Metal-assisted electroless fabrication of nanoporous p-GaN for increasing the light extraction efficiency of light emitting diodes
Source abstract
Abstract
We report metal-assisted electroless fabrication of nanoporous p-GaN to improve the light extraction efficiency of GaN-based light emitting diodes (LEDs). Although it has long been believed that p-GaN cannot be etched at room temperature, in this study we find that Ag nanocrystals (NCs) on the p-GaN surface enable effective etching of p-GaN in a mixture of HF and K2S2O8 under ultraviolet (UV) irradiation. It is further shown that the roughened GaN/air interface enables strong scattering of photons emitted from the multiple quantum wells (MQWs). The light output power measurements indicate that the nanoporous LEDs obtained after 10 min etching show a 32.7% enhancement in light-output relative to the conventional LEDs at an injection current of 20 mA without significant increase of the operating voltage. In contrast, the samples etched for 20 min show performance degradation when compared with those etched for 10 min, this is attributed to the current crowding effect and increased surface recombination rate.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Ga2O3 and related materials
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Affiliations
Shandong University State Key Laboratory of Crystal Materials, , 27 South Shanda Road, Jinan, Shandong 250100, P. R. China
Funding
National Natural Science Foundation of China
References (26)
Show source-provided references
1. 2006 · 91
2. IEEE Photonics Technol. Lett. · 2007 · 19 · 186510.1109/LPT.2007.907644 ↗
3. Adv. Mater. · 2008 · 20 · 11510.1002/adma.200701683 ↗
4. J. Appl. Phys. · 2003 · 93 · 938310.1063/1.1571962 ↗
5. Appl. Phys. Lett. · 2011 · 98 · 07110210.1063/1.3554426 ↗
6. Appl. Phys. Lett. · 2011 · 99 · 12110410.1063/1.3641906 ↗
7. Nat. Photonics · 2009 · 3 · 16310.1038/nphoton.2009.21 ↗
8. Appl. Phys. Lett. · 2009 · 95 · 03191310.1063/1.3171928 ↗
9. Appl. Phys. Lett. · 2004 · 84 · 85510.1063/1.1645992 ↗
10. Opt. Express · 2011 · 19 · 106510.1364/OE.19.001065 ↗
11. Appl. Phys. Lett. · 2009 · 95 · 07111410.1063/1.3211970 ↗
12. Appl. Phys. Lett. · 1999 · 75 · 256910.1063/1.125080 ↗
13. J. Cryst. Growth · 2007 · 305 · 38410.1016/j.jcrysgro.2007.03.030 ↗
14. Mater. Sci. Eng., R. · 2005 · 48 · 110.1016/j.mser.2004.11.002 ↗
15. J. Electron. Mater. · 1998 · 27 · 28210.1007/s11664-998-0400-0 ↗
16. Appl. Phys. Lett. · 2009 · 94 · 15111310.1063/1.3120545 ↗
17. J. Mater. Chem.10.1039/C1JM13928B ↗
18. J. Phys. Chem. C · 2009 · 113 · 1693910.1021/jp9055297 ↗
19. J. Appl. Phys. · 2001 · 89 · 414210.1063/1.1352684 ↗
20. J. Electrochem. Soc. · 2009 · 156 · 37110.1149/1.3183807 ↗
21. J. Phys. Chem. · 1967 · 71 · 251110.1021/j100867a019 ↗
22. Appl. Phys. Lett. · 2000 · 77 · 257210.1063/1.1319191 ↗
23. Adv. Mater. · 2011 · 23 · 19810.1002/adma.201002410 ↗
24. Appl. Phys. Lett. · 2008 · 93 · 20310310.1063/1.3027068 ↗
25. Appl. Phys. Lett. · 2005 · 87 · 20350810.1063/1.2132073 ↗
26. Appl. Phys. Lett. · 2007 · 90 · 16111010.1063/1.2724903 ↗