journal article·2017-05-01Open access

Research of shot noise based on realistic nano-MOSFETs

Xiaofei Jia, Liang He

AIP Advances· Volume 7· Issue 5

Abstract

Experimental measurements and simulation results have shown that the dominant noise source of current noise changes from thermal noise to shot noise with scaling of MOSFET, and shot noise were suppressed by Fermi and Coulomb interactions. In this paper, Shot noise test system is established, and experimental results proved that shot noise were suppressed, and the expressions of shot noise in realistic nano-MOSFETs are derived with considering Fermi effect, Coulomb interaction and the combination of the both co-existence, respectively. On this basis, the variation of shot noise with voltage, temperature and source-drain doping were researched. The results we obtained are consistent with those from experiments and the theoretically explanation is given. At the same time, the shot noise test system is suitable for traditional nanoscale electronic components; the shot noise model is suitable for nanoscale MOSFET.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Ankang University 1 School of Electronic and Information Engineering, , AnKang 725000, People’s Republic of China

Xidian University 2 Advanced Materials and Nano Technology School, , Xi’an 710071, China

Funding

National Natural Science Foundation of China

References (24)

Show source-provided references
1. IEICE T. Electron. · 2007 · 9 · 88510.1093/ietele/e90-c.4.885 ↗
2. Jpn. J. Appl. Phys. · 2016 · 55 · 05410210.7567/jjap.55.054102 ↗
3. Appl. Phys. A: Mater. Sci. Process · 2000 · 71 · 41510.1007/s003390000554 ↗
4. 2009
5. AIP Adv. · 2013 · 3 · 03212410.1063/1.4795736 ↗
6. 2002
7. 2007
8. 2009
9. Lundstrom · 2007
10. J. Computational Electron. · 2004 · 3 · 19910.1007/s10825-004-7044-y ↗
11. Phys. Rev. B · 2010 · 81 · 171810.1103/PhysRevB.81.035329 ↗
12. Semicond. Sci. Tech. · 2000 · 45 · 297
13. IEEE T. Electron Dev. · 2002 · 49 · 48110.1109/16.987120 ↗
14. 2009
15. IEEE T. Electron. Dev. · 2004 · 51 · 114810.1109/ted.2004.829904 ↗
16. Phys. Rep. · 2004 · 398 · 6710.1016/j.physrep.2004.04.003 ↗
17. IEEE Electr. Dev. L. · 1997 · 18 · 36110.1109/55.596937 ↗
18. Phys. Rev. B · 1998 · 58 · 1537110.1103/physrevb.58.15371 ↗
19. IEEE Trans. Electron Dev. · 2002 · 49 · 13310.1109/16.974760 ↗
20. IEEE Trans. Electr. Dev. · 2003 · 50 · 185310.1109/ted.2003.815366 ↗
21. Solid-State Electron. · 2002 · 46 · 189910.1016/s0038-1101(02)00130-2 ↗
22. Phys. Rev. B · 2001 · 64 · 31410.1103/PhysRevB.64.045307 ↗
23. Phys. Rev. B · 2002 · 66 · 42910.1103/PhysRevB.66.075302 ↗
24. Semicond. Sci. Tech. · 1998 · 13 · 71410.1088/0268-1242/13/7/010 ↗