Transient photoreflectance of AlInN/GaN heterostructures
Source abstract
Abstract
Time-resolved photoreflectance (PR) in AlInN/GaN heterostructures was applied to study carrier dynamics at energies extending from the uniform AlInN alloy band gap to the band gap of GaN. PR at the AlInN band gap has been found to have subpicosecond decay. Such ultrafast carrier relaxation from the extended to the sub-band edge states implies that the localization sites are small and dense, most probably originating from the In-rich clusters. At energies below the AlInN band gap, a complicated energy dependence of the PR signal is attributed to the properties of the localized states and to the modulation of the interface electric field by photoexcitation.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Metal and Thin Film Mechanics · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
KTH Royal Institute of Technology 1 , Department of Materials and Nanophysics, Electrum 229, 16440 Kista, Sweden
Sensor Electronic Technology, Inc. 2 , 1195 Atlas Rd., Columbia, SC 29209, USA
Rensselaer Polytechnic Institute 3 Department of Electrical, Computer, and Systems Engineering, and Center of Integrated Electronics, , Troy, NY 12180, USA
Funding
National Science Foundation
References (23)
Show source-provided references
1. J. Appl. Phys. · 2011 · 109 · 11351610.1063/1.3594239 ↗
2. Phys. Rev. B · 2008 · 78 · 12531710.1103/PhysRevB.78.125317 ↗
3. Appl. Phys. Lett. · 2010 · 97 · 15110610.1063/1.3502482 ↗
4. Appl. Phys. Lett. · 2000 · 76 · 87610.1063/1.125615 ↗
5. J. Phys. D: Appl. Phys. · 2007 · 40 · 632810.1088/0022-3727/40/20/S16 ↗
6. Appl. Phys. Lett. · 2012 · 100 · 24210410.1063/1.4729033 ↗
7. Phys. Rev. B · 2005 · 72 · 08130910.1103/PhysRevB.72.081309 ↗
8. Phys. Rev. B · 2011 · 83 · 19530910.1103/PhysRevB.83.195309 ↗
9. Appl. Phys. Lett. · 2009 · 95 · 11210810.1063/1.3226108 ↗
10. Appl. Phys. Lett. · 2010 · 97 · 13211410.1063/1.3489433 ↗
11. J. Appl. Phys. · 2010 · 108 · 09311310.1063/1.3506697 ↗
12. J. Appl. Phys. · 2011 · 109 · 10310810.1063/1.3590149 ↗
13. Phys. Rev. B · 2009 · 80 · 07520210.1103/PhysRevB.80.075202 ↗
14. J. Appl. Phys. · 2003 · 94 · 244910.1063/1.1592868 ↗
15. J. Cryst. Growth · 2011 · 327 · 9810.1016/j.jcrysgro.2011.06.015 ↗
16. J. Phys. D: Appl. Phys. · 2010 · 43 · 36510210.1088/0022-3727/43/36/365102 ↗
17. Proc. SPIE · 2002 · 4650 · 8410.1117/12.467652 ↗
18. Appl. Phys. Lett. · 1999 · 74 · 246210.1063/1.123881 ↗
19. IEEE J. Quantum Electron. · 1990 · 26 · 11310.1109/3.44924 ↗
20. Appl. Phys. Lett. · 1998 · 69 · 256610.1063/1.117701 ↗
21. IEE Proc. Optoelectron. · 2002 · 149 · 11110.1049/ip-opt:20020435 ↗
22. J. Appl. Phys. · 2008 · 103 · 04370810.1063/1.2840139 ↗
23. Phys. Rev. B · 2005 · 72 · 19533510.1103/PhysRevB.72.195335 ↗