journal article·2020-12-01Open access

Optical diagnostics of the characteristics of a square unipolar nanosecond pulse-driven atmospheric pressure helium plasma jet

T. Y. Tang, H. S. Kim, G. H. Kim, B. Lee, H. J. Lee

AIP Advances· Volume 10· Issue 12

Abstract

Compared with the traditional sinusoidal voltage source, a short rising nanosecond voltage source can generate a high electron current for a short rising time. This paper investigates how the nanopulse parameters such as the voltage amplitude, pulse duration, and repetition frequency affect the radical generation and the plasma bullet propagation in an atmospheric pressure helium plasma jet. An intensified charge-coupled device was used to observe the bullet propagation in the nanosecond gate mode. The plasma bullet’s propagation speed is mainly affected by the applied voltage and externally biased electrodes rather than the pulse duration or the driving frequency. In contrast, optical emission spectroscopy diagnostics estimate that the radical density inside the atmospheric pressure plasma jet mainly increases with the repetition frequency. At the same time, the population of high-energy electrons can be controlled with the unipolar voltage amplitude. Thus, unipolar nanosecond pulses make it possible to control the emitting charges and the generated radicals independently.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Applications and Diagnostics · Plasma Diagnostics and Applications · Electrohydrodynamics and Fluid Dynamics

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical and Computer Engineering, Pusan National University 1 , Busan 46241, South Korea

Korea Electrotechnology Research Institute 2 , Changwon 51543, South Korea

Funding

National Research Foundation of Korea

References (55)

