journal article·2015-12-01Open access

Investigation to the deep center related properties of low temperature grown InPBi with Hall and photoluminescence

Peng Wang, Wenwu Pan, Kai Wang, Xiaoyan Wu, Li Yue, Qian Gong, Shumin Wang

AIP Advances· Volume 5· Issue 12

Abstract

InP1-xBix epilayers with bismuth (Bi) concentration x= 1.0% were grown on InP by gas source molecular beam epitaxy (GS-MBE) at low temperature (LT). Bi incorporation decreased the intrinsic free electron concentration of low temperature grown InP indicated by hall analysis. It is concluded that deep level center was introduced by Bi. Influence of Si doping on the InP1-xBix films Photoluminescence (PL) was investigated. N-type doping in the InP1-xBix epilayers was found to be effective at PL enhancement. Blue shift of InPBi PL emission wavelength was observed as the Si doping concentration increasing. Two independent peaks were fitted and their temperature dependence behavior was observed to be distinct obviously. Two individual radiative recombination processes were expected to be involved.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Semiconductor Quantum Structures and Devices · Semiconductor Lasers and Optical Devices · Photonic and Optical Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Science 1 State Key Laboratory of Functional Materials for Informatics, , Shanghai 200050, China

University of Chinese Academy of Sciences 2 School of Physics, , 19 Yuquan Road, Beijing, 100049, China

National Laboratory for Infrared Physics, Chinese Academy of Sciences 3 , 500 Yutian Road, Shanghai, 200083, China

Chalmers University of Technology 4 Department of Microtechnology and Nanoscience, , 41296 Gothenburg, Sweden

Funding

"strategic priority research program" of the Chinese academy of sciences · creative research group project of natural science foundation of China · key program of natural science foundation of china · national basic research program of china · the foundation of national laboratory for infrared physics, the key research program of the chinese academy of sciences

References (21)

Show source-provided references
1. New Semiconductors Alloy GaAsBi Grown by Metal Organic Vapor Phase Epitaxy
2. Giant Spin-Orbit Bowing in GaAs1-xBix10.1103/PhysRevLett.97.067205 ↗
3. Ab initio study of the strain dependent thermodynamics of Bi doping in GaAs10.1103/PhysRevB.86.085207 ↗
4. Growth and properties of GaSbBi alloys10.1063/1.4824077 ↗
5. Modeling Bi-induced changes in the electronic structure of GaAs1-xBix alloys10.1103/PhysRevB.88.235201 ↗
6. InGaAsBi alloys on InP for efficient near- and mid- infrared light emitting devices10.1063/1.4837615 ↗
7. Optical and electrical characterization of InGaBiAs for use as a mid-infrared optoelectronic material10.1063/1.3614476 ↗
8. Electrical injection Ga(AsBi)/(AlGa)As single quantum well laser10.1063/1.4811736 ↗
9. Recombination mechanisms and band alignment of GaAs1-xBix/GaAs light emitting diodes10.1063/1.3681139 ↗
10. High brightness AlGaInP light-emitting diodes10.1109/2944.999187 ↗
11. MOVPE growth of strained InAsP/InGaAsP quantum-well structures for low-threshold 1.3-μm lasers10.1109/3.283802 ↗
12. Structural properties of bismuth bearing semiconductor alloys10.1063/1.340499 ↗
13. The isoelectronic trap bismuth in indium phosphide
14. Isoelectronic impurity states in direct-gap III-V compounds: The case of InP:Bi10.1103/PhysRevA.18.12 ↗
15. Structural and optical characterizations of InPBi thin films grown by molecular beam epitaxy10.1186/1556-276X-9-24 ↗
16. Growth of semiconductor alloy InGaPBi on InP by molecular beam epitaxy10.1088/0268-1242/30/9/094006 ↗
17. Electrical properties of InP grown by gas-source molecular beam epitaxy at Low temperature10.1063/1.107103 ↗
18. Band gap narrowing and radiative efficiency of silicon doped GaN10.1063/1.2919775 ↗
19. InPBi single crystals grown by molecular beam epitaxy
20. Electrical and optical properties of Si-doped InP grown by solid sourcemolecular beam epitaxy using a valved phosphorus cracker cell
21. Determination of conduction band tail and Fermi energy of heavily Si-doped GaAs by room-temperature photoluminescence