journal article·2020-01-01Open access

Fabrication of soft-magnetic FeAlSi thin films with nm-order thickness for the free layer of magnetic tunnel junction based sensors

Shoma Akamatsu, Mikihiko Oogane, Masakiyo Tsunoda, Yasuo Ando

AIP Advances· Volume 10· Issue 1

Abstract

FeAlSi epitaxial films were fabricated on single crystalline MgO(100) substrates and their structural and magnetic properties were investigated to apply them to the free layer in magnetic tunnel junction (MTJ) based sensors. We found that the film composition must be precisely controlled, and the post-annealing temperature was varied to obtain a D03-ordered structure and soft magnetic property. By adjustment of the film composition and optimizing annealing temperature, we succeeded in obtaining D03-ordered FeAlSi thin films with a small surface roughness and low coercivity. The fabricated FeAlSi film is greatly useful as a free layer material in MTJ based sensor devices.
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Research context

OpenAlex topics: Magnetic properties of thin films · Magnetic Properties and Applications · Metallic Glasses and Amorphous Alloys

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Affiliations

Department of Applied Physics, Graduate School of Engineering, Tohoku University 1 , Sendai 980-8579, Japan

Center for Science and Innovation in Spintronics (Core Research Cluster) Organization for Advanced Studies, Tohoku University 2 , Sendai 980-8577, Japan

Center for Spintronics Research Network, Tohoku University 3 , Sendai 980-8577, Japan

Department of Electronic Engineering, Graduate School of Engineering, Tohoku University 4 , Sendai 980-8579, Japan

Funding

Strategic Promotion of Innovative R and D · Japan Science and Technology Agency

References (15)

Show source-provided references
1. Nat. Mater. · 2004 · 3 · 86810.1038/nmat1257 ↗
2. Nat. Mater. · 2004 · 3 · 86210.1038/nmat1256 ↗
3. IEEE Trans. Magn. · 2011 · 47 · 374010.1109/tmag.2011.2157997 ↗
4. IEEE Trans. Magn. · 2009 · 45 · 241310.1109/TMAG.2009.2018593 ↗
5. J. Magn. Soc. Jpn. · 2008 · 32 · 36110.3379/msjmag.32.361 ↗
6. J. Appl. Phys. · 2012 · 111 · 07C71010.1063/1.3677266 ↗
7. J. Appl. Phys. · 2011 · 109 · 07D34610.1063/1.3565404 ↗
8. Appl. Phys. Express · 2013 · 6 · 10300410.7567/apex.6.103004 ↗
9. Appl. Phys. Lett. · 2006 · 89 · 16311910.1063/1.2370876 ↗
10. Jpn. J. Appl. Phys. · 2013 · 52 · 04CM0710.7567/jjap.52.04cm07 ↗
11. J. Jpn. Inst. Met. · 1937 · 1 · 12710.2320/jinstmet1937.1.3_127 ↗
12. Phys. Rev. B · 2001 · 63 · 05441610.1103/PhysRevB.63.054416 ↗
13. Journal of Applied Physics · 1997 · 81 · 410410.1063/1.365094 ↗
14. IEEE Trans. Magn. · 1987 · 210.1109/tjmj.1987.4549646 ↗
15. J. Magn. Magn. Mater. · 1987 · 66 · 5510.1016/0304-8853(87)90128-4 ↗