Experimental study on pulse characteristics of negative corona discharge in SF6/N2 gas mixtures under DC voltages
Source abstract
Abstract
Corona discharge, an inevitable phenomenon, may lead to insulation degradation, threatening the safe and reliable operation of gas-insulated power equipment. The pulse stage is a complex but usual discharge process in corona discharge. In this paper, we investigate the pulse characteristics of negative corona discharge in a needle-to-plane electrode configuration in SF6/N2 gas mixtures under DC voltages. With an increase in mean current, a stage transition phenomenon from the Townsend stage through the pulse stage to the breakdown stage is observed. The variation in pulse amplitude and pulse time characteristics at the pulse stage is analyzed. In addition, the effects of gas pressure, gap spacing, and N2 content on onset voltage and pulse characteristic parameters, including pulse time parameters and the pulse repetition rate, at the pulse stage are presented. The results show that the current pulses mainly exhibit an irregular distribution of small amplitude. The pulse time parameters are not affected by gas pressure, gap spacing, or N2 content at pressures higher than 0.1 MPa. The pulse repetition rate decreases with an increase in gas pressure and N2 content but is only weakly affected by gap spacing, ranging from 1 kHz to dozens of kHz.
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Research context
OpenAlex topics: High voltage insulation and dielectric phenomena · Aerosol Filtration and Electrostatic Precipitation · Plasma Applications and Diagnostics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering, Xi’an Jiaotong University , Xi’an 710049, China
Funding
State Grid Zhejiang Electric Power Company Technology Project · Fundamental Research Funds for the Central Universities · Foundation for Innovative Research Groups of the National Natural Science Foundation of China
References (33)
Show source-provided references
1. J. Appl. Phys. · 2018 · 124 · 08330210.1063/1.5043239 ↗
2. IEEE Trans. Dielectr. Electr. Insul. · 2017 · 24 · 89310.1109/tdei.2017.006535 ↗
3. IEEE Power Eng. Soc. Gen. Meet. · 2003 · 4 · 247610.1109/PES.2003.1271031 ↗
4. IEEE Trans. Dielectr. Electr. Insul. · 2017 · 24 · 15710.1109/tdei.2016.005964 ↗
5. J. Appl. Phys. · 1981 · 52 · 658810.1063/1.328611 ↗
6. Appl. Phys. Lett. · 1988 · 52 · 18510.1063/1.99514 ↗
7. Plasma Phys. Rep. · 2001 · 27 · 52010.1134/1.1378130 ↗
8. IEEE Trans. Electr. Insul. · 1979 · EI-14 · 7010.1109/tei.1979.298158 ↗
9. IEEE Trans. Electr. Insul. · 1980 · EI-15 · 41310.1109/tei.1980.298335 ↗
10. IEEE Trans. Electr. Insul. · 1984 · EI-19 · 4010.1109/tei.1984.298731 ↗
11. J. Appl. Phys. · 1986 · 59 · 368410.1063/1.336750 ↗
12. J. Phys. D: Appl. Phys. · 1999 · 32 · 168110.1088/0022-3727/32/14/321 ↗
13. J. Phys. D: Appl. Phys. · 2001 · 34 · 203710.1088/0022-3727/34/13/315 ↗
14. Eur. Phys. J.: Appl. Phys. · 2006 · 33 · 21310.1051/epjap:2006025 ↗
15. Eur. Phys. J.: Appl. Phys. · 2013 · 61 · 2432010.1051/epjap/2012120448 ↗
16. Christophorou · 1980 · 303
17. Jpn. J. Appl. Phys., Part 1 · 1989 · 28 · 198910.1143/jjap.28.1989 ↗
18. IEEE Trans. Electr. Insul. · 1989 · 24 · 69910.1109/14.34205 ↗
19. Phys. Rev. A · 1985 · 32 · 382110.1103/physreva.32.3821 ↗
20. IEEE Trans. Dielectr. Electr. Insul. · 1995 · 2 · 95210.1109/94.469988 ↗
21. Czech. J. Phys. · 2000 · 50 · 25810.1007/bf03165890 ↗
22. J. Phys. D: Appl. Phys. · 2002 · 35 · 76210.1088/0022-3727/35/8/307 ↗
23. Sci. Rep. · 2017 · 7 · 1013510.1038/s41598-017-10118-2 ↗
24. Phys. Rev. · 1941 · 60 · 71410.1103/physrev.60.714 ↗
25. P. Sattari, “FEM-FCT based dynamic simulation of Trichel Pulse Corona Discharge in point-plane configuration,” Electronic thesis and dissertation repository, (The University of Western Ontario, 2011).
26. IEEE Trans. Plasma Sci. · 2003 · 31 · 50410.1109/tps.2003.815469 ↗
27. IEEE Trans. Plasma Sci. · 1986 · 14 · 23410.1109/tps.1986.4316534 ↗
28. J. Phys. D: Appl. Phys. · 1976 · 9 · 52310.1088/0022-3727/9/3/018 ↗
29. Plasma Chem. Plasma Process. · 1993 · 13 · 110.1007/bf01447167 ↗
30. 1978 · 21910.1016/B978-0-12-349701-7.50009-2 ↗
31. J. Appl. Phys. · 1988 · 64 · 426910.1063/1.341300 ↗
32. 2012
33. Phys. Plasmas · 2018 · 25 · 02350610.1063/1.5012073 ↗