journal article·2019-11-01Open access

Optimized highly charged ion production for strong soft x-ray sources obeying a quasi-Moseley’s law

Yuta Shimada, Hiromu Kawasaki, Kanon Watanabe, Hiroyuki Hara, Kyoya Anraku, Misaki Shoji, Toru Oba, Masaru Matsuda, Weihua Jiang, Atsushi Sunahara, Masaharu Nishikino, Shinichi Namba, Gerry O’Sullivan, Takeshi Higashiguchi

AIP Advances· Volume 9· Issue 11

Abstract

The extension of the roadmap of shorter wavelength extreme ultraviolet and soft x-ray sources is a topic of considerable interest. We have studied the optimized emission from high power and/or high brightness sources based on unresolved transition array (UTA) emission. The peak UTA wavelengths follow a quasi-Moseley’s law as λ=33.82×R∞−1(Z−20.86)−1.61 nm for the laser wavelength of 1064 nm (the critical density of 1 × 1021 cm−3) and λ=165.8×R∞−1(Z−12.44)−1.94 nm for the laser wavelength of 532 nm (the critical density of 4 × 1021 cm−3), respectively. The photon flux decreased with increasing atomic number. We also mapped the optimum electron temperatures and corresponding charge states required to produce strong soft x-ray UTA emission with a photon flux of the order of 1014 photons nm−1 sr−1. The present quasi-Moseley’s law is sufficient for identifying the optimum element for numerous applications, such as material ablation and ionization, nanolithography, and in vivo biological imaging.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Atomic and Molecular Physics · Laser-Plasma Interactions and Diagnostics · X-ray Spectroscopy and Fluorescence Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical and Electronic Engineering, Faculty of Engineering, Utsunomiya University 1 , 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan

Utsunomiya Junior Collage Attached High School 2 , 1-35 Mutsumi, Utsunomiya, Tochigi 320-8585 Japan

Department of Material and Environmental Chemistry, Graduate School of Engineering, Utsunomiya University 3 , 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan

Center for Bioscience Research and Education, Utsunomiya University 4 , 350 Mine-machi, Utsunomiya, Tochigi 321-8505, Japan

Department of Electrical Engineering, Nagaoka University of Technology 5 , Nagaoka, Niigata 940-2188, Japan

Center for Material Under Extreme Environment, Purdue University 6 , West Lafayette, Indiana 478907, USA

Institute of Laser Engineering, Osaka University 7 , 2-6 Yamadaoka, Suita, Osaka 565-0871, Japan

Kansai Photon Science Institute, National Institutes for Quantum and Radiological Science and Technology (QST) 8 , Kizugawa, Kyoto 619-0215, Japan

Graduate School of Engineering, Hiroshima University 9 , 1-4-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan

School of Physics, University College Dublin 10 , Belfield, Dublin 4, Ireland

Funding

Japan Society for the Promotion of Science · Japan Science and Technology Agency

References (39)

Show source-provided references
1. Appl. Phys. Lett. · 2005 · 87 · 01150310.1063/1.1989445 ↗
2. J. Phys. D: Appl. Phys. · 2008 · 41 · 10520210.1088/0022-3727/41/10/105202 ↗
3. Appl. Phys. Lett. · 2005 · 86 · 10311110.1063/1.1882750 ↗
4. J. Appl. Phys. · 2007 · 101 · 12490810.1063/1.2749210 ↗
5. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct. · 1998 · 16 · 314210.1116/1.590453 ↗
6. Appl. Phys. Rev. · 2014 · 1 · 01110410.1063/1.4863412 ↗
7. Rev. Sci. Instrum. · 2005 · 76 · 04350310.1063/1.1884186 ↗
8. J. Microsc. · 2007 · 226 · 17510.1111/j.1365-2818.2007.01765.x ↗
9. 2016
10. Bakshi · 201810.1117/3.2305675 ↗
11. Proc. SPIE · 2019 · 10957 · 109571610.1117/12.2514033 ↗
12. Proc. SPIE · 2019 · 10957 · 109571910.1117/12.2515017 ↗
13. 2018 · S11
14. Opt. Eng. · 1994 · 33 · 397810.1117/12.186840 ↗
15. Phys. Rev. A · 2010 · 82 · 06250410.1103/physreva.82.062504 ↗
16. J. Phys. B: At., Mol. Opt. Phys. · 2011 · 44 · 16500610.1088/0953-4075/44/16/165006 ↗
17. AIP Adv. · 2016 · 6 · 10500210.1063/1.4964496 ↗
18. J. Appl. Phys. · 1994 · 75 · 192310.1063/1.356339 ↗
19. Appl. Phys. Lett. · 2014 · 104 · 23410710.1063/1.4883475 ↗
20. Atoms · 2018 · 6 · 2410.3390/atoms6020024 ↗
21. Shorter-wavelength extreme-UV sources below 10 nm
22. Phys. Plasmas · 2008 · 15 · 05670810.1063/1.2907154 ↗
23. Phys. Rev. Lett. · 2005 · 95 · 23500410.1103/physrevlett.95.235004 ↗
24. Appl. Phys. Lett. · 2006 · 89 · 15150110.1063/1.2361260 ↗
25. Appl. Phys. Lett. · 2012 · 100 · 06111810.1063/1.3684242 ↗
26. Appl. Phys. Lett. · 2006 · 88 · 20150310.1063/1.2206131 ↗
27. Opt. Express · 2018 · 26 · 2774810.1364/oe.26.027748 ↗
28. Appl. Phys. Lett. · 2005 · 87 · 04150310.1063/1.1989441 ↗
29. Appl. Phys. Lett. · 2010 · 97 · 23150310.1063/1.3526383 ↗
30. Rev. Sci. Instrum. · 2016 · 87 · 12310610.1063/1.4971421 ↗
31. Phys. Rev. · 1930 · 36 · 5710.1103/physrev.36.57 ↗
32. J. Appl. Phys. · 2014 · 115 · 03330210.1063/1.4862441 ↗
33. Appl. Phys. Lett. · 2012 · 100 · 01410310.1063/1.3673912 ↗
34. Opt. Lett. · 2018 · 43 · 375010.1364/ol.43.003750 ↗
35. J. Appl. Phys. · 1973 · 44 · 352410.1063/1.1662796 ↗
36. Can. J. Phys. · 2008 · 86 · 67510.1139/p07-197 ↗
37. Appl. Phys. Lett. · 2006 · 91 · 23150110.1063/1.2820451 ↗
38. Opt. Express · 2013 · 21 · 3183710.1364/oe.21.031837 ↗
39. Jpn. J. Appl. Phys., Part 1 · 2018 · 57 · 07031110.7567/jjap.57.070311 ↗