Catalytic property of an indium-deposited powder-type material containing silicon and its dependence on the dose of indium nano-particles irradiated by a pulse arc plasma process
Abstract
Research context
OpenAlex topics: Catalytic Processes in Materials Science · Semiconductor materials and devices · Electron and X-Ray Spectroscopy Techniques
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Affiliations
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University 1 , 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Department of Applied Chemistry, Graduate School of Engineering, Osaka University 2 , 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
Frontier Research Base for Young Researchers, Graduate School of Engineering, Osaka University 3 , 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
National Institute of Advanced Industrial Science and Technology (AIST) 4 , 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
Advance Riko, Inc. 5 , 4388 Ikonobe-cho, Tsuzukiku, Yokohama, Kanagawa 224-0053, Japan
Funding
Japan Society for the Promotion of Science