journal article·2021-03-01Open access

Design of an edge tapered 915 MHz/TM021 microwave plasma reactor by numerical analysis

Xinsheng Yan, Lianmin Zhao, Weiye Xu, Longwei Chen, Hua Jia, Fukun Liu

AIP Advances· Volume 11· Issue 3

Abstract

Microwave plasma reactor is often of particular interest due to their wide range of industrial applications, especially in high-end manufacturing. However, there exist problems of unstable plasma and small discharge area in conventional microwave reactors at 2.45 GHz. An edge tapered 915 MHz/TM021 microwave reactor evolved from reactors at 2.45 GHz is presented to improve the strength, area, and uniformity of microwave field for plasma applications. An electromagnetic model of a microwave reactor with the new coupling antenna composed of a tapered platform and a coaxial inner conductor is simulated. The simulation results show that the electric field strength in the new reactor with a size optimized coupling structure is more concentrated compared to similar reactors. A 2D axisymmetric hydrogen plasma discharge model based on self-consistent fluid simulation of this new reactor is presented. The obtained results show that this kind of model can lead to a better understanding of the physical processes occurring in these kinds of microwave reactors.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Applications and Diagnostics · Plasma Diagnostics and Applications · Advanced Data Storage Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Institute of Plasma Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences 1 , Hefei 230031, China

University of Science and Technology of China 2 , Hefei 230026, China

Funding

National MCF Energy R&D Program · National Natural Science Foundation of China · HFIPS Director’s Fund

References (38)

Show source-provided references
1. Spectrochim. Acta, Part B · 2006 · 61 · 210.1016/j.sab.2005.10.003 ↗
2. 2002 · 7
3. Biomaterials · 1996 · 17 · 127310.1016/s0142-9612(96)80003-2 ↗
4. Appl. Phys. Lett. · 2000 · 77 · 276710.1063/1.1319529 ↗
5. Diamond Relat. Mater. · 2001 · 10 · 34210.1016/s0925-9635(00)00503-3 ↗
6. Diamond Relat. Mater. · 2012 · 24 · 21010.1016/j.diamond.2012.01.026 ↗
7. Vacuum · 1994 · 45 · 49910.1016/0042-207x(94)90242-9 ↗
8. J. Coating Sci. Technol. · 2016 · 3 · 7510.6000/2369-3355.2016.03.02.4 ↗
9. Diamond Relat. Mater. · 1995 · 4 · 114510.1016/0925-9635(95)00291-x ↗
10. Diamond Relat. Mater. · 2010 · 19 · 39710.1016/j.diamond.2009.10.032 ↗
11. Chem. Eng. J. · 2020 · 387 · 12414910.1016/j.cej.2020.124149 ↗
12. J. Appl. Phys. · 1999 · 86 · 13410.1063/1.370710 ↗
13. Plasma Sources Sci. Technol. · 2001 · 10 · 6110.1088/0963-0252/10/1/309 ↗
14. J. Phys.: Condens. Matter · 2009 · 21 · 36420210.1088/0953-8984/21/36/364202 ↗
15. J. Phys. D: Appl. Phys. · 2010 · 43 · 15300110.1088/0022-3727/43/15/153001 ↗
16. Diamond Relat. Mater. · 2015 · 51 · 2410.1016/j.diamond.2014.11.004 ↗
17. Diamond Relat. Mater. · 2017 · 78 · 6710.1016/j.diamond.2017.08.007 ↗
18. Vacuum · 2018 · 147 · 13410.1016/j.vacuum.2017.10.026 ↗
19. Diamond Relat. Mater. · 2014 · 44 · 8810.1016/j.diamond.2014.02.010 ↗
20. Vacuum · 2014 · 107 · 5110.1016/j.vacuum.2014.04.002 ↗
21. Diamond Relat. Mater. · 2014 · 42 · 2810.1016/j.diamond.2013.12.001 ↗
22. Vacuum · 2015 · 117 · 11210.1016/j.vacuum.2015.04.023 ↗
23. 2004
24. J. Comput. Phys. · 2000 · 159 · 110.1006/jcph.2000.6445 ↗
25. 2006 · 180
26. Appl. Math. Sci. · 2012 · 6 · 6003
27. IEEE Trans. Plasma Sci. · 2016 · 44 · 340910.1109/tps.2016.2619696 ↗
28. J. Appl. Phys. · 1993 · 74 · 374410.1063/1.354487 ↗
29. IEEE Trans. Dielectrics Electr. Insul. · 2013 · 20 · 161610.1109/tdei.2013.6633691 ↗
30. J. Phys. D: Appl. Phys. · 2005 · 38 · R28310.1088/0022-3727/38/19/r01 ↗
31. J. Mod. Phys. · 2012 · 3 · 160310.4236/jmp.2012.330198 ↗
32. Phys. Rev. E · 2012 · 85 · 05640410.1103/physreve.85.056404 ↗
33. J. Phys. Chem. A · 2006 · 110 · 606010.1021/jp057182+ ↗
34. 2016
35. Collision Processes in Low-Temperature Hydrogen Plasmas · 2003
36. Diamond Relat. Mater. · 2002 · 11 · 46710.1016/s0925-9635(01)00731-2 ↗
37. Eur. Phys. J. D · 2013 · 67 · 13310.1140/epjd/e2013-30514-y ↗
38. 2013