journal article·2022-05-01Open access

Numerical simulation of coaxial–coplanar dielectric-barrier discharge in atmospheric helium

Shuang Ran, Jing Wang, Bingying Lei, Simeng Liu, Jing Li, Yishan Wang, Wei Zhao, Yixiang Duan, Jie Tang

AIP Advances· Volume 12· Issue 5

Abstract

A self-consistent two-dimensional fluid model is employed to investigate the coaxial–coplanar dielectric-barrier discharge (DBD) excited by the sinusoidal voltage in atmospheric helium. Simulation results show that there are two current pulses in the positive half cycle, but only one in the negative half cycle. The discharge is transformed from the Townsend-like mode, through the glow-like mode, and back to the Townsend-like mode in both the positive and negative half cycles, during which the electric field line exhibits an arc-shape profile due to the configuration of coaxial–coplanar electrodes. In the glow-like mode, the cathode fall is located near the inner edge of the ground electrode at the first positive current peak, but close to the outer edge of the ground electrode at the second positive current peak. At the negative current peak, the cathode fall is distributed near the outer edge of the high voltage electrode. Since the instantaneous anode and the instantaneous cathode are on the same side of the discharge space, the dielectric layer is simultaneously covered by positive and negative surface charges due to the movement of charged particles. It is also found that the surface charge density changes significantly on the dielectric layer facing the electrodes. A further study reveals that a stronger discharge always occurs in the central circular area and an alternately complementary discharge takes place in the periphery ring area in the positive half cycle due to the activator–inhibitor effect. This feature is helpful for producing uniform plasma in a whole cycle of DBD.
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Research context

OpenAlex topics: Plasma Applications and Diagnostics · Plasma Diagnostics and Applications · Electrohydrodynamics and Fluid Dynamics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics of CAS 1 , Xi’an 710119, China

University of Chinese Academy of Sciences 2 , Beijing 100049, China

Faculty of Mathematics and Physics, Huaiyin Institute of Technology 3 , Huaian 223003, China

Key Laboratory of Synthetic and Natural Functional Molecule Chemistry of Ministry of Education, College of Chemistry and Materials Science, Northwest University 4 , Xi’an 710127, China

Funding

National Natural Science Foundation of China · Natural Science Foundation of Shaanxi Province · Natural Science Basic Research Program of Shaanxi Province · The Key Deployment Research Program of XIOPM · he Major Science and Technology Infrastructure Pre-research Program of CAS · The Open Research Fund of Key Laboratory of Spectral Imaging Technology of the CAS

References (71)

