A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
Source abstract
Abstract
The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size.
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Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Advancements in Photolithography Techniques · Microfluidic and Capillary Electrophoresis Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology 1 , Dalian, China
Department of Biomedical Engineering, Dalian University of Technology 2 , Dalian, China
School of Mechanical Science and Engineering, Jilin University 3 , Changchun, China
Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology 4 , Dalian, China
References (37)
Show source-provided references
1. Focused ion beam lithography to etch nano-architectures into microelectrodes10.3791/60004 ↗
2. Fabrication of sub-5 nm nanochannels in insulating substrates using focused ion beam milling10.1021/nl103369g ↗
3. Study on UV/EB nanoimprint lithography using nano-/micro-fabricated crosslinked PTFE mold10.2494/photopolymer.23.69 ↗
4. Nanofabrication by electron beam lithography and its applications: A review10.1016/j.mee.2015.02.042 ↗
5. Fabrication of nickel molds using proton beam writing for micro/nano fluidic devices10.1016/j.mee.2012.05.020 ↗
6. Nanofluidic channels of arbitrary shapes fabricated by tip-based nanofabrication10.1088/0957-4484/25/45/455301 ↗
7. Silicon-based suspended structure fabricated by femtosecond laser direct writing and wet etching10.1109/lpt.2016.2554203 ↗
8. The fabrication of micro/nano structures by laser machining10.3390/nano9121789 ↗
9. Fabrication of large-area high-aspect-ratio periodic nanostructures on various substrates by soft x-ray interference lithography10.1016/j.apsusc.2017.07.010 ↗
10. High performance self-aligned sub-100 nm metal–oxide-semiconductor field-effect transistors using x-ray lithography10.1116/1.587428 ↗
11. Investigation of high-resolution contact printing10.1016/j.mee.2007.12.012 ↗
12. Large-scale lithography for sub-500 nm features10.1088/1742-6596/34/1/006 ↗
13. Nanostructures and functional materials fabricated by interferometric lithography10.1002/adma.201001856 ↗
14. Nanoimprinting lithography of a two-layer phase mask for three-dimensional photonic structure holographic fabrications via single exposure10.1088/0957-4484/22/3/035303 ↗
15. Nanostructured 2D cellular materials in silicon by sidewall transfer lithography NEMS10.1088/1361-6439/aa7167 ↗
16. Fabrication of 2D polymer nanochannels by sidewall lithography and hot embossing10.1088/0960-1317/23/7/075022 ↗
17. Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications10.1116/1.1409384 ↗
18. Fabrication of high-aspect-ratio polymer nanochannels using a novel Si nanoimprint mold and solvent-assisted sealing10.1007/s10404-009-0509-3 ↗
19. Automated optical proximity correction: A rules-based approach10.1117/12.175422 ↗
20. Using behavior modeling for proximity correction10.1117/12.175431 ↗
21. Optical proximity correction by grey tone photolithography10.1016/s0167-9317(00)00285-9 ↗
22. Concave microlens array mold fabrication in photoresist using UV proximity printing10.1007/s00542-006-0264-2 ↗
23. New high fill-factor dual-curvature microlens array fabrication using UV proximity printing10.1007/s00542-011-1282-2 ↗
24. Fabrication of a micro-tip array mold using a micro-lens mask with proximity printing10.1007/s00542-015-2413-y ↗
25. New horizontal frustum optical waveguide fabrication using UV proximity printing10.1007/s00542-007-0525-8 ↗
26. Standing waves in photoresists10.1364/ao.9.000969 ↗
27. Influence of resist baking on the pattern quality of thick photoresists10.1117/12.251205 ↗
28. Solvent content of thick photoresist films10.1117/12.388328 ↗
29. Bottom anti-reflective coatings for DUV lithography: Determination of optimum thermal process conditions10.1016/s0167-9317(96)00087-1 ↗
30. A novel organic bottom anti-reflective coating material for 193 nm excimer laser lithography10.1016/s0032-3861(00)00010-0 ↗
31. Reduction of photoresist standing-wave effects by post-exposure bake10.1109/t-ed.1975.18162 ↗
32. Fast myoglobin detection using nanofluidic electrokinetic trapping technique10.7567/apex.6.017001 ↗
33. Protein sensing by nanofluidic crystal and its signal enhancement10.1063/1.4802936 ↗
34. High throughput fabrication of disposable nanofluidic lab-on-chip devices for single molecule studies10.1063/1.4740231 ↗
35. Fully streched single DNA molecules in a nanofluidic chip show large-scale structural variation10.1016/j.bpj.2012.11.986 ↗
36. Separation of ions in nanofluidic channels with combined pressure-driven and electro-osmotic flow10.1021/ac400081p ↗
37. Integrated extended-nano chemical systems on a chip10.1039/b822557p ↗