journal article·2022-06-01Open access

L21 ordering of Co2FeSn thin films promoted by high-temperature annealing

Kohei Fujiwara, Koya Shibata, Shunsuke Nishimura, Junichi Shiogai, Atsushi Tsukazaki

AIP Advances· Volume 12· Issue 6

Abstract

We report the effect of annealing on the crystalline ordering and physical properties in thin films of a nodal line semimetal candidate L21-type Co2FeSn. The Co–Fe–Sn films with a composition of Co:Fe:Sn ∼ 2:1:1 were deposited on MgO(001) substrates at a substrate temperature of 150 °C by radio-frequency magnetron sputtering. The as-deposited film showed x-ray diffraction patterns corresponding to the B2 ordering. Annealing at 600 and 700 °C after the deposition resulted in the appearance of the (111) diffraction peak, which is characteristic of the L21 ordering. Although anomalous Hall conductivity and transverse thermoelectric conductivity decreased from those of the as-deposited film with the annealing-induced L21 ordering, the low anomalous Hall conductivity of the 700 °C-annealed film was consistent with the theoretically estimated low value. These results show the significant influence of crystalline ordering on the electrical and thermoelectric transport properties. The annealing process is beneficial for studying the exotic physics arising from topological band features in the L21-ordered Co2FeSn thin films.
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Research context

OpenAlex topics: Heusler alloys: electronic and magnetic properties · Advanced Thermoelectric Materials and Devices · Surface and Thin Film Phenomena

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute for Materials Research, Tohoku University 1 , Sendai 980-8577, Japan

Center for Spintronics Research Network (CSRN), Tohoku University 2 , Sendai 980-8577, Japan

Center for Science and Innovation in Spintronics (CSIS), Tohoku University 3 , Sendai 980-8577, Japan

Funding

Core Research for Evolutional Science and Technology · Foundation for Interactions in Science and Technology

References (50)

Show source-provided references
1. Sci. Technol. Adv. Mater. · 2008 · 9 · 01410110.1088/1468-6996/9/1/014101 ↗
2. J. Phys. D: Appl. Phys. · 2010 · 43 · 19300110.1088/0022-3727/43/19/193001 ↗
3. J. Phys. D: Appl. Phys. · 2014 · 47 · 19300110.1088/0022-3727/47/19/193001 ↗
4. APL Mater. · 2015 · 3 · 04151810.1063/1.4917387 ↗
5. Nat. Rev. Mater. · 2018 · 3 · 24410.1038/s41578-018-0036-5 ↗
6. APL Mater. · 2019 · 7 · 08090710.1063/1.5099576 ↗
7. APL Mater. · 2020 · 8 · 04091310.1063/5.0005481 ↗
8. J. Phys.: Condens. Matter · 2022 · 34 · 01300110.1088/1361-648x/ac268c ↗
9. Nat. Phys. · 2018 · 14 · 111910.1038/s41567-018-0225-6 ↗
10. NPG Asia Mater. · 2019 · 11 · 1610.1038/s41427-019-0116-z ↗
11. Nat. Commun. · 2020 · 11 · 347610.1038/s41467-020-17174-9 ↗
12. Phys. Rev. B · 2011 · 84 · 23512610.1103/physrevb.84.235126 ↗
13. Chin. Phys. B · 2016 · 25 · 11710610.1088/1674-1056/25/11/117106 ↗
14. Rev. Mod. Phys. · 2010 · 82 · 153910.1103/revmodphys.82.1539 ↗
15. Phys. Rev. B · 2018 · 98 · 241106(R)10.1103/physrevb.98.241106 ↗
16. Phys. Rev. B · 2018 · 97 · 03510510.1103/physrevb.97.035105 ↗
17. Phys. Rev. Mater. · 2018 · 2 · 03440210.1103/physrevmaterials.2.034402 ↗
18. J. Phys. D: Appl. Phys. · 2013 · 46 · 21300110.1088/0022-3727/46/21/213001 ↗
19. Phys. Rev. X · 2018 · 8 · 04104510.1103/physrevx.8.041045 ↗
20. npj Comput. Mater. · 2020 · 6 · 7710.1038/s41524-020-0342-5 ↗
21. J. Appl. Crystallogr. · 2011 · 44 · 127210.1107/s0021889811038970 ↗
22. Phys. Rev. B · 2011 · 83 · 17441010.1103/physrevb.83.174410 ↗
23. J. Appl. Phys. · 2013 · 113 · 20391810.1063/1.4808098 ↗
24. Mater. Res. Express · 2019 · 6 · 11611910.1088/2053-1591/ab48ae ↗
25. Appl. Phys. Lett. · 2019 · 115 · 25240110.1063/1.5127553 ↗
26. Phys. Rev. B · 2020 · 101 · 13440710.1103/physrevb.101.134407 ↗
27. AIP Adv. · 2020 · 10 · 08502010.1063/5.0018640 ↗
28. J. Appl. Phys. · 2021 · 130 · 22530110.1063/5.0071807 ↗
29. Sci. Rep. · 2019 · 9 · 328210.1038/s41598-019-39817-8 ↗
30. Appl. Phys. Lett. · 2021 · 118 · 14050410.1063/5.0046877 ↗
31. Jpn. J. Appl. Phys. · 2005 · 44 · L110010.1143/jjap.44.l1100 ↗
32. J. Phys. D: Appl. Phys. · 2006 · 39 · 82410.1088/0022-3727/39/5/s08 ↗
33. J. Phys. D: Appl. Phys. · 2006 · 39 · 83410.1088/0022-3727/39/5/s09 ↗
34. Appl. Phys. Lett. · 2006 · 89 · 11251410.1063/1.2354026 ↗
35. J. Appl. Phys. · 2009 · 105 · 07B10910.1063/1.3075989 ↗
36. Phys. Rev. B · 2011 · 84 · 13441310.1103/physrevb.84.134413 ↗
37. Appl. Phys. Lett. · 2013 · 103 · 04240510.1063/1.4816382 ↗
38. J. Appl. Phys. · 2017 · 121 · 22390210.1063/1.4984891 ↗
39. Phys. Rev. B · 2020 · 101 · 06040610.1103/physrevb.101.060406 ↗
40. J. Phys. Chem. Solids · 1974 · 35 · 110.1016/0022-3697(74)90002-x ↗
41. Thin Solid Films · 2010 · 518 · S27810.1016/j.tsf.2009.10.107 ↗
42. Phys. Rev. Appl. · 2017 · 8 · 03401210.1103/physrevapplied.8.034012 ↗
43. Phys. Rev. Mater. · 2019 · 3 · 11441210.1103/physrevmaterials.3.114412 ↗
44. Appl. Phys. Express · 2020 · 13 · 04300110.35848/1882-0786/ab79fe ↗
45. Phys. Rev. B · 2021 · 103 · L02040210.1103/physrevb.103.l020402 ↗
46. Adv. Electron. Mater. · 2022 · 210138010.1002/aelm.202101380 ↗
47. Phys. Rev. · 1969 · 181 · 133610.1103/physrev.181.1336 ↗
48. New J. Phys. · 2013 · 15 · 03301410.1088/1367-2630/15/3/033014 ↗
49. Phys. Rev. B · 2020 · 101 · 180404(R)10.1103/physrevb.101.180404 ↗
50. Phys. Rev. B · 2019 · 100 · 05442210.1103/physrevb.100.054422 ↗