Fabrication and characterization of reduced graphene oxide by atmospheric pressure plasma jet

A low-cost and fast reduction method for the fabrication of reduced graphene oxide (r-GO) by using a dielectric barrier discharge plasma jet under atmospheric pressure has been presented. Highly reduced r-GO with the carbon atomic ratio up to 87.43% is obtained in minutes. By using diagnostic instruments like XRD, Raman, scanning electron microscopy, transmission electron microscopy, FT-IR, and X-ray photoelectron spectroscopy, the morphology, chemical, and structural properties of r-GO are analyzed. Due to the relatively high bonding energy, the functional group of C—O—C is the dominant structure in r-GO. By using N2 adsorption-desorption measurements, the specific surface area is calculated to be about 145 m2 g−1. The porosity results indicate that r-GO is a mesoporous structure with the pore size ranging from 3 nm to 4 nm.