journal article·2020-06-01Open access

Proton irradiation impact on interface traps under Schottky contact in AlGaN/GaN heterostructure

Xue-Feng Zheng, Guan-Jun Chen, Xiao-Hu Wang, Ying-Zhe Wang, Chong Wang, Wei Mao, Yang Lu, Bin Hou, Min-Han Mi, Ling Lv, Yan-Rong Cao, Qing Zhu, Gang Guo, Pei-Jun Ma, Xiao-Hua Ma, Yue Hao

AIP Advances· Volume 10· Issue 6

Abstract

The effect of 3 MeV proton irradiation on interface traps under a Schottky contact in an AlGaN/GaN heterostructure has been investigated in this work. Utilizing the frequency-dependent conductance technique, the detailed information about interface traps under different proton doses has been evaluated. When the proton irradiation dose is increased to 5 × 1014 H+/cm2, it is observed that the deepest energy level of interface traps changes from 0.375 eV to 0.346 eV and the shallowest energy level changes from 0.284 eV to 0.238 eV. The corresponding energy range expands from 0.091 eV to 0.108 eV. Especially, the trap density at the deepest energy level and that at the shallowest energy level are reduced by 65% and 93%, respectively. Transmission electron microscopy and energy dispersive x-ray spectroscopy are also used to assess the Schottky contact interface, and no element inter-diffusion is observed after proton irradiation. The reverse gate leakage current decreases with an increase in the proton irradiation dose, which agrees with the reduction in interface trap density.
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Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Key Laboratory of Wide Bandgap Semiconductor Materials and Devices, School of Microelectronics, Xidian University 1 , Xi’an 710071, People’s Republic of China

National Innovation Center of Radiation Application 2 , P.O. Box 275, Beijing 102413, People’s Republic of China

Funding

National Pre-Research Foundation of China · Fund of Innovation Center of Radiation Application · National Natural Science Foundation of China

References (26)

Show source-provided references
1. J. Appl. Phys. · 2013 · 114 · 24450310.1063/1.4859576 ↗
2. Appl. Phys. Lett. · 2017 · 110 · 25210210.1063/1.4986776 ↗
3. Appl. Phys. Lett. · 2012 · 101 · 01350610.1063/1.4733359 ↗
4. Appl. Phys. Lett. · 2014 · 104 · 08210610.1063/1.4866858 ↗
5. Appl. Phys. Lett. · 2013 · 103 · 16210610.1063/1.4826091 ↗
6. J. Vac. Sci. Technol., B · 2018 · 36 · 04220110.1116/1.5023844 ↗
7. AIP Adv. · 2015 · 5 · 09710310.1063/1.4930199 ↗
8. IEEE Trans. Nucl. Sci. · 2010 · 57 · 306010.1109/tns.2010.2073720 ↗
9. J. Appl. Phys. · 2016 · 119 · 16570410.1063/1.4948298 ↗
10. IEEE Trans. Nucl. Sci. · 2015 · 62 · 242310.1109/tns.2015.2488650 ↗
11. IEEE Trans. Nucl. Sci. · 2012 · 59 · 307710.1109/tns.2012.2224371 ↗
12. IEEE Electron Device Lett. · 2014 · 35 · 82610.1109/led.2014.2331001 ↗
13. J. Appl. Phys. · 2014 · 115 · 24450310.1063/1.4885036 ↗
14. Appl. Phys. Lett. · 2017 · 110 · 25350510.1063/1.4986910 ↗
15. Appl. Phys. Lett. · 2010 · 97 · 02350310.1063/1.3460529 ↗
16. Microelectron. Reliab. · 2012 · 52 · 254210.1016/j.microrel.2012.05.015 ↗
17. IEEE Trans. Nucl. Sci. · 2013 · 60 · 408010.1109/tns.2013.2281771 ↗
18. 2006
19. 2002
20. Appl. Phys. Lett. · 2013 · 102 · 11351010.1063/1.4798257 ↗
21. Appl. Phys. Lett. · 2011 · 99 · 03350410.1063/1.3614556 ↗
22. Appl. Phys. Lett. · 2014 · 104 · 09350410.1063/1.4867525 ↗
23. Phys. Status Solidi C · 2003 · 0 · 240010.1002/pssc.200303344 ↗
24. 2008 · 2590
25. Appl. Phys. Lett. · 2013 · 103 · 04210210.1063/1.4816423 ↗
26. IEEE Electron Device Lett. · 2014 · 35 · 119410.1109/led.2014.2363433 ↗