journal article·2013-02-01Open access

Formation of double ring patterns on Co2MnSi Heusler alloy thin film by anodic oxidation under scanning probe microscope

Vijaykumar Toutam, Himanshu Pandey, Sandeep Singh, R. C. Budhani

AIP Advances· Volume 3· Issue 2

Abstract

Double ring formation on Co2MnSi (CMS) films is observed at electrical breakdown voltage during local anodic oxidation (LAO) using atomic force microscope (AFM). Corona effect and segregation of cobalt in the vicinity of the rings is studied using magnetic force microscopy and energy dispersive spectroscopy. Double ring formation is attributed to the interaction of ablated material with the induced magnetic field during LAO. Steepness of forward bias transport characteristics from the unperturbed region of the CMS film suggest a non equilibrium spin contribution. Such mesoscopic textures in magnetic films by AFM tip can be potentially used for memory storage applications.
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Research context

OpenAlex topics: Magnetic properties of thin films · Heusler alloys: electronic and magnetic properties · Chemical and Physical Properties of Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

National Physical Laboratory 1 , New Delhi - 110012, India

Indian Institute of Technology 2 Condensed Matter - Low Dimensional Systems Laboratory, Department of Physics, , Kanpur - 208016, India

References (39)

Show source-provided references
1. Appl. Phys. Lett. · 1990 · 56 · 200110.1063/1.102999 ↗
2. J. Appl. Phys. · 1998 · 84 · 689110.1063/1.368986 ↗
3. Appl. Phys. Lett. · 1996 · 69 · 26910.1063/1.117946 ↗
4. Appl. Phys. Lett. · 1990 · 57 · 27010.1063/1.103711 ↗
5. Nanotechnology · 2006 · 17 · 329910.1088/0957-4484/17/13/036 ↗
6. Appl. Phys. Lett. · 2005 · 86 · 16190110.1063/1.1901804 ↗
8. J. Vac. Sci. Technol. B · 2000 · 18 · 5510.1116/1.591150 ↗
9. Appl. Phys. Lett. · 1995 · 67 · 129510.1063/1.114402 ↗
10. J. Phys. Chem. · 1994 · 98 · 435210.1021/j100067a023 ↗
11. Adv. Mater. · 2005 · 17 · 148010.1002/adma.200401466 ↗
12. Nanotechnology · 2004 · 15 · 29710.1088/0957-4484/15/3/012 ↗
13. Microelectron. J. · 2004 · 35 · 70110.1016/j.mejo.2004.06.022 ↗
14. Adv. Mater. · 2007 · 19 · 261810.1002/adma.200602837 ↗
15. J. Appl. Phys. · 2005 · 98 · 11430310.1063/1.2136212 ↗
16. Appl. Phys. Lett. · 2006 · 88 · 03290610.1063/1.2166679 ↗
17. Nature Materials · 2007 · 6 · 83310.1038/nmat2023 ↗
18. Nature Materials · 2011 · 10 · 62510.1038/nmat3070 ↗
19. Phys. Rev. Lett · 2009 · 102 · 21720110.1103/PhysRevLett.102.217201 ↗
20. J. Phys.: Cond. Matt. · 2000 · 12 · 182710.1088/0953-8984/12/8/325 ↗
21. J. Physics and Chemistry of Solids · 1971 · 32 · 122110.1016/S0022-3697(71)80180-4 ↗
22. Physica B: Condensed Matter · 1997 · 239 · 16310.1016/S0921-4526(97)00401-8 ↗
23. Phys. Rev. B · 2003 · 68 · 10443010.1103/PhysRevB.68.104430 ↗
24. Phys. Rev. Lett. · 2005 · 94 · 09640210.1103/PhysRevLett.94.096402 ↗
25. J. Appl. Phys. · 2012 · 111 · 02391210.1063/1.3677996 ↗
26. See supplementary material http://dx.doi.org/10.1063/1.4794160 for structural and magnetic characterization.10.1063/1.4794160 ↗
27. Appl. Phys. Lett. · 2008 · 93 · 02250110.1063/1.2957647 ↗
28. Appl. Phys. Lett. · 2008 · 93 · 23410410.1063/1.3044473 ↗
29. Rev. Sci. Instrum. · 1998 · 69 · 390210.1063/1.1149197 ↗
30. Appl. Phys. Lett. · 2002 · 81 · 361510.1063/1.1519357 ↗
31. Appl. Phys. Lett. · 2002 · 80 · 198410.1063/1.1459115 ↗
32. Nanoscale Res. Lett. · 2011 · 6 · 55010.1186/1556-276X-6-550 ↗
33. Proc. R. Soc. London, Ser. A · 1928 · 119 · 17310.1098/rspa.1928.0091 ↗
34. Appl. Phys. Lett. · 2002 · 80 · 124010.1063/1.1449530 ↗
35. Rev. Mod. Phys. · 2004 · 76 · 32310.1103/RevModPhys.76.323 ↗
36. Phys. Rev. Lett. · 1988 · 61 · 63710.1103/PhysRevLett.61.637 ↗
37. Phys. Rev. B · 2002 · 66 · 16530110.1103/PhysRevB.66.165301 ↗
38. Science · 2004 · 306 · 191010.1126/science.1105514 ↗
39. Nat. Phys. · 2005 · 1 · 3110.1038/nphys009 ↗