A low TCR MEMS heater developed for cryogenic application
Source abstract
Abstract
A microheater with a small temperature coefficient of resistance (TCR) at liquid hydrogen temperature was designed and fabricated by microfabrication technology. The NiCr heater annealed in N2 at 250 °C achieved the smallest TCR. The crystal structures of the NiCr film annealed in nitrogen were analyzed using a scanning electron microscope (SEM) and by x-ray diffraction (XRD). The crystallization of the NiCr film improved with the increase in annealing temperature. The failure mechanism of the microheater is studied, and it is seen that the central area of the heating film and the joint of the heating film and the electrode are most vulnerable to destruction.
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Research context
OpenAlex topics: Semiconductor materials and devices · Copper Interconnects and Reliability · Electronic Packaging and Soldering Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Jiangxi Province Key Laboratory of Precision Drive and Control, Nanchang Institute of Technology 1 , Nanchang 330099, China
China Manned Space Agency 2 , Beijing 100071, China
Hangtian Yueshen (Hangzhou) Information Technology Co., Ltd. 3 , Hangzhou 310024, China
Funding
Key Science and Technology Research Project in Jiangxi Province Department of Education
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