journal article·2017-08-01Open access

Grain growth mechanism and magnetic properties in L1-FePt thin films

W. Li, L. Chen

AIP Advances· Volume 7· Issue 8

Abstract

This paper focuses on the grain growth mechanisms and magnetic properties of FePt thin films during an annealing process. The grain size and grain orientation distribution have been quantitatively investigated by electron backscatter diffraction (EBSD), and the grain growth kinetics of thin films were described by the phenomenological kinetic grain growth model. The results show that the grain growth exponent and activation energy of the FePt thin films were 4.26 and 136 kJ/mol respectively, indicating that the grain growth mechanism is mainly controlled by the stochastic jumping of atoms crossing the grain boundaries. X-ray diffraction (XRD) results show that disorder-order transformation was concurrent with grain growth during the annealing process, slowing down the velocity of grain growth. The hysteresis loops reveal that the out-of-plane coercivity and squareness is enhanced with increasing annealing temperature and this can be attributed to the improvement of L10-ordered phase volume fraction and texture intensity.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Magnetic properties of thin films · Magnetic Properties and Applications · Microstructure and Mechanical Properties of Steels

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Materials Science and Engineering, University of Science and Technology Beijing , Beijing 100083, China

Funding

National Natural Science Foundation of China

References (36)

Show source-provided references
1. Intermetallics · 2013 · 34 · 8910.1016/j.intermet.2012.11.006 ↗
2. J. Alloy Compd. · 2015 · 646 · 76610.1016/j.jallcom.2015.06.192 ↗
3. J. Appl. Phys. · 2015 · 117 · 03430110.1063/1.4904919 ↗
4. Thin Solid Films · 2017 · 626 · 19010.1016/j.tsf.2017.02.046 ↗
5. AIP Advances · 2017 · 7 · 05650310.1063/1.4973500 ↗
6. Journal of Magnetism & Magnetic Materials · 2001 · 235 · 23510.1016/s0304-8853(01)00345-6 ↗
7. Appl. Phys. Lett. · 2016 · 108 · 10240610.1063/1.4943629 ↗
8. J. Alloy Compd. · 2016 · 662 · 13810.1016/j.jallcom.2015.12.006 ↗
9. J. Appl. Phys. · 2008 · 104 · 02390410.1063/1.2956691 ↗
10. J. Appl. Phys. · 2007 · 102 · 02491210.1063/1.2756631 ↗
11. J. Appl. Phys. · 2012 · 111 · 07A70810.1063/1.3672856 ↗
12. Thin Solid Films · 2008 · 517 · 53110.1016/j.tsf.2008.06.062 ↗
13. Thin Solid Films · 2012 · 524 · 27810.1016/j.tsf.2012.09.074 ↗
14. Journal of Physics D: Applied Physics · 2008 · 41 · 13500910.1088/0022-3727/41/13/135009 ↗
15. J. Appl. Phys. · 2005 · 97 · 10H30110.1063/1.1847312 ↗
16. Acta Materialia · 2001 · 49 · 67310.1016/s1359-6454(00)00344-x ↗
17. Progress in Materials Science · 2013 · 58 · 98710.1016/j.pmatsci.2013.03.004 ↗
18. Acta Materialia · 2014 · 64 · 7210.1016/j.actamat.2013.11.034 ↗
19. Acta Materialia · 2014 · 67 · 18910.1016/j.actamat.2013.12.031 ↗
20. Scripta Mater. · 2016 · 116 · 9110.1016/j.scriptamat.2016.01.021 ↗
21. Acta Materialia · 2012 · 60 · 239710.1016/j.actamat.2011.12.030 ↗
22. Acta Materialia · 2014 · 79 · 13810.1016/j.actamat.2014.07.014 ↗
23. Acta Materialia · 2013 · 61 · 461910.1016/j.actamat.2013.04.032 ↗
24. J. Appl. Phys. · 2006 · 99 · 05390610.1063/1.2176088 ↗
25. J. Appl. Phys. · 2008 · 104 · 05450910.1063/1.2968441 ↗
26. Acta Metallurgica · 1965 · 13 · 22710.1016/0001-6160(65)90200-2 ↗
27. J. Appl. Phys. · 2001 · 89 · 640810.1063/1.1367401 ↗
28. J. Cryst. Growth · 2010 · 312 · 328210.1016/j.jcrysgro.2010.08.021 ↗
29. J. Alloy Compd. · 2012 · 513 · 60610.1016/j.jallcom.2011.11.022 ↗
30. J. Appl. Phys. · 2001 · 89 · 640810.1063/1.1367401 ↗
31. Acta Materialia · 2013 · 61 · 256010.1016/j.actamat.2013.01.033 ↗
32. Journal of Magnetism & Magnetic Materials · 2016 · 398 · 27510.1016/j.jmmm.2015.09.034 ↗
33. J. Appl. Phys. · 2007 · 101 · 09391110.1063/1.2730568 ↗
34. Thin Solid Films · 2016 · 616 · 18310.1016/j.tsf.2016.08.018 ↗
35. Materials Science & Engineering B · 1995 · 32 · 21110.1016/0921-5107(95)03011-5 ↗
36. J. Appl. Phys. · 2016 · 119 · 11530110.1063/1.4943936 ↗