Design of a patterned nanostructure array using a nanosecond pulsed laser
Source abstract
Abstract
For design the patterned nanostructure array (PNSA) on material surface using a nanosecond pulsed laser, we investigated the influence of phase shift between scattered lights on silicon (Si) substrate using 30-nm-wide gold lines (GLs) spacings. At a spacing of 5,871 nm, ten nanodot (ND) arrays were formed at intervals of 533 nm by nanosecond pulsed laser. The results show that the formation of the PNSA was affected by the resonance of scattered light. We conclude that ND arrays were formed with a spacing of Λ = nλ. And we have designed PNSA comprising two ND arrays on the substrate. The PNSA with dimensions of 1,600 nm × 1,600 nm was prepared using GLs.
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Research context
OpenAlex topics: Laser Material Processing Techniques · Silicon Nanostructures and Photoluminescence · Photonic and Optical Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Faculty of Engineering, Kitami Institute of Technology 1 , Koen-cho, Kitami, Hokkaido 090-8507, Japan
Research Institute for Electronic Science, Hokkaido University 2 , Kita-20, Nishi-10, Kita-ku, Sapporo, Hokkaido 001-0020, Japan
Center for Advanced Research of Energy and Materials & Graduate School of Engineering, Hokkaido University 3 , Kita-8, Nishi-13, Kita-ku, Sapporo, Hokkaido 060-8628, Japan
Funding
Amada Foundation
References (18)
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