journal article·2016-12-01Open access

Thermal crystallization of sputter-deposited amorphous Ge films: Competition of diamond cubic and hexagonal phases

M. Okugawa, R. Nakamura, M. Ishimaru, H. Yasuda, H. Numakura

AIP Advances· Volume 6· Issue 12

Abstract

Following our previous studies on crystallization induced by electron irradiation, we have investigated the crystallization of sputter-deposited amorphous germanium films by heat treatments. On continuous heating, samples aged for 3 days and 4 months at room temperature crystallized at 500°C to form coarse spherical particles of a hexagonal structure, of about 100 nm in diameter, whereas samples aged for 7 months turned to homogeneous nanograins of the diamond cubic structure at 600°C. When the films aged for 4 months at room temperature were annealed at 350°C for 2 h and then heated, they crystallized at 550°C to form a mixture of the two microstructures, and those annealed at 350°C and further at 500°C for 1 h crystallized at 600°C mostly to nanograins. Crystallization by electron irradiation at 350°C to 4-month-aged samples has also been studied. With increasing annealing time at 350°C, coarse particles of a hexagonal structure ceased to appear, and were replaced by fine nanograins of the diamond cubic structure. These observations can be understood in terms of structural instability of sputter-deposited amorphous films. Medium-range ordered clusters must initially be present in the films and serve as nuclei of the metastable hexagonal phase. They are unstable, however, and are eliminated by annealing, resulting in the reduction in size and number of coarse particles with a metastable structure.
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Research context

OpenAlex topics: Silicon Nanostructures and Photoluminescence · Diamond and Carbon-based Materials Research · Ion-surface interactions and analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Osaka Prefecture University 1 Department of Materials Science, Graduate School of Engineering, , Gakuen-cho 1-1, Naka-ku, Sakai 599-8531, Japan

Kyushu Institute of Technology 2 Department of Materials Science and Engineering, , Tobata-ku, Kitakyushu, Fukuoka 804-8550, Japan

Osaka University 3 Research Center for Ultra-High Voltage Electron Microscopy, , Mihogaoka 7-1, Ibaraki, Osaka 567-0047, Japan

Funding

Ministry of Education, Culture, Sports, Science, and Technology

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