journal article·2017-07-01Open access

Examination of thermal properties and degradation of InGaN - based diode lasers by thermoreflectance spectroscopy and focused ion beam etching

Dorota Pierścińska, Kamil Pierściński, Mariusz Płuska, Łucja Marona, Przemysław Wiśniewski, Piotr Perlin, Maciej Bugajski

AIP Advances· Volume 7· Issue 7

Abstract

In this paper, thermal properties of InGaN-based diode lasers are investigated. The thermoreflectance technique was employed to study temperature distributions on the front facet of device. Measurements were performed, allowing investigation of the contribution of two main heat sources to the total temperature rise observed on the facet of device. It has been found that the contribution from reabsorption of laser emission at the facet, is much smaller than the one caused by Joule heating (electrical power). Additionally, devices have been investigated by means of SEM and FIB to determine the degradation sources. Inspection of the devices confirmed the lack of mirror damage or deposits. The main source of degradation was found to be located in the region of ridge and caused by extended defects. Our findings confirm the hypothesis that injected current is the major driving force of degradation.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · Metal and Thin Film Mechanics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Electron Technology 1 , 02-668 Warsaw, Poland

Institute of High Pressure Physics, Polish Academy of Sciences 2 , 01-142 Warsaw, Poland

TopGaN Ltd. 3 , 01-142 Warsaw, Poland

Funding

Narodowe Centrum Nauki

References (34)

Show source-provided references
1. Jpn. J. Appl. Phys. · 1997 · 36 · 539310.1143/jjap.36.5393 ↗
2. 1997
3. Proc. Optoelectron. · 2002 · 149 · 14510.1049/ip-opt:20020441 ↗
4. J. Appl. Phys. · 1999 · 38 · 276410.1143/jjap.38.2764 ↗
5. Degradation in AlGaInN lasers10.1002/pssc.200303324 ↗
6. J. of Cryst. Growth · 1998 · 189–190 · 55110.1016/s0022-0248(98)00191-2 ↗
7. Laser diodes based on gallium nitride - investigation of carrier injection mechanisms, gain and distribution of the electromagnetic field
8. 1991
9. Laser & Photonics Rev. · 2011 · 5 · 42210.1002/lpor.201000023 ↗
10. Proc. SPIE · 2008 · 6894 · 68940O10.1117/12.767599 ↗
11. Proc. SPIE · 2008 · 6894 · 68940R10.1117/12.762220 ↗
12. Appl. Phys. Lett. · 2011 · 99 · 09350610.1063/1.3626280 ↗
13. J. Appl. Phys. · 2005 · 97 · 12310210.1063/1.1929851 ↗
14. Proc. SPIE · 2005 · 5738 · 6310.1117/12.597099 ↗
15. Phys. Status Solidi C · 2004 · 1 · 146110.1002/pssc.200304086 ↗
16. 2013
17. Semicond. Sci. Technol. · 2015 · 30 · 07200110.1088/0268-1242/30/7/072001 ↗
18. Phys. Stat. Sol. (A) · 2003 · 200 · 8310.1002/pssa.200303492 ↗
19. Appl. Phys. Lett. · 1999 · 75 · 344010.1063/1.125289 ↗
20. Appl. Phys. Lett. · 2005 · 86 · 03190710.1063/1.1849838 ↗
21. MRS Internet J. Nitride Semicond. Res. · 2000 · 5 · 64710.1557/S1092578300004889 ↗
22. Appl. Phys. Lett. · 1992 · 60 · 68010.1063/1.106563 ↗
23. Phys. Rev. · 1968 · 176 · 95010.1103/physrev.176.950 ↗
24. Appl. Phys. Lett. · 2001 · 78 · 226710.1063/1.1363696 ↗
25. Mater. Sci. Semicond. Process. · 2006 · 9 · 18810.1016/j.mssp.2006.01.072 ↗
26. J. Mater. Sci.: Mater. Electron. · 2008 · 19 · 15010.1007/s10854-008-9643-z ↗
27. J. Appl. Phys. · 2012 · 111 · 05310710.1063/1.3691228 ↗
28. J. Appl. Phys. · 2012 · 112 · 04311210.1063/1.4746791 ↗
29. Semicond. Sci. Technol. · 2016 · 31 · 11500610.1088/0268-1242/31/11/115006 ↗
30. Jpn. J. Appl. Phys. · 2017 · 55 · 02030210.7567/jjap.56.020302 ↗
31. Semicond. Sci. Technol. · 2014 · 29 · 03500810.1088/0268-1242/29/3/035008 ↗
32. Appl. Phys. Lett. · 2013 · 103 · 26110710.1063/1.4857695 ↗
33. Jpn. J. Appl. Phys. · 2001 · 40 · 275210.1143/jjap.40.2752 ↗
34. IEEE Trans. Device Mater. Rel. · 2016 · 16 · 63810.1109/tdmr.2016.2617885 ↗