journal article·2017-05-01Open access

Effect of Mg-Al insertion on magnetotransport properties in epitaxial Fe/sputter-deposited MgAl2O4/Fe(001) magnetic tunnel junctions

Mohamed Belmoubarik, Hiroaki Sukegawa, Tadakatsu Ohkubo, Seiji Mitani, Kazuhiro Hono

AIP Advances· Volume 7· Issue 5

Abstract

We investigated the effect of an Mg-Al layer insertion at the bottom interface of epitaxial Fe/MgAl2O4/Fe(001) magnetic tunnel junctions (MTJs) on their spin-dependent transport properties. The tunnel magnetoresistance (TMR) ratio and differential conductance spectra for the parallel magnetic configuration exhibited clear dependence on the inserted Mg-Al thickness. A slight Mg-Al insertion (thickness < 0.1 nm) was effective for obtaining a large TMR ratio above 200% at room temperature and observing a distinct local minimum structure in conductance spectra. In contrast, thicker Mg-Al (> 0.2 nm) induced a reduction of TMR ratios and featureless conductance spectra, indicating a degradation of the bottom-Fe/MgAl2O4 interface. Therefore, a minimal Mg-Al insertion was found to be effective to maximize the TMR ratio for a sputtered MgAl2O4-based MTJ.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Magnetic properties of thin films · Metallic Glasses and Amorphous Alloys · Magnetic Properties and Synthesis of Ferrites

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, Japan

References (23)

Show source-provided references
1. J. Phys. Appl. Phys. · 2007 · 40 · R33710.1088/0022-3727/40/21/R01 ↗
2. Nat. Mater. · 2004 · 3 · 86210.1038/nmat1256 ↗
3. Nat. Mater. · 2004 · 3 · 86810.1038/nmat1257 ↗
4. Appl. Phys. Lett. · 2008 · 93 · 08250810.1063/1.2976435 ↗
5. Appl. Phys. Lett. · 2009 · 95 · 18250210.1063/1.3258069 ↗
6. Appl. Phys. Lett. · 2009 · 94 · 16250410.1063/1.3116717 ↗
7. Sci. Rep. · 2016 · 6 · 3024910.1038/srep30249 ↗
8. Nat. Commun. · 2016 · 7 · 1027610.1038/ncomms10276 ↗
9. IEEE Trans., Magn. · 2008 · 44 · 257310.1109/TMAG.2008.2003059 ↗
10. J. Appl. Phys. · 2015 · 117 · 08390410.1063/1.4913265 ↗
11. Phys. Rev. B · 2006 · 73 · 20541210.1103/PhysRevB.73.205412 ↗
12. Phys. Rev. B · 2010 · 82 · 02442810.1103/PhysRevB.82.024428 ↗
13. Phys. Rev. B · 2012 · 86 · 18440110.1103/PhysRevB.86.184401 ↗
14. Appl. Phys. Lett. · 2014 · 105 · 09240310.1063/1.4895104 ↗
15. Appl. Phys. Express · 2016 · 9 · 05300410.7567/APEX.9.053004 ↗
16. Appl. Phys. Lett. · 2016 · 108 · 13240410.1063/1.4945049 ↗
17. Phys. Rev. B · 2015 · 91 · 17440310.1103/PhysRevB.91.174403 ↗
18. Appl. Phys. Lett. · 2005 · 87 · 07250310.1063/1.2012525 ↗
19. Appl. Phys. Lett. · 2010 · 96 · 21250510.1063/1.3441409 ↗
20. Appl. Phys. Lett. · 2011 · 99 · 18250810.1063/1.3647578 ↗
21. Phys. Rev. B · 2012 · 86 · 02442610.1103/PhysRevB.86.024426 ↗
22. Phys. Rev. Lett. · 2008 · 100 · 24680310.1103/PhysRevLett.100.246803 ↗
23. Phys. Rev. B · 2009 · 79 · 17441710.1103/PhysRevB.79.174417 ↗