Molecular beam epitaxial growth and electronic transport of GaInSb/GaSb (111) quantum wells
Source abstract
Abstract
We report on the epitaxial growth of antimony-based GaSb/Ga1−xInxSb/GaSb quantum wells (QWs) on the (111) plane. Different from the more common (001) heterostructures, (111) structures offer certain advantages in electronic properties, such as the existence of the strain-induced piezoelectric effect, as well as a large effective mass of hole carriers along the growth axis. In the present work, we found that high-quality QWs can be successfully grown using a GaSb buffer layer on a vicinal GaAs (111)B substrate. Due to the presence of the piezoelectric field and the surface states, hole carriers are introduced in the QW without intentional doping. Electrical transport measurements on an x = 0.1 sample at 300 mK show that the QW has a two-dimensional hole gas (2DHG) density of 6.7 × 1011 cm−2 and a mobility of 28 000 cm2/Vs. The 2DHG exhibits clear Shubnikov–de Haas oscillations and the integer quantum Hall effect under a perpendicular magnetic field.
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Research context
OpenAlex topics: Semiconductor Quantum Structures and Devices · Electronic and Structural Properties of Oxides · Advanced Semiconductor Detectors and Materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
International Center for Quantum Materials, School of Physics, Peking University , Beijing 100871, China
Funding
National Key Research and Development Program of China · Strategic Priority Research Program of the Chinese Academy of Sciences
References (33)
Show source-provided references
1. Physica E · 2004 · 20 · 19610.1016/j.physe.2003.08.003 ↗
2. Appl. Phys. Lett. · 1989 · 55 · 78910.1063/1.101761 ↗
3. Appl. Phys. Lett. · 1990 · 57 · 90510.1063/1.103400 ↗
4. J. Vac. Sci. Technol. B · 1984 · 2 · 21410.1116/1.582786 ↗
5. Surf. Sci. · 1980 · 98 · 7010.1016/0039-6028(80)90477-x ↗
6. J. Appl. Phys. · 1987 · 62 · 254510.1063/1.339468 ↗
7. Appl. Phys. Lett. · 1990 · 56 · 75810.1063/1.102704 ↗
8. Appl. Phys. Lett. · 1991 · 59 · 111710.1063/1.106362 ↗
9. Phys. Rev. Lett. · 2015 · 114 · 09680210.1103/physrevlett.114.096802 ↗
10. Europhys. Lett. · 2001 · 55 · 54510.1209/epl/i2001-00450-8 ↗
11. Phys. Rev. Lett. · 2017 · 119 · 05680310.1103/physrevlett.119.056803 ↗
12. Phys. Rev. Lett. · 2008 · 100 · 05660210.1103/PhysRevLett.100.056602 ↗
13. Phys. Rev. Lett. · 2012 · 109 · 18680310.1103/physrevlett.109.186803 ↗
14. Phys. Rev. Lett. · 2013 · 111 · 15640210.1103/physrevlett.111.156402 ↗
15. 2D Mater. · 2020 · 7 · 01100110.1088/2053-1583/ab42b9 ↗
16. NPG Asia Mater. · 2014 · 6 · e14710.1038/am.2014.113 ↗
17. Phys. Rev. Lett. · 2013 · 111 · 13680410.1103/physrevlett.111.136804 ↗
18. Appl. Phys. Lett. · 1991 · 59 · 65910.1063/1.105356 ↗
19. Phys. Rev. B · 1993 · 48 · 1788510.1103/physrevb.48.17885 ↗
20. Jpn. J. Appl. Phys. · 1987 · 26 · L30210.1143/jjap.26.l302 ↗
21. Appl. Phys. Lett. · 1991 · 59 · 239410.1063/1.106409 ↗
22. Appl. Phys. Lett. · 1991 · 59 · 189910.1063/1.106182 ↗
23. J. Vac. Sci. Technol. B · 1991 · 9 · 231210.1116/1.585739 ↗
24. J. Cryst. Growth · 1999 · 203 · 29710.1016/s0022-0248(99)00132-3 ↗
25. Phys. Rev. B · 2004 · 70 · 20530710.1103/physrevb.70.205307 ↗
26. Phys. Status Solidi B · 1968 · 25 · 32310.1002/pssb.19680250131 ↗
27. J. Appl. Phys. · 2001 · 89 · 581510.1063/1.1368156 ↗
28. J. Phys. C: Solid State Phys. · 1986 · 19 · 677710.1088/0022-3719/19/34/015 ↗
29. Phys. Solid State · 2002 · 44 · 176910.1134/1.1507263 ↗
30. Phys. Rev. B · 1991 · 44 · 379310.1103/physrevb.44.3793 ↗
31. Phys. Rev. B · 2019 · 99 · 11543510.1103/physrevb.99.115435 ↗
32. 2003 · 35
33. Phys. Rev. B · 1993 · 47 · 965010.1103/physrevb.47.9650 ↗