journal article·2014-10-01Open access

Impact of artificial lateral quantum confinement on exciton-spin relaxation in a two-dimensional GaAs electronic system

Takayuki Kiba, Toru Tanaka, Yosuke Tamura, Akio Higo, Cedric Thomas, Seiji Samukawa, Akihiro Murayama

AIP Advances· Volume 4· Issue 10

Abstract

We demonstrate the effect of artificial lateral quantum confinement on exciton-spin relaxation in a GaAs electronic system. GaAs nanodisks (NDs) were fabricated from a quantum well (QW) by top-down nanotechnology using neutral-beam etching aided by protein-engineered bio-nano-templates. The exciton-spin relaxation time was 1.4 ns due to ND formation, significantly extended compared to 0.44 ns for the original QW, which is attributed to weakening of the hole-state mixing in addition to freezing of the carrier momentum. The temperature dependence of the spin-relaxation time depends on the ND thickness, reflecting the degree of quantum confinement.
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Research context

OpenAlex topics: Semiconductor Quantum Structures and Devices · Quantum and electron transport phenomena · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Hokkaido University 1 Graduate School of Information Science and Technology, , Kita 14, Nishi 9, Kita-ku, Sapporo, Japan

CREST Japan Science and Technology Agency 4 , 5 Sanbancho, Chiyoda-ku, Tokyo, Japan

Tohoku University 2 Institute of Fluid Science, , 2-1-1 Katahira, Aoba-ku, Sendai, Japan

Tohoku University 3 WPI-AIMR, , 2-1-1 Katahira, Aoba-ku, Sendai, Japan

References (27)

Show source-provided references
1. Sci. Rep. · 2013 · 310.1038/srep03121 ↗
2. Nat. Commun. · 2013 · 4
3. Nat. Phys. · 2007 · 3 · 15310.1038/nphys551 ↗
4. Nature · 2004 · 432 · 8110.1038/nature03008 ↗
5. Nature · 2004 · 430 · 43110.1038/nature02693 ↗
6. Appl. Phys. Lett. · 2004 · 84 · 357610.1063/1.1737068 ↗
7. Jpn. J. Appl. Phys. · 2003 · 42 · 334010.1143/JJAP.42.3340 ↗
8. Phys. Rev. B · 2008 · 77 · 03543710.1103/PhysRevB.77.035437 ↗
9. Phys. Rev. B · 2007 · 75 · 19530810.1103/PhysRevB.75.195308 ↗
10. Appl. Phys. Lett. · 2005 · 86 · 10310110.1063/1.1875763 ↗
11. Jpn. J. Appl. Phys. · 1999 · 38 · 468010.1143/JJAP.38.4680 ↗
12. Appl. Phys. Lett. · 1996 · 68 · 79710.1063/1.116536 ↗
13. Phys. Rev. B · 1993 · 47 · 1577610.1103/PhysRevB.47.15776 ↗
14. Appl. Phys. Lett. · 1993 · 63 · 316410.1063/1.110211 ↗
15. Phys. Rev. B · 1993 · 47 · 478610.1103/PhysRevB.47.4786 ↗
16. Nanotechnology · 2013 · 24 · 28530110.1088/0957-4484/24/28/285301 ↗
17. Appl. Phys. Lett. · 2012 · 101 · 11310810.1063/1.4752233 ↗
18. Nanotechnology · 2011 · 22 · 36530110.1088/0957-4484/22/36/365301 ↗
19. Jpn. J. Appl. Phys. · 2006 · 45 · 239510.1143/JJAP.45.2395 ↗
20. Thin Solid Films · 2001 · 393 · 1210.1016/S0040-6090(01)01083-5 ↗
21. Langmuir · 2013 · 29 · 1273710.1021/la4029595 ↗
22. 1984
23. Appl. Phys. Lett. · 2013 · 103 · 08240510.1063/1.4819208 ↗
24. Sov. Phys. JETP · 1976 · 42 · 705
25. Sov. Phys. Semicond. · 1986 · 20 · 110
26. Phys. Rev. Lett. · 2005 · 94 · 11660110.1103/PhysRevLett.94.116601 ↗
27. Appl. Phys. Lett. · 2012 · 100 · 14310510.1063/1.3701273 ↗