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journal article·2017-07-01Open access

Nanometer size hole fabrication in 2d ultrathin films with cluster ion beams

Z. Insepov, A. Ainabayev, S. Kirkpatrick, M. Walsh, A. F. Vyatkin

AIP Advances· Volume 7· Issue 7
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Source abstract

Abstract

Gas cluster ion beams are proposed as a new tool for producing nanometer sized holes in ultrathin 2D films. Surfaces of films of graphene, graphene oxide, MoS2, and HOPG, and also silicon as a reference, were irradiated by Ar gas cluster ion beams (Exogenesis Corporation, Billerica, MA USA). The results were analyzed using atomic force microscopy (AFM) and Raman spectroscopy. Ar gas cluster ion acceleration energy was 30 keV and total ion fluences ranged from 1×108 to 1×1013 cm-2. Uniformly distributed holes, typically in the range of 10 to 25 nanometers in diameter, produced by the cluster ions, were observed on the surface of graphene oxide. To the best of our knowledge, this is first experimental observation of such holes.
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Research context

Nanomaterials

OpenAlex topics: Graphene research and applications · Ion-surface interactions and analysis · Diamond and Carbon-based Materials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Nazarbayev University, NURIS 1 , 53 Kabanbay Batyr Ave., Astana 010000, Kazakhstan

Purdue University, School of Nuclear Engineering 2 , 500 Central Drive, West Lafayette, IN 47907, USA

National Research Nuclear University MEPhI, Condensed Matter Physics Department 3 , 31 Kashira Highway, 115409, Russian Federation

Exogenesis Corp. 4 , 20 Fortune Drive, Billerica, MA 01821, USA

Institute of Microelectronics Technology and High Purity Materials 5 , 6, Academician Ossipyan St., Moscow region 142432, Russian Federation

Funding

Nazarbayev University World Science Stars program · Ministry of Education and Science of the Republic of Kazakhstan · Ministry of Education and Science of the Russian Federation

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