journal article·2019-02-01Open access

An improved analytical model for the statistics of SET emergence point in HfO2 memristive device

Dong Xiang, Rulin Zhang, Yu Li, Cong Ye, Enrique Miranda, Jordi Suñé, Shibing Long

AIP Advances· Volume 9· Issue 2

Abstract

In this work, an improved analytical model for the SET switching statistics of HfO2 memristive device is developed from the cell-based percolation model. The statistical results of the SET emergence point related to the beginning stage during SET process are systematically discussed. Moreover, the deviation from Weibull model in high percentiles region is found to originate from the uneven distribution of defect density. Our improved model exhibits excellent consistency with experimental results in Cu/HfO2/Pt device. Besides, we explain the relationship between the parameters of the model and SET resistance. The underlying mechanism of SET process for HfO2 memristive device is fully illuminated.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Neuroscience and Neural Engineering · Ferroelectric and Negative Capacitance Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Mechatronics Engineering, Harbin Institute of Technology 1 , Harbin 150001, China

Hubei Key Laboratory of Applied Mathematics, Faculty of Physics and Electronic Science, Hubei University 2 , Wuhan 430062, China

Key Laboratory of Microelectronics Devices & Integration Technology, Institute of Microelectronics of Chinese Academy of Sciences 3 , Beijing 100029, China

Departamentd’Enginyeria Electrònica, Universitat Autònoma de Barcelona 4 , Bellaterra 08193, Spain

School of Microelectronics, University of Science and Technology of China 5 , Hefei 230027, China

Funding

National Natural Science Foundation of China

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