Realization of forming-free Ag/ZrO2-based threshold selector with high selectivity by optimizing film thickness and scaling down electrode size
Source abstract
Abstract
The influence of the switching layer thickness and the device size on the threshold switching characteristics has been investigated in Ag/ZrO2/Pt selector device. By optimizing the switching layer thickness, excellent threshold switching characteristics such as forming-free behavior, high selectivity and good endurance was achieved. In addition, we revealed the impact of active metal electrode diffusion on the device performance as the thickness of dielectric material scaled. A two-step set behavior was also observed in the device with 80 nm switching layer under a high compliance current of 1mA. Furthermore, the selectivity was increased highly by decreasing electrode size. In particular, the selectivity was about 2×108 when the electrode size was scaled down to 300 nm.
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Research context
OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Neuroscience and Neural Engineering
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
School of Nano Technology and Nano Bionics, University of Science and Technology of China 1 , Suzhou 230026, People’s Republic of China
Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences 2 , Suzhou 215123, People’s Republic of China
Funding
National Natural Science Foundation of China
References (24)
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