journal article·2022-08-01Open access

Self-formation of InAs/InGaAsSb type-II superlattice structures on InP substrates by MBE and their application to mid-infrared LEDs

Kou Uno, Naoto Iijima, Naoya Miyashita, Koichi Yamaguchi

AIP Advances· Volume 12· Issue 8

Abstract

InAs/InGaAsSb type-II superlattice structures (SLSs) were spontaneously formed by the molecular beam epitaxy of InAs/GaAs0.86Sb0.14 SLSs on InP substrates. The strain due to lattice mismatch between InAs and GaAs0.86Sb0.14 induced two exchange reactions of In–Ga and As–Sb at both InAs/GaAs0.86Sb0.14 heterointerfaces, resulting in the strain relaxation and the self-formation of InAs/InGaAsSb type-II SLS. By energy dispersive x-ray spectroscopy analysis, the mixed crystal composition of the InGaAsSb layer was determined to be approximately In0.8Ga0.2As0.9Sb0.1. Electroluminescence spectra of LEDs, including the self-formed InAs/In0.8Ga0.2As0.9Sb0.1 2.5-periodic SLS, showed double peaks of 2.6 and 3.2 µm at 15 K. The luminescence spectrum was based on two transition mechanisms of type-I transition in InAs and type-II transition between InAs and InGaAsSb. The experimental results of luminescence spectra were supported by theoretical calculations. The 3.3 µm emission was maintained above 220 K.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advanced Semiconductor Detectors and Materials · Semiconductor Quantum Structures and Devices · Chalcogenide Semiconductor Thin Films

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Engineering Science, The University of Electro-Communications , Chofu, Tokyo 182-8585, Japan

References (18)

Show source-provided references
1. Appl. Phys. Lett. · 2001 · 79 · 30210.1063/1.1385581 ↗
2. J. Appl. Phys. · 2001 · 89 · 218510.1063/1.1337918 ↗
3. Appl. Phys. Lett. · 2011 · 99 · 25111010.1063/1.3671398 ↗
4. J. Phys. D: Appl. Phys. · 2018 · 51 · 07510310.1088/1361-6463/aaa60e ↗
5. Infrared Phys. Technol. · 2018 · 93 · 37510.1016/j.infrared.2018.08.001 ↗
6. Jpn. J. Appl. Phys. · 2000 · 39 · 503910.1143/jjap.39.5039 ↗
7. J. Vac. Sci. Technol. B · 2000 · 18 · 162310.1116/1.591440 ↗
8. J. Vac. Sci. Technol. B · 2014 · 32 · 02C10110.1116/1.4862085 ↗
9. J. Electron. Mater. · 2011 · 40 · 181510.1007/s11664-011-1653-6 ↗
10. Appl. Phys. Lett. · 1999 · 74 · 195110.1063/1.123738 ↗
11. J. Cryst. Growth · 2010 · 312 · 116510.1016/j.jcrysgro.2009.12.057 ↗
12. Appl. Phys. Lett. · 2011 · 99 · 08191410.1063/1.3629999 ↗
13. Appl. Phys. Lett. · 2011 · 99 · 22110910.1063/1.3665256 ↗
14. Appl. Phys. Lett. · 2012 · 101 · 25110710.1063/1.4773024 ↗
15. J. Appl. Phys. · 2013 · 113 · 04311210.1063/1.4789634 ↗
16. Appl. Phys. Lett. · 2013 · 102 · 12111010.1063/1.4798558 ↗
17. Appl. Surf. Sci. · 1997 · 117–118 · 70010.1016/s0169-4332(97)80167-5 ↗
18. Jpn. J. Appl. Phys. · 2005 · 44 · 380310.1143/jjap.44.3803 ↗