Show source-provided references
1. Jpn. J. Appl. Phys. · 2008 · 47 · 700910.1143/jjap.47.7009 ↗
2. Appl. Phys. Lett. · 2009 · 95 · 18150110.1063/1.3258071 ↗
3. Surf. Coat. Technol. · 2010 · 205 · 41810.1016/j.surfcoat.2010.08.138 ↗
4. Phys. Plasmas · 2010 · 17 · 09350410.1063/1.3476899 ↗
5. J. Hazard. Mater. · 2011 · 195 · 40510.1016/j.jhazmat.2011.08.062 ↗
6. IEEE Trans. Plasma Sci. · 2011 · 39 · 297610.1109/tps.2011.2145004 ↗
7. J. Phys. D: Appl. Phys. · 2011 · 44 · 27400810.1088/0022-3727/44/27/274008 ↗
8. Appl. Phys. Lett. · 2012 · 100 · 25350510.1063/1.4729818 ↗
9. Plasma Sources Sci. Technol. · 2017 · 26 · 05300110.1088/1361-6595/aa6426 ↗
10. Chem. Commun. · 2018 · 54 · 1296210.1039/c8cc05360j ↗
11. J. Phys. D: Appl. Phys. · 2020 · 53 · 02520110.1088/1361-6463/ab492a ↗
12. Phys. Plasmas · 2020 · 27 · 04350110.1063/1.5135973 ↗
13. Adv. Sci. · 2020 · 7 · 190261610.1002/advs.201902616 ↗
14. Commun. Phys. · 2021 · 4 · 6410.1038/s42005-021-00566-8 ↗
15. AIP Adv. · 2022 · 12 · 02511410.1063/5.0064301 ↗
16. J. Phys. D: Appl. Phys. · 2022 · 55 · 03400310.1088/1361-6463/ac2bcd ↗
17. Appl. Surf. Sci. · 2011 · 257 · 416510.1016/j.apsusc.2010.11.190 ↗
18. Plasma Sci. Technol. · 2016 · 18 · 82610.1088/1009-0630/18/8/06 ↗
19. IOP Conf. Ser.: Mater. Sci. Eng. · 2020 · 862 · 06208610.1088/1757-899x/862/6/062086 ↗
20. J. Phys. D: Appl. Phys. · 2005 · 38 · R110.1088/0022-3727/38/2/r01 ↗
21. Phys. Plasmas · 2015 · 22 · 12350910.1063/1.4937794 ↗
22. Plasma Sources Sci. Technol. · 2017 · 26 · 02LT0110.1088/1361-6595/26/2/02lt01 ↗
23. Plasma Sources Sci. Technol. · 2018 · 27 · 11400110.1088/1361-6595/aae63e ↗
24. J. Phys.: Conf. Ser. · 2020 · 1696 · 01202210.1088/1742-6596/1696/1/012022 ↗
25. Appl. Phys. Lett. · 2008 · 92 · 03150310.1063/1.2838340 ↗
26. Appl. Phys. Lett. · 2010 · 96 · 06150210.1063/1.3310024 ↗
27. Appl. Phys. Lett. · 2013 · 102 · 03350310.1063/1.4788721 ↗
28. J. Appl. Phys. · 2017 · 121 · 24330110.1063/1.4985619 ↗
29. Phys. Plasmas · 2019 · 26 · 06070210.1063/1.5098854 ↗
30. Appl. Phys. Lett. · 2019 · 115 · 19410110.1063/1.5120109 ↗
31. Phys. Rev. E · 2011 · 83 · 04640510.1103/physreve.83.046405 ↗
32. Phys. Plasmas · 2015 · 22 · 11351010.1063/1.4935902 ↗
33. J. Appl. Phys. · 1998 · 83 · 295010.1063/1.367051 ↗
34. IEEE Trans. Plasma Sci. · 2005 · 33 · 94910.1109/tps.2005.844493 ↗
35. Phys. Plasmas · 2014 · 21 · 12350310.1063/1.4903460 ↗
36. J. Phys. D: Appl. Phys. · 2015 · 48 · 34520110.1088/0022-3727/48/34/345201 ↗
37. Acta Phys. Sin. · 2003 · 52 · 169410.7498/aps.52.1694 ↗
38. Acta Phys. Sin. · 2012 · 61 · 04520510.7498/aps.61.045205 ↗
39. Phys. Plasmas · 2013 · 20 · 07350910.1063/1.4817289 ↗
40. Phys. Plasmas · 2018 · 25 · 01351210.1063/1.4998615 ↗
41. Plasma Sources Sci. Technol. · 2019 · 28 · 07500310.1088/1361-6595/ab2520 ↗
42. Phys. Plasmas · 2019 · 26 · 02351410.1063/1.5074170 ↗
43. AIP Adv. · 2021 · 11 · 02502210.1063/5.0033846 ↗
44. J. Phys. D: Appl. Phys. · 2019 · 52 · 20520110.1088/1361-6463/ab0940 ↗
45. Phys. Plasmas · 2020 · 27 · 05351010.1063/1.5144464 ↗
46. IEEE Trans. Ind. Appl. · 1988 · 24 · 22310.1109/28.2860 ↗
47. Plasma Sources Sci. Technol. · 2009 · 18 · 03400310.1088/0963-0252/18/3/034003 ↗
48. Plasma Sources Sci. Technol. · 2018 · 27 · 01500110.1088/1361-6595/aa9ad4 ↗
49. Appl. Phys. Lett. · 2002 · 81 · 271610.1063/1.1513185 ↗
50. J. Phys. D: Appl. Phys. · 2020 · 53 · 50520210.1088/1361-6463/abb0ba ↗
51. J. Phys. D: Appl. Phys. · 2004 · 37 · 208210.1088/0022-3727/37/15/006 ↗
52. Plasma Sources Sci. Technol. · 2011 · 20 · 02501010.1088/0963-0252/20/2/025010 ↗
53. Appl. Phys. Lett. · 2006 · 89 · 03150410.1063/1.2227721 ↗
54. Plasma Sources Sci. Technol. · 2016 · 25 · 05501510.1088/0963-0252/25/5/055015 ↗
55. Plasma Sources Sci. Technol. · 2005 · 14 · 72210.1088/0963-0252/14/4/011 ↗
56. Phys. Rev. A · 1976 · 13 · 114010.1103/physreva.13.1140 ↗
57. Plasma Sources Sci. Technol. · 2016 · 25 · 05502310.1088/0963-0252/25/5/055023 ↗
58. J. Appl. Phys. · 2006 · 99 · 09330110.1063/1.2193170 ↗
59. J. Chem. Phys. · 1982 · 76 · 400610.1063/1.443521 ↗
60. Appl. Phys. Express · 2011 · 4 · 05600110.1143/apex.4.056001 ↗
61. Phys. Plasmas · 2012 · 19 · 09350310.1063/1.4752419 ↗
62. IEEE Trans. Electron Devices · 1969 · 16 · 6410.1109/t-ed.1969.16566 ↗
63. J. Appl. Phys. · 2005 · 98 · 11330810.1063/1.2140890 ↗
64. Chin. Phys. B · 2014 · 23 · 01520110.1088/1674-1056/23/1/015201 ↗
65. IEEE Trans. Plasma Sci. · 2014 · 42 · 121110.1109/tps.2014.2312543 ↗
66. J. Phys.: Conf. Ser. · 2019 · 1380 · 01202210.1088/1742-6596/1380/1/012022 ↗
67. Phys. Plasmas · 2012 · 19 · 04350310.1063/1.3700176 ↗
68. Plasma Sources Sci. Technol. · 2021 · 30 · 03501210.1088/1361-6595/abe613 ↗
69. Sci. Rep. · 2015 · 5 · 1639110.1038/srep16391 ↗
70. Phys. Rev. Lett. · 2003 · 91 · 15450110.1103/physrevlett.91.154501 ↗
71. Appl. Phys. Lett. · 2002 · 80 · 172210.1063/1.1458684 ↗