Controlling domain wall nucleation and injection through focussed ion beam irradiation in perpendicularly magnetized nanowires

Using Ga+ focussed ion beam irradiation of Ta/Pt/CoFeB/Pt perpendicularly magnetized nanowires, the nucleation and injection fields of domain walls into the nanowires is controlled. The nucleation and injection fields can be varied as a function of dose, however, the range of injection fields is found to be limited by the creation of a step in anisotropy between the irradiated and unirradiated regions. This can be altered by defocussing the beam, which allows the injection fields to be further reduced. The ability to define an arbitrary dose profile allows domain walls to be injected at different fields either side of an asymmetrically irradiated area, which could form the initial stage of a logic device. The effect of the thickness of the magnetic layer and the thickness of a Ta underlayer on the dose required to remove the perpendicular anisotropy is also studied and is seen that for similar Ta underlayers the dose is determined by the thickness of the magnetic layer rather than its anisotropy. This finding is supported by some transport of ions in matter simulations.