Effects of annealing and pulse plating on soft magnetic properties of electroplated Fe-Ni films
Source abstract
Abstract
We have already reported that Fe-Ni films prepared in citric-acid-based plating baths show good soft magnetic properties. In this paper, we investigated the effect of the grain size of the Fe-Ni crystalline phase in the films on magnetic properties, and employed an annealing and a pulse plating method in order to vary the grain size. The coercivity of the annealed Fe-Ni films at 600 °C shows large value, and good correlation between the grain growth and the coercivity was observed. The pulse plating enables us to reduce the grain size of the as-plated Fe-Ni films compared with the DC plating method, and we realized smooth surface and low coercivity of the Fe-Ni films using the pulse plating method. From these results, we confirmed the importance of the reduction in the grain size, and concluded that a pulse plating is an effective method to improve the good soft magnetic properties for our previously-reported Fe-Ni films.
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Research context
OpenAlex topics: Electrodeposition and Electroless Coatings · Metallic Glasses and Amorphous Alloys · Copper Interconnects and Reliability
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Affiliations
Nagasaki University , 1-14 Bunkyo-Machi, Nagasaki 852-8521, Japan
References (16)
Show source-provided references
1. J. App. Electrochem. · 1977 · 7 · 49510.1007/BF00616760 ↗
2. J. Solid State Electrochem. · 2011 · 15 · 192710.1007/s10008-010-1213-7 ↗
3. IEEE Trans. Magn. · 2012 · 48 · 290710.1109/TMAG.2012.2203295 ↗
4. J. Kor. Phys. Soc. · 2013 · 62 · 196310.3938/jkps.62.1963 ↗
5. IEEE Trans. Magn. · 2014 · 50 · 200703
6. J. Appl. Phys. · 2015 · 117 · 17A32610.1063/1.4917190 ↗
7. J. Electrochem. Soc. · 2008 · 155 · D42910.1149/1.2898196 ↗
8. Surf. Coat. Tech. · 2010 · 205 · 74010.1016/j.surfcoat.2010.07.076 ↗
9. J. Appl. Phys · 1988 · 64 · 604410.1063/1.342149 ↗
10. Mater. Trans. JIM · 1991 · 32 · 9310.2320/matertrans1989.32.93 ↗
11. J. Appl. Phys. · 1999 · 85 · 442110.1063/1.369804 ↗
12. IEEE Trans. Magn. · 1990 · 26 · 139710.1109/20.104389 ↗
13. Jpn. J. Appl. Phys. · 1992 · 31 · 134710.1143/JJAP.31.1347 ↗
14. Nanostruct. Mater. · 1999 · 12 · 5510.1016/S0965-9773(99)00065-3 ↗
15. J.Electrochem. Soc. · 1990 · 137 · 341410.1149/1.2086231 ↗
16. Electrochim. Act. · 2013 · 103 · 17910.1016/j.electacta.2013.04.063 ↗