Interface formation and Schottky barrier height for Y, Nb, Au, and Pt on Ge as determined by hard x-ray photoelectron spectroscopy
Source abstract
Abstract
Development of a robust, thin, hole-blocking (n+) contact on high purity germanium (HPGe) has been the main challenge in the development of Ge-based radiation sensors. Yttrium has been reported to be a viable hole-blocking contact on HPGe, and detectors with low leakage have been fabricated. Niobium has also been considered as a potential hole-blocking contact due to its low work function. Here, we investigate interface chemistry and the Schottky barrier height of Y and Nb, as well as electron-blocking contacts Au and Pt, on Ge(100) surfaces using hard x-ray photoelectron spectroscopy. We find a barrier height of 1.05 ± 0.10 eV for Y/HPGe, confirming the formation of a hole-blocking barrier. For Nb/HPGe, the barrier height of 0.13 ± 0.10 eV demonstrates that the interface is not hole-blocking. The Schottky barrier of Au and Pt was found to be 0.45 ± 0.10 and 0.51 ± 0.10 eV, respectively.
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Research context
OpenAlex topics: Semiconductor materials and interfaces · Advanced Semiconductor Detectors and Materials · Electron and X-Ray Spectroscopy Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Synchrotron Light Source II, Brookhaven National Laboratory 1 , Upton, New York 11973, USA
National Institute of Standards and Technology 2 , Gaithersburg, Maryland 20899, USA
Instrumentation Division, Brookhaven National Laboratory 3 , Upton, New York 11973, USA
Department of Electrical Engineering, Stony Brook University 4 , Stony Book, New York 11974, USA
Forshungzentrum, Juelich, GmbH 5 , Juelich 52428, Germany
PHDs Co. 6 , Knoxville, Tennessee 37921, USA
Funding
U.S. Department of Energy
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