Show source-provided references
1. Appl. Surf. Sci. · 2013 · 273 · 56210.1016/j.apsusc.2013.02.080 ↗
2. J. Phys. D: Appl. Phys. · 2017 · 50 · 40520310.1088/1361-6463/aa829b ↗
3. Clin. Plasma Med. · 2014 · 2 · 2810.1016/j.cpme.2014.01.001 ↗
4. Clin. Plasma Med. · 2016 · 4 · 1910.1016/j.cpme.2016.01.001 ↗
5. Plasma Process. Polym. · 2010 · 7 · 27410.1002/ppap.200900083 ↗
6. Clin. Plasma Med. · 2015 · 3 · 7710.1016/j.cpme.2015.11.001 ↗
7. J. Phys. D: Appl. Phys. · 2018 · 51 · 21540110.1088/1361-6463/aabd8c ↗
8. Plasma Process. Polym. · 2015 · 12 · 135410.1002/ppap.201500033 ↗
9. Br. J. Cancer · 2011 · 105 · 129510.1038/bjc.2011.386 ↗
10. PLoS One · 2014 · 9 · 9194710.1371/journal.pone.0091947 ↗
11. Free Radical Biol. Med. · 2019 · 148 · 10810.1016/j.freeradbiomed.2019.12.035 ↗
12. Biointerphases · 2015 · 10 · 02951910.1116/1.4919018 ↗
13. Plasma Process. Polym. · 2015 · 12 · 7510.1002/ppap.201400074 ↗
14. Sci. Rep. · 2016 · 6 · 2524210.1038/srep25242 ↗
15. Phys. Rep. · 2014 · 540 · 12310.1016/j.physrep.2014.02.006 ↗
16. Plasma Process. Polym. · 2013 · 10 · 13610.1002/ppap.201200071 ↗
17. J. Phys. D: Appl. Phys. · 2008 · 41 · 23400410.1088/0022-3727/41/23/234004 ↗
18. Plasma Chem. Plasma Process. · 2018 · 38 · 95310.1007/s11090-018-9920-4 ↗
19. J. Phys. D: Appl. Phys. · 2009 · 42 · 17520210.1088/0022-3727/42/17/175202 ↗
20. J. Phys. D: Appl. Phys. · 2019 · 52 · 10520510.1088/1361-6463/aaf8f0 ↗
21. Plasma Sources Sci. Technol. · 2001 · 10 · 34410.1088/0963-0252/10/2/324 ↗
22. Appl. Phys. Lett. · 2011 · 98 · 02150310.1063/1.3540504 ↗
23. Plasma Sources Sci. Technol. · 2016 · 25 · 06400410.1088/0963-0252/25/6/064004 ↗
24. J. Phys. D: Appl. Phys. · 2014 · 47 · 25200310.1088/0022-3727/47/25/252003 ↗
25. J. Phys. D: Appl. Phys. · 2009 · 42 · 04521210.1088/0022-3727/42/4/045212 ↗
26. J. Phys. D: Appl. Phys. · 2001 · 34 · 163210.1088/0022-3727/34/11/312 ↗
27. IEEE Trans. Dielectr. Electr. Insul. · 2013 · 20 · 110110.1109/tdei.2013.6571423 ↗
28. J. Phys. D: Appl. Phys. · 2008 · 41 · 21520310.1088/0022-3727/41/21/215203 ↗
29. Phys. Plasmas · 2013 · 20 · 02350310.1063/1.4791652 ↗
30. J. Appl. Phys. · 2010 · 107 · 04330410.1063/1.3295914 ↗
31. J. Phys. D: Appl. Phys. · 2009 · 42 · 20200210.1088/0022-3727/42/20/202002 ↗
32. Phys. Plasmas · 2010 · 17 · 03350210.1063/1.3330507 ↗
33. J. Phys. D: Appl. Phys. · 2010 · 43 · 15520210.1088/0022-3727/43/15/155202 ↗
34. Phys. Plasmas · 2009 · 16 · 04350510.1063/1.3119212 ↗
35. Plasma Sources Sci. Technol. · 2012 · 21 · 03400710.1088/0963-0252/21/3/034007 ↗
36. J. Appl. Phys. · 2010 · 107 · 07330210.1063/1.3369538 ↗
37. J. Appl. Phys. · 2010 · 108 · 06330510.1063/1.3483935 ↗
38. J. Appl. Phys. · 2012 · 112 · 03330510.1063/1.4746700 ↗
39. J. Phys. D: Appl. Phys. · 2012 · 46 · 01520110.1088/0022-3727/46/1/015201 ↗
40. J. Phys. D: Appl. Phys. · 2010 · 43 · 09520110.1088/0022-3727/43/9/095201 ↗
41. Plasma Sources Sci. Technol. · 2012 · 21 · 03400910.1088/0963-0252/21/3/034009 ↗
42. AIP Adv. · 2013 · 3 · 06211710.1063/1.4811464 ↗
43. Sci. Rep. · 2013 · 3 · 159910.1038/srep01599 ↗
44. Plasma Sources Sci. Technol. · 2012 · 21 · 03401710.1088/0963-0252/21/3/034017 ↗
45. Appl. Phys. Lett. · 2011 · 98 · 14150110.1063/1.3576940 ↗
46. J. Appl. Phys. · 2012 · 112 · 10330410.1063/1.4766297 ↗
47. J. Phys. D: Appl. Phys. · 2009 · 42 · 23200210.1088/0022-3727/42/23/232002 ↗
48. Plasma Sources Sci. Technol. · 2012 · 21 · 03402010.1088/0963-0252/21/3/034020 ↗
49. Plasma Sources Sci. Technol. · 2010 · 19 · 06500510.1088/0963-0252/19/6/065005 ↗
50. IEEE Trans. Plasma Sci. · 2008 · 36 · 98810.1109/tps.2008.924480 ↗
51. J. Appl. Phys. · 2010 · 108 · 10330310.1063/1.3511448 ↗
52. Europhys. Lett. · 2014 · 107 · 6500410.1209/0295-5075/107/65004 ↗
53. IEEE Trans. Ind. Electr. · 2019 · 66 · 433410.1109/tie.2018.2866078 ↗
54. Plasma Sources Sci. Technol. · 2012 · 21 · 03400510.1088/0963-0252/21/3/034005 ↗
55. J. Phys. D: Appl. Phys. · 2017 · 50 · 14LT0110.1088/1361-6463/aa5f1e ↗