe bilayers after high-temperature annealing. We studied the dependence of exchange bias on the annealing temperature for different MnN thicknesses in detail and found that samples with tMnN > 32nm show an increase of exchange bias for annealing temperatures higher than TA = 400 °C. Maximum exchange bias values exceeding 2000 Oe with reasonably small coercive fields around 600 Oe are achieved for tMnN = 42, 48 nm. The median blocking temperature of those systems is determined to be 180 °C after initial annealing at TA = 525 °C. X-ray diffraction measurements and Auger depth profiling show that the large increase of exchange bias after high-temperature annealing is accompanied by strong nitrogen diffusion into the Ta buffer layer of the stacks.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Copper Interconnects and Reliability
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Affiliations
Center for Spinelectronic Materials and Devices, Department of Physics, Bielefeld University , D-33501 Bielefeld, Germany
Funding
Ministerium für Innovation, Wissenschaft und Forschung des Landes Nordhein-Westfalen
References (18)
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