journal article·2015-09-01Open access

Atmospheric pressure plasma polymerization using double grounded electrodes with He/Ar mixture

Dong Ha Kim, Hyun-Jin Kim, Choon-Sang Park, Bhum Jae Shin, Jeong Hyun Seo, Heung-Sik Tae

AIP Advances· Volume 5· Issue 9

Abstract

In this study, we have proposed the double grounded atmospheric pressure plasma jet (2G-APPJ) device to individually control the plasmas in both fragmentation (or active) and recombination (or passive) regions with a mixture of He and Ar gases to deposit organic thin films on glass or Si substrates. Plasma polymerization of acetone has been successfully deposited using a highly energetic and high-density 2G-APPJ and confirmed by scanning electron microscopy (SEM). Plasma composition was measured by optical emission spectroscopy (OES). In addition to a large number of Ar and He spectra lines, we observed some spectra of C2 and CH species for fragmentation and N2 (second positive band) species for recombination. The experimental results confirm that the Ar gas is identified as a key factor for facilitating fragmentation of acetone, whereas the He gas helps the plume of plasma reach the substrate on the 2nd grounded electrode during the plasma polymerization process. The high quality plasma polymerized thin films and nanoparticles can be obtained by the proposed 2G-APPJ device using dual gases.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Plasma Applications and Diagnostics · Surface Modification and Superhydrophobicity · Plasma Diagnostics and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Kyungpook National University 1 School of Electronics Engineering, College of IT Engineering, , Daegu, 702-701, South Korea

Sejong University 2 Department of Electronics Engineering, , Seoul 143-747, South Korea

Incheon National University 3 Department of Electronics Engineering, , Incheon 406-772, South Korea

Funding

Ministry of Education (Ministry of Education of the Republic of Korea

References (13)

Show source-provided references
1. Plasma Process Polym. · 2014 · 11 · 49610.1002/ppap.201400005 ↗
2. Thin Solid Films · 2014 · 573 · 2710.1016/j.tsf.2014.10.101 ↗
3. Plasma Sci. Technol. · 2014 · 16 · 6810.1088/1009-0630/16/1/15 ↗
4. Phys. Plasmas · 2013 · 20 · 11350210.1063/1.4828720 ↗
5. Surface and Coatings Technology · 2013 · 231 · 40810.1016/j.surfcoat.2012.06.064 ↗
6. Plasma Process Polym. · 2007 · 4 · 64810.1002/ppap.200700014 ↗
7. IEEE Trans. Plasma Sci. · 2010 · 39 · 229410.1109/TPS.2011.2111389 ↗
8. Jpn. J. Appl. Phys. · 2011 · 50 · 11600210.7567/JJAP.50.116002 ↗
9. Plasma Sources Sci. Technol. · 2012 · 21 · 03400410.1088/0963-0252/21/3/034004 ↗
10. Appl. Phys. Lett. · 2012 · 101 · 25350910.1063/1.4772639 ↗
11. IEEE Trans. Plasma Sci. · 2015 · 43 · 72610.1109/TPS.2014.2359515 ↗
12. 1976
13. AIP Advances. · 2013 · 3 · 09212810.1063/1.4823484 ↗