Modification of strain and optical polarization property in AlGaN multiple quantum wells by introducing ultrathin AlN layer
Source abstract
Abstract
The effects of ultrathin AlN insertion layers on the strain status, as well as optical properties of AlGaN multiple quantum wells (MQWs), were studied. A large stress variation of about -1.46 GPa can be achieved by introducing two ultrathin AlN layers at each interface between the quantum well and the barrier, thereby resulting in the fact that the degree of polarization is increased from 17.8% to 22.3% in traditional MQWs. In addition, the quantum well emission are found to become symmetric and narrower due to the suppression of compositional fluctuation. These results provide a simple technique to modify the strain field of MQWs so as to improve transverse-electric polarized emission for deep ultraviolet light emitting diodes.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · Metal and Thin Film Mechanics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Engineering Research Center of Micro-nano Optoelectronic Materials and Devices, Ministry of Education; Fujian Key Laboratory of Semiconductor Materials and Applications, CI Center for OSED, Jiujiang Res Inst and Department of Physics, Xiamen University , Xiamen 361005, China
Funding
National Natural Science Foundation of China · Ministry of Science and Technology of the People's Republic of China
References (34)
Show source-provided references
1. Semicond. Sci. Technol. · 2011 · 26 · 01403610.1088/0268-1242/26/1/014036 ↗
2. Water Res. · 2011 · 45 · 148110.1016/j.watres.2010.11.015 ↗
3. Appl. Phys. Express. · 2016 · 9 · 02550110.7567/apex.9.025501 ↗
4. Sci. Rep. · 2016 · 6 · 3593410.1038/srep35934 ↗
5. Appl. Phys. Lett. · 2015 · 106 · 16210210.1063/1.4919005 ↗
6. Sci. Rep. · 2016 · 6 · 2189710.1038/srep21897 ↗
7. Sci. Rep. · 2017 · 7 · 1442210.1038/s41598-017-14825-8 ↗
8. ECS J Solid State Sc. · 2017 · 6 · Q4210.1149/2.0111704jss ↗
9. Appl. Phys. Lett. · 2015 · 106 · 18210210.1063/1.4920985 ↗
10. J. Appl. Phys. · 2014 · 116 · 11350610.1063/1.4895995 ↗
11. Appl. Phys. Lett. · 2012 · 100 · 02110110.1063/1.3675451 ↗
12. Sci. Rep. · 2016 · 6 · 2298310.1038/srep22983 ↗
13. Appl. Phys. Lett. · 2010 · 97 · 17110510.1063/1.3506585 ↗
14. Appl. Phys. Lett. · 2015 · 107 · 14210110.1063/1.4932651 ↗
15. IEEE Photonics J · 2018 · 10 · 6100807
16. Sci. Rep. · 2016 · 6 · 2253710.1038/srep22537 ↗
17. IEEE Photonics J. · 2018 · 10 · 8200913
18. Appl. Phys. Lett. · 2018 · 112 · 01110110.1063/1.5007835 ↗
19. Superlattice Microst. · 2017 · 112 · 66510.1016/j.spmi.2017.10.025 ↗
20. Appl. Phys. Lett. · 2017 · 110 · 07110310.1063/1.4976203 ↗
21. Opt. Express. · 2017 · 25 · 2636510.1364/oe.25.026365 ↗
22. Opt. Express. · 2018 · 26 · 68010.1364/oe.26.000680 ↗
23. Phys. Rev. B. · 2002 · 65 · 12520310.1103/physrevb.65.125203 ↗
24. Appl. Phys. Express. · 2011 · 4 · 03100110.1143/apex.4.031001 ↗
25. J. Mater. Res. · 2010 · 25 · 103710.1557/jmr.2010.0135 ↗
26. J. Appl. Phys. · 1999 · 85 · 850510.1063/1.370696 ↗
27. IEEE Photonics J. · 2016 · 8 · 1601710
28. J. Cryst. Growth · 2006 · 290 · 22510.1016/j.jcrysgro.2006.01.021 ↗
29. J. Phys.: Condens. Matter · 2007 · 19 · 17600510.1088/0953-8984/19/17/176005 ↗
30. Nano Lett. · 2017 · 17 · 484610.1021/acs.nanolett.7b01697 ↗
31. Proc. SPIE · 2019 · 10526 · 105261D10.1117/12.2290341 ↗
32. Opt. Express · 2014 · 22 · 1958910.1364/oe.22.019589 ↗
33. Appl. Phys. Lett. · 2011 · 99 · 26110510.1063/1.3672209 ↗
34. Opt. Express · 2016 · 24 · 261105