Morphology-selective preparation and formation mechanism of few-layer graphene on Cu substrate by liquid-phase pulsed laser ablation

This paper presented a morphology-selective preparation and formation mechanism of few-layer graphene (FLG) on a Cu substrate by pulsed laser ablation in liquid. It is a simple and controllable route to grow FLG directly on the surface of a copper foil at ambient temperature and normal pressure, which does not need other precursor materials. FLG with 3–10 layers of thickness and continuous hundreds of micrometers in lateral size is obtained. The morphology and structure of FLG were investigated by using a Raman spectrometer, scanning electron microscope, high-resolution transmission electron microscope, and atomic force microscope. The formation mechanism of FLG and the role of the plasma-produced carbon species are put forward based on the interaction between the laser, material, and substrate. Our finding, the direct deposition of FLG on the Cu substrate by pulsed laser ablation in liquid, will open a door to apply this green route to the production of FLG with controlled morphology.