Modeling electric charge distribution on insulator under electron bombardment: Case of rectangular surface implantation
Source abstract
Abstract
Despite progress in the study of dielectric properties and the formation of secondary electrons images and especially in the understanding of their mirror curve shape, since the first models for mirror equation were developed, an exact quantitative prediction of the mirror curve for most materials has remained an unsolved problem. In this paper, recent development in the characterization of charge trapping ability of insulators using the scanning electron microscope mirror method (SEMMM) is reviewed. All this work has resulted in unprecedented insights into the early stage of dielectric study and it is also relevant for a deeper understanding of this anomalous effect (mirror effect) as well as for discussion of the factors affecting it. So the dependency of elliptic mirror and the anisotropic effect in the trapping phenomena of charge is highlighted.
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Research context
OpenAlex topics: Electron and X-Ray Spectroscopy Techniques · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Faculté des sciences de Sfax 1 LaMaCop, , Sfax, C.P 3038, Tunisia
Direction des applications Militaires 2 CEA, , Bâtiment DAM, B.P. 12, 91680, Bruyères-Le-Chatel, France
References (15)
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