journal article·2023-02-01Open access

Effects of Al doping on dislocation inclinations and strain of GaN films on Si substrates

Jie Zhang, Xuelin Yang, Hongping Ma, Qingchun Zhang, Bo Shen

AIP Advances· Volume 13· Issue 2

Abstract

We present how the interaction between Al dopants and threading dislocations affects dislocation inclinations and then plays an important role in controlling residual strain in GaN-on-Si epitaxial films. When the Al concentration in the GaN epitaxial film is increased to 0.85%, the dislocations extend almost in the growth direction, contributing to a strain-free epitaxial film. We suggest that the Al atoms could substitute for Ga vacancies at the dislocation cores on the growth surface and then inhibit the dislocation inclinations. The suppressed dislocation inclinations lead to a reduced relaxation of compressive strain. The results pave a new way to control dislocation movements and strain in GaN epitaxial films on Si substrates.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Metal and Thin Film Mechanics · Semiconductor materials and devices

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Affiliations

Institute of Wide Bandgap Semiconductors and Future Lighting, Academy for Engineering and Technology, Fudan University 1 , Shanghai 200433, China

Shanghai Research Center for Silicon Carbide Power Devices Engineering and Technology, Fudan University 2 , Shanghai 200433, China

State Key Laboratory of Artificial Microstructure and Mesoscopic Physics, School of Physics, Peking University 3 , Beijing 100871, People’s Republic of China

Collaborative Innovation Center of Quantum Matter 4 , Beijing 100871, People’s Republic of China

Funding

Key Research and Development Program of Guangdong Province · National Key Research and Development Program of China · National Natural Science Foundation of China · China Postdoctoral Science Foundation

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