Curved-boundary particle-in-cell simulation for the investigation of the target erosion effect of DC magnetron sputtering system

A two-dimensional particle-in-cell simulation with a curved-boundary field solver makes it possible to investigate the target erosion effects in a direct current magnetron sputtering system. The correlation between the ion flux deformation and the sputtering yield profile for the eroded target has been investigated, considering the ion energy and angle distributions. It was found that the sputtering yield profile does not change abruptly, although the ion flux profile changes sensitively with the increase in the erosion depth. The criteria for the judgment of the critical erosion depth are provided based on the sputtering yield profile.