journal article·2016-05-01Open access

Fabrication and characterization of CuxSi1−x films on Si (111) and Si (100) by pulsed laser deposition

Song Zhang, Jun Wu, Zhiqiang He, Jun Xie, Jingqi Lu, Rong Tu, Lianmeng Zhang, Ji Shi

AIP Advances· Volume 6· Issue 5

Abstract

The CuxSi1−x thin films have been successfully fabricated by pulsed laser deposition (PLD). The influences of laser energy fluency (I0) and deposition temperature (Td) on the phase structure were investigated. The results show that Cu deposited on Si (001) at I0 = 0.5-2.0 J/cm2, and η”-Cu3Si formed on Si (111) at I0 = 1.0-2.0 J/cm2. The films were consisted of Cu, η’-Cu3Si, ε-Cu15Si4 and δ-Cu0.83Si0.17 at Td = 100-500 °C on Si (001). The films were the single phase of η-Cu3Si at Td = 700 °C. In the case of Si (111), the phase structures transformed from Cu to Cu + η’-Cu3Si to η’-Cu3Si to η’-Cu3Si + η-Cu3Si with the increasing of Td. Rectangular grains were formed on Si (001), whereas triangular grains on Si (111). Cu (001) film was epitaxially grown on Si (001) at I0 = 1.5 J/cm2 and Td = 20 °C. η-Cu3Si (001) epitaxial layer was formed on Si (111) at I0 = 1.5 J/cm2 and Td = 700 °C. The epitaxial relationships of Cu (001)[100]//Si (001)[110] and η-Cu3Si (001)[-110]//Si (111)[11-2] were identified.
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Research context

OpenAlex topics: Semiconductor materials and interfaces · Chalcogenide Semiconductor Thin Films · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Wuhan University of Technology 1 State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, , 122 Luoshi Road, Wuhan 430070, People’s Republic of China

Wuhan University of Technology 2 State Key Laboratory of Silicate Materials for Architectures, , 122 Luoshi Road, Wuhan 430070, People’s Republic of China

Wuhan University of Technology 3 School of Science, , Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070, People’s Republic of China

Tohoku University 4 Institute for Materials Research, , 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Tokyo Institute of Technology 5 Department of Metallurgy and Ceramics Science, , 2-12-1, Ookayama, Meguro-ku, Tokyo 152-8552, Japan

Funding

111 Project · National Natural Science Foundation of China · Natural Science Foundation of Hubei Province